公开(公告)号：US20220367160A1

公开(公告)日：2022-11-17

申请号：US17876422

申请日：2022-07-28

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Tsung-Jen YANG ,  Yi-Zhen CHEN ,  Chih-Pin WANG ,  Chao-Li SHIH ,  Ching-Hou SU ,  Cheng-Yi HUANG

IPC: H01J37/34 ,  C23C14/35

Abstract: In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.

公开(公告)号：US20250112032A1

公开(公告)日：2025-04-03

申请号：US18981170

申请日：2024-12-13

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Tsung-Jen YANG ,  Yi-Zhen CHEN ,  Chih-Pin WANG ,  Chao-Li SHIH ,  Ching-Hou SU ,  Cheng-Yi HUANG

IPC: H01J37/34 ,  C23C14/35

Abstract: In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.

公开(公告)号：US20200161108A1

公开(公告)日：2020-05-21

申请号：US16596109

申请日：2019-10-08

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Tsung-Jen YANG ,  Yi-Zhen CHEN ,  Chih-Pin WANG ,  Chao-Li SHIH ,  Ching-Hou SU ,  Cheng-Yi HUANG

IPC: H01J37/34 ,  C23C14/35

Abstract: In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.

公开(公告)号：US20250123555A1

公开(公告)日：2025-04-17

申请号：US18487881

申请日：2023-10-16

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Jia-Lin SYU ,  Tai-Yu CHEN ,  Yi-Zhen CHEN ,  Yen-Hsun CHEN ,  Shang-Chieh CHIEN ,  Li-Jui CHEN

IPC: G03F1/84 ,  G01N21/88 ,  G01N21/956

Abstract: A method for operating a reticle inspection system includes training an analysis model of the reticle inspection system with a machine learning process, generating a difference threshold based on the machine learning process, storing a reference image, and generating a scan image of a reticle with the reticle inspection system. The method includes generating a relative difference value by comparing the scan image to the reference image. The method includes, if the relative difference value is less than the difference threshold, determining that the reticle is not defective. The method includes, if the relative difference value is greater than the difference threshold, determining that the reticle is defective.

公开(公告)号：US20240087861A1

公开(公告)日：2024-03-14

申请号：US18513313

申请日：2023-11-17

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Tsung-Jen YANG ,  Yi-Zhen CHEN ,  Chih-Pin WANG ,  Chao-Li SHIH ,  Ching-Hou SU ,  Cheng-Yi HUANG

IPC: H01J37/34 ,  C23C14/35

CPC classification number: H01J37/3408 ,  C23C14/35 ,  H01J37/3458 ,  H01J2237/152

Abstract: In an embodiment, a magnetic assembly includes: an inner permeance annulus; and an outer permeance annulus connected to the inner permeance annulus via magnets, wherein the outer permeance annulus comprises a peak region with a thickness greater than other regions of the outer permeance annulus.

公开(公告)号：US20230060598A1

公开(公告)日：2023-03-02

申请号：US17463328

申请日：2021-08-31

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yi-Zhen CHEN ,  Yen-Hsun CHEN ,  Jhan-Hong YEH ,  Tzung-Chi FU ,  Han-Lung CHANG ,  Li-Jui CHEN

IPC: G03F7/20

Abstract: An EUV photolithography system utilizes a baseplate of an EUV pod to unload an EUV reticle from a chuck within an EUV scanner. The baseplate includes a top surface and support pins extending from the top surface. The when the reticle is unloaded onto the baseplate, the support pins hold the reticle at relatively large distance from the top surface of the baseplate. The support pins have a relatively low resistance. The large distance and low resistance help ensure that particles do not travel from the baseplate to the reticle during unloading.