公开(公告)号：US20240363312A1

公开(公告)日：2024-10-31

申请号：US18768190

申请日：2024-07-10

申请人： Taiwan Semiconductor Manufacturing Company, LTD.

发明人： Cheng Kuang Tso ,  Chou-Feng Lee ,  Chih-Hsien Hsu ,  Chung-Hsiu Cheng ,  Jr-Sheng Chen

IPC分类号： H01J37/32 ,  H01L21/3065

CPC分类号： H01J37/32449 ,  H01J37/32522 ,  H01L21/3065 ,  H01J2237/334

摘要： Methods and systems for uniformly cooling a dome within a plasma treatment system are disclosed. The methods and systems utilize a diffuser including a perforated plate and a cone. The perforated plate includes a center portion and multiple arrays of holes with each array being located circumferentially at a different distance from the center. The cone extends away from the center. The diffuser spreads cooling gas more uniformly across the surface of the dome.