摘要:
An oxazetidine derivative compound of the formula: ##STR1## wherein R.sub.1 represents a substituted or unsubstituted amino radical and R.sub.3 represents a radical selected from the group consisting of carboxy, protected carboxy, ester, acid amide, acid anhydride, acid halide, acid azide and carboxy salt, and --SR.sub.2 is a residue of a thiophilic sulphur nucleophile.
摘要:
A process for producing a 2-cephem or 3-cephem derivative compound of the formula: ##SPC1##Wherein R.sub.1 represents a substituted or unsubstituted amino radical and R.sub.4 represents hydrogen or a radical selected from the group consisting of carboxy, protected carboxy, ester, acid amide, acid anhydride, acid halide, acid azide and carboxy salt, and the dotted line indicates the alternate bond structure providing 3-cephem or 2-cephem, which comprises:Reacting a halogenated derivative selected from the group consisting of a halogenated penam derivative having the formula: ##SPC2##A halogenated cepham derivative of the formula: ##SPC3##Wherein X represents a halogen atom, R.sub.3 represents a radical selected from the group consisting of carboxy, protected carboxy, ester, acid amide, acid anhydride, acid halide, acid azide and carboxy salt, and R.sub.1 is as defined above, or mixtures thereof with a dehydrohalogenoic acid reagent.
摘要:
A penam derivative having the formula: ##STR1## wherein X represents a halogen atom, and wherein R.sub.1 represents an amino or acylamino, and R.sub.3 represents a radical selected from the group consisting of carboxy, ester, acid amide, acid anhydride, acid halide, and acid azide.
摘要:
An oxoazetidine derivative compound of the formula: ##STR1## wherein R.sub.1 represents a substituted or unsubstituted amino radical and R.sub.3 represents a radical selected from the group consisting of carboxy, protected carboxy, ester, acid amide, acid anhydride, acid halide, acid azide and carboxy salt, and --SR.sub.2 is a residue of a thiophilic sulphur nucleophile.
摘要:
A penam derivative having the formula: ##STR1## wherein X represents a halogen atom, and wherein R.sub.1 represents an amino or acylamino, and R.sub.3 represents a radical selected from the group consisting of carboxy, ester, acid amide, acid anhydride, acid halide, and acid azide.
摘要:
New antimicrobial azetidinone derivatives and their salt of the formula: ##STR1## wherein R.sub.1 amino or acylamino, and A is selected from a variety of groups.
摘要:
New antimicrobial azetidinone derivatives and their salt of the formula: ##STR1## wherein R.sub.1 is amino or acylamino, and A is selected from a variety of groups.
摘要:
A process for producing a 2-cephem or 3-cephem derivative compound of the formula: ##STR1## wherein R.sub.1 represents a substituted or unsubstituted amino radical and R.sub.4 represents hydrogen or a radical selected from the group consisting of carboxy, protected carboxy, ester, acid amide, acid anhydride, acid halide, acid azide and carboxy salt, and the dotted line indicates the alternate bond structure providing 3-cephem or 2-cephem, which comprises:reacting a halogenated derivative selected from the group consisting of a halogenated penam derivative having the formula: ##STR2## a halogenated cephem derivative of the formula: ##STR3## wherein X represents a halogen atom, R.sub.3 represents a radical selected from the group consisting of carboxy, protected carboxy, ester, acid amide, acid anhydride, acid halide, acid azide and carboxy salt, and R.sub.1 is as defined above, or mixtures thereof with a dehydrohalogenoic acid reagent.
摘要:
A compound of the formula: ##STR1## wherein R.sup.1 is (C.sub.1 to C.sub.6) alkyl,R.sup.2 is carboxy or a protected carboxy group,R.sup.3 is amino or a protected amino group, andA is carbonyl or hydroxy (C.sub.1 to C.sub.6) alkylene, andpharmaceutically acceptable salt thereof, which is active against pathogenic bacteria, and methods for preparing the same.
摘要:
A compound of the general formula: ##STR1## wherein R.sup.1 is amino or a conventional, pharmaceutically acceptable acylamino, R.sup.2 is carboxy or a conventionally protected carboxy, X is --S-- or ##STR2## R.sup.3 is lower alkyl and Y" is a residue of a strong nucleophile selected from the group consisting of azido, thiocyanato, lower alkyanoylthio and piperidinothiocarbonylthio.