TRANSPARENT CONDUCTIVE FILM HAVING FTO/ITO LAMINATE
    4.
    发明申请
    TRANSPARENT CONDUCTIVE FILM HAVING FTO/ITO LAMINATE 失效
    具有FTO / ITO层压板的透明导电膜

    公开(公告)号:US20110111215A1

    公开(公告)日:2011-05-12

    申请号:US13000206

    申请日:2009-06-22

    IPC分类号: B32B9/04 H01L21/283

    摘要: A transparent conductive film for lamination on a substrate and comprising an ITO film and an FTO film, wherein a part or all of the crystal structure of a surface of the FTO film is orthorhombic, and a transparent conductive film for lamination on a substrate and comprising an ITO film and an FTO film, wherein the thickness of the FTO film is within a range from 5 nm to 20 nm and the FTO film is a continuous film. A method of producing the transparent conductive films includes depositing the ITO film on a substrate using a pyrosol process, and subsequently depositing the FTO film continuously on top of the ITO film.

    摘要翻译: 一种透明导电膜,用于层叠在基片上并且包括ITO膜和FTO膜,其中所述FTO膜的表面的一部分或全部晶体结构是斜方晶的,以及用于层叠在基底上的透明导电膜, ITO膜和FTO膜,其中FTO膜的厚度在5nm至20nm的范围内,并且FTO膜是连续膜。 制造透明导电膜的方法包括使用热解法将ITO膜沉积在基板上,随后在ITO膜的上面连续沉积FTO膜。

    Heterocyclic cyclohexanedione derivative, production thereof, and
herbicide
    5.
    发明授权
    Heterocyclic cyclohexanedione derivative, production thereof, and herbicide 失效
    杂环己二酮衍生物,其制备和除草剂

    公开(公告)号:US5504056A

    公开(公告)日:1996-04-02

    申请号:US175420

    申请日:1994-07-20

    摘要: A heterocyclic cyclohexanedione derivative represented by the general formula I!: ##STR1## wherein R.sup.1 is optionally substituted lower alkyl, optionally substituted cycloalkyl, optionally substituted phenyl or optionally substituted heterocyclic ring; R.sup.2, R.sup.3, R.sup.4 and R.sup.5 may be the same or different from one another and each independently represents hydrogen or lower alkyl; R.sup.6 is hydrogen; R.sup.7 is OR.sup.8 wherein R.sup.8 is hydrogen, lower alkyl, aralkyl, lower acyl, alkylsulfonyl or arylsulfonyl; or R.sup.6 and R.sup.7 are combined together to represent a single bond; X is oxygen, sulfur or N--R.sup.9 wherein R.sup.9 is hydrogen, lower alkyl, optionally substituted aralkyl, optionally substituted cycloalkyl, optionally substituted phenyl or optionally substituted heterocyclic ring, a salts thereof, a process for producing the same, and a herbicides comprising the same.

    摘要翻译: PCT No.PCT / JP92 / 00877 Sec。 371日期:1994年7月20日 102(e)日期1994年7月20日PCT提交1992年7月8日PCT公布。 公开号WO93 / 01171 日本1993年1月21日。由通式[I]表示的杂环环己二酮衍生物:任选取代的环烷基,任选取代的苯基或任选取代的杂环; R 2,R 3,R 4和R 5可以彼此相同或不同,并且各自独立地表示氢或低级烷基; R6是氢; R7是OR8,其中R8是氢,低级烷基,芳烷基,低级酰基,烷基磺酰基或芳基磺酰基; 或R6和R7组合在一起以表示单键; X是氧,硫或N-R9,其中R9是氢,低级烷基,任选取代的芳烷基,任选取代的环烷基,任选取代的苯基或任选取代的杂环,其盐,其制备方法和除草剂, 相同。

    Picking control device with pressure correcting apparatus
    6.
    发明授权
    Picking control device with pressure correcting apparatus 失效
    带压力校正装置的拾取控制装置

    公开(公告)号:US5176184A

    公开(公告)日:1993-01-05

    申请号:US718982

    申请日:1991-06-21

    申请人: Shigeo Yamada

    发明人: Shigeo Yamada

    IPC分类号: D03D47/30

    CPC分类号: D03D47/3033

    摘要: A picking control device for a loom comprising a pressure controller for controlling jet pressure of a picking nozzle, a timing controller for controlling operation time of a picking member, angle corrector for correcting the start angle of the weft yarn and a condition setting section which is operated on the condition that one of the signals from the pressure controller or angle corrector is not present so that at least one of the jet pressure, start angle or speed of the loom is maintained at an optimum value. This allows for effective picking with adequate air consumption and helps to prevent weaving defects such as cutting of the weft yarn at the time of termination of picking, warp engagement and the like.

    Electrospark machining control device
    7.
    发明授权
    Electrospark machining control device 失效
    Electrospark加工控制装置

    公开(公告)号:US4554428A

    公开(公告)日:1985-11-19

    申请号:US636087

    申请日:1984-08-02

    CPC分类号: B23H7/18

    摘要: A control apparatus for an EDM machining device includes electrode a position control servo system provided with a zero order hold circuit. This circuit issues a position control instruction which is preset in an error counter which outputs an electrode difference signal used to drive the electrode. The difference signal is also applied to a processor or the like wherein it is added to the position control instruction and applied to the zero order hold circuit.

    摘要翻译: 一种用于EDM加工装置的控制装置包括具有零级保持电路的位置控制伺服系统的电极。 该电路发出预置在误差计数器中的位置控制指令,该误差计数器输出用于驱动电极的电极差信号。 差分信号也被应用于处理器等,其中它被添加到位置控制指令并被施加到零级保持电路。

    Electric discharge machining control device
    8.
    发明授权
    Electric discharge machining control device 失效
    放电加工控制装置

    公开(公告)号:US4458190A

    公开(公告)日:1984-07-03

    申请号:US390601

    申请日:1982-06-21

    IPC分类号: B23H1/02 B23H7/18 G05B19/28

    CPC分类号: B23H7/18

    摘要: In an electric discharge machine in which the machining gap between an electrode and a workpiece is maintained suitably by a control device having sampling, logic operation and holding functions, an up-down counter is provided for integration, over a predetermined period corresponding to the sampling period, servo signals from a discrimination circuit adapted to discriminate the conditions of the machining gap, so that sampling for all periods of time within the sampling period can be achieved.

    摘要翻译: 在通过具有取样,逻辑运算和保持功能的控制装置适当地维持电极和工件之间的加工间隙的放电机中,在对应于取样的预定时间内提供一个用于积分的升降计数器 周期,来自识别电路的伺服信号,用于区分加工间隙的条件,从而可以实现采样周期内所有时间段的采样。

    Control of lower limit of jet pressure for a picking nozzle
    10.
    发明授权
    Control of lower limit of jet pressure for a picking nozzle 失效
    控制喷嘴喷射压力的下限

    公开(公告)号:US5115840A

    公开(公告)日:1992-05-26

    申请号:US627356

    申请日:1990-12-14

    申请人: Shigeo Yamada

    发明人: Shigeo Yamada

    IPC分类号: D03D47/28 D03D47/30

    CPC分类号: D03D47/3053 D03D47/3033

    摘要: A control method and control apparatus for controlling jet pressure of a picking nozzle of a jet loom which includes detecting a flying characteristic of the filling yarn and inhibiting descending control of a pressure controller for controlling jet pressure when the unevenness of the flying characteristic exceeds a set allowable value. In the control apparatus, the pressure controller is positively controlled by an auxiliary controller provided with a flying characteristic detection mechanism, an unevenness calculation mechanism and a comparison mechanism.