公开(公告)号：US20100037959A1

公开(公告)日：2010-02-18

申请号：US12514527

申请日：2007-11-13

申请人： Takayuki Kamaishi ,  Eiichi Komori ,  Susumu Yamauchi ,  Akifumi Hayashi

发明人： Takayuki Kamaishi ,  Eiichi Komori ,  Susumu Yamauchi ,  Akifumi Hayashi

IPC分类号： H01L21/67

CPC分类号： G01F15/005 ,  G01F1/68 ,  G05D7/0635 ,  Y10T137/0396 ,  Y10T137/8593

摘要： A method of supplying a process gas comprises a step in which there is generated a process gas that is polymerizable depending on a temperature, and a step in which the thus generated process gas is supplied to a processing apparatus 4 configured to perform a predetermined process to an object to be processed W under a reduced-pressure atmosphere. When the process gas is supplied to the processing apparatus 4, a flow rate of the process gas is controlled by using a mass flow-rate control unit of a lower differential pressure type having a diaphragm 80, in which an appropriate operation range of a supply pressure is set lower than the atmospheric pressure. Thus, a supply rate (actual flow rate) of a process gas such as an HF gas that is polymerizable depending on a temperature can be precisely controlled in a stable manner.

摘要翻译： 提供处理气体的方法包括产生根据温度可聚合的处理气体的步骤，以及将由此产生的处理气体供给到被配置为执行预定处理的处理装置4的步骤 在减压气氛下待处理的物体W。 当处理气体被供应到处理装置4时，通过使用具有隔膜80的具有较低压差类型的质量流量控制单元来控制处理气体的流量，其中供应的适当操作范围 压力设定为低于大气压力。 因此，可以稳定地精确地控制可根据温度聚合的诸如HF气体的处理气体的供给速率（实际流量）。