公开(公告)号：US07595885B2

公开(公告)日：2009-09-29

申请号：US12010938

申请日：2008-01-31

申请人： Takayuki Sakai ,  Masanobu Kibe ,  Tokuhisa Ohiwa

发明人： Takayuki Sakai ,  Masanobu Kibe ,  Tokuhisa Ohiwa

IPC分类号： G01N21/55

CPC分类号： H01L21/76802 ,  G01B11/0625 ,  G01B11/0683 ,  G01B11/22 ,  H01J37/32935 ,  H01J37/32972 ,  H01L22/26 ,  H01L2924/0002 ,  H01L2924/00

摘要： A process monitoring system has a process chamber configured to hold an object to be processed, an illumination source configured to emit a light to the object, a polarizer configured to polarize the light, a monitor window having a birefringent material and provided on the process chamber to propagate the light, direction adjusting equipment configured to adjust a relationship between a polarization plane of the light and a direction of an optic axis of the monitor window, and a monitoring information processor configured to detect the light reflected from the object.

摘要翻译： 过程监控系统具有被配置为保持要处理的对象的处理室，被配置为向对象发光的照明源，被配置为使光偏振的偏振器，具有双折射材料并设置在处理室上的监视器窗 传播光，方向调整装置，被配置为调节光的偏振面与监视窗的光轴的方向之间的关系;以及监视信息处理器，被配置为检测从物体反射的光。

公开(公告)号：US07327455B2

公开(公告)日：2008-02-05

申请号：US10969860

申请日：2004-10-22

申请人： Takayuki Sakai ,  Masanobu Kibe ,  Tokuhisa Ohiwa

发明人： Takayuki Sakai ,  Masanobu Kibe ,  Tokuhisa Ohiwa

IPC分类号： G01J4/00

CPC分类号： H01L21/76802 ,  G01B11/0625 ,  G01B11/0683 ,  G01B11/22 ,  H01J37/32935 ,  H01J37/32972 ,  H01L22/26 ,  H01L2924/0002 ,  H01L2924/00

摘要： A process monitoring system has a process chamber configured to hold an object to be processed, an illumination source configured to emit a light to the object, a polarizer configured to polarize the light, a monitor window having a birefringent material and provided on the process chamber to propagate the light, direction adjusting equipment configured to adjust a relationship between a polarization plane of the light and a direction of an optic axis of the monitor window, and a monitoring information processor configured to detect the light reflected from the object.

公开(公告)号：US20070273880A1

公开(公告)日：2007-11-29

申请号：US11882275

申请日：2007-07-31

申请人： Takayuki Sakai ,  Masanobu Kibe ,  Tokuhisa Ohiwa

发明人： Takayuki Sakai ,  Masanobu Kibe ,  Tokuhisa Ohiwa

IPC分类号： G01J4/00

CPC分类号： H01L21/76802 ,  G01B11/0625 ,  G01B11/0683 ,  G01B11/22 ,  H01J37/32935 ,  H01J37/32972 ,  H01L22/26 ,  H01L2924/0002 ,  H01L2924/00

摘要： A process monitoring system has a process chamber configured to hold an object to be processed, an illumination source configured to emit a light to the object, a polarizer configured to polarize the light, a monitor window having a birefringent material and provided on the process chamber to propagate the light, direction adjusting equipment configured to adjust a relationship between a polarization plane of the light and a direction of an optic axis of the monitor window, and a monitoring information processor configured to detect the light reflected from the object.

摘要翻译： 过程监控系统具有被配置为保持要处理的对象的处理室，被配置为向对象发光的照明源，被配置为使光偏振的偏振器，具有双折射材料并设置在处理室上的监视器窗 传播光，方向调整装置，被配置为调节光的偏振面与监视窗的光轴的方向之间的关系;以及监视信息处理器，被配置为检测从物体反射的光。

公开(公告)号：US07045462B2

公开(公告)日：2006-05-16

申请号：US10395065

申请日：2003-03-25

申请人： Takayuki Sakai ,  Tokuhisa Ohiwa ,  Masanobu Kibe

发明人： Takayuki Sakai ,  Tokuhisa Ohiwa ,  Masanobu Kibe

IPC分类号： H01L21/302

CPC分类号： H01L21/32139 ,  H01L21/28123 ,  H01L21/31138

摘要： A method for fabricating a pattern, includes: delineating a mask pattern on at least a portion of an underlying layer; etching a portion of the mask pattern; irradiating an incident light on the mask pattern to which the etching is performed and detecting a reflected light produced by reflecting the incident light after the incident light is transmitted through the mask pattern; obtaining a reflected interference spectrum; and calculating a pattern width of the mask pattern using data of the reflected interference spectrum, the reflected interference spectrum being in a wavelength range of not less than two times a pitch of the mask pattern.

摘要翻译： 一种用于制造图案的方法，包括：在下层的至少一部分上描绘掩模图案; 蚀刻掩模图案的一部分; 在进行了蚀刻的掩模图案上照射入射光，并且在入射光透过掩模图案之后，检测反射入射光产生的反射光; 获得反射的干涉光谱; 并且使用反射的干涉光谱的数据计算掩模图案的图案宽度，反射的干涉光谱在不小于掩模图案的间距的两倍的波长范围内。

公开(公告)号：US20050140975A1

公开(公告)日：2005-06-30

申请号：US10969860

申请日：2004-10-22

申请人： Takayuki Sakai ,  Masanobu Kibe ,  Tokuhisa Ohiwa

发明人： Takayuki Sakai ,  Masanobu Kibe ,  Tokuhisa Ohiwa

IPC分类号： G01B11/02 ,  G01B11/06 ,  G01B11/22 ,  G01N15/02 ,  H01L21/3065 ,  H01L21/66 ,  H01L21/768

CPC分类号： H01L21/76802 ,  G01B11/0625 ,  G01B11/0683 ,  G01B11/22 ,  H01J37/32935 ,  H01J37/32972 ,  H01L22/26 ,  H01L2924/0002 ,  H01L2924/00

摘要： A process monitoring system has a process chamber configured to hold an object to be processed, an illumination source configured to emit a light to the object, a polarizer configured to polarize the light, a monitor window having a birefringent material and provided on the process chamber to propagate the light, direction adjusting equipment configured to adjust a relationship between a polarization plane of the light and a direction of an optic axis of the monitor window, and a monitoring information processor configured to detect the light reflected from the object.

摘要翻译： 过程监控系统具有被配置为保持要处理的对象的处理室，被配置为向对象发光的照明源，被配置为使光偏振的偏振器，具有双折射材料并设置在处理室上的监视器窗 传播光，方向调整装置，被配置为调节光的偏振面与监视窗的光轴的方向之间的关系;以及监视信息处理器，被配置为检测从物体反射的光。

公开(公告)号：US20080137083A1

公开(公告)日：2008-06-12

申请号：US12010938

申请日：2008-01-31

申请人： Takayuki Sakai ,  Masanobu Kibe ,  Tokuhisa Ohiwa

发明人： Takayuki Sakai ,  Masanobu Kibe ,  Tokuhisa Ohiwa

IPC分类号： G01J4/00

CPC分类号： H01L21/76802 ,  G01B11/0625 ,  G01B11/0683 ,  G01B11/22 ,  H01J37/32935 ,  H01J37/32972 ,  H01L22/26 ,  H01L2924/0002 ,  H01L2924/00

摘要： A process monitoring system has a process chamber configured to hold an object to be processed, an illumination source configured to emit a light to the object, a polarizer configured to polarize the light, a monitor window having a birefringent material and provided on the process chamber to propagate the light, direction adjusting equipment configured to adjust a relationship between a polarization plane of the light and a direction of an optic axis of the monitor window, and a monitoring information processor configured to detect the light reflected from the object.

公开(公告)号：US07349088B2

公开(公告)日：2008-03-25

申请号：US11882275

申请日：2007-07-31

申请人： Takayuki Sakai ,  Masanobu Kibe ,  Tokuhisa Ohiwa

发明人： Takayuki Sakai ,  Masanobu Kibe ,  Tokuhisa Ohiwa

IPC分类号： G01J4/00

CPC分类号： H01L21/76802 ,  G01B11/0625 ,  G01B11/0683 ,  G01B11/22 ,  H01J37/32935 ,  H01J37/32972 ,  H01L22/26 ,  H01L2924/0002 ,  H01L2924/00

摘要： A process monitoring system has a process chamber configured to hold an object to be processed, an illumination source configured to emit a light to the object, a polarizer configured to polarize the light, a monitor window having a birefringent material and provided on the process chamber to propagate the light, direction adjusting equipment configured to adjust a relationship between a polarization plane of the light and a direction of an optic axis of the monitor window, and a monitoring information processor configured to detect the light reflected from the object.

摘要翻译： 过程监控系统具有被配置为保持要处理的对象的处理室，被配置为向对象发光的照明源，被配置为使光偏振的偏振器，具有双折射材料并设置在处理室上的监视器窗 传播光，方向调整装置，被配置为调节光的偏振面与监视窗的光轴的方向之间的关系;以及监视信息处理器，被配置为检测从物体反射的光。