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    Color filter manufacturing method, patterned substrate manufacturing method, and small photomask
    3.
    发明申请
    Color filter manufacturing method, patterned substrate manufacturing method, and small photomask 有权
    彩色滤光片制造方法，图案化基板制造方法和小型光掩模

    公开(公告)号：US20110070532A1

    公开(公告)日：2011-03-24

    申请号：US12926433

    申请日：2010-11-17

    申请人： Takeshi Ikeda ,  Eishi Aoki ,  Genki Harada

    发明人： Takeshi Ikeda ,  Eishi Aoki ,  Genki Harada

    IPC分类号： G03F1/00 ,  G03F7/20

    CPC分类号： G02B5/223 ,  G02B5/201 ,  G03F1/50 ,  G03F7/0007 ,  G03F7/105 ,  G03F7/2002

    摘要： A color filter manufacturing method for forming a filter segment and a black matrix by repeating at least a coating step of coating a substrate with a photosensitive resin layer, a pattern exposure step of curing the photosensitive resin layer by pattern exposure, a developing step of developing the exposed photosensitive resin layer, and a sintering step of thermosetting the developed photosensitive resin layer, in this order a plurality of number of times, characterized in that in the exposure step, a laser is used as a light source, and proximity exposure is performed by repetitively emitting the laser via photomask such that a cumulative exposure amount is 1 to 150 mJ/cm2.

    摘要翻译： 一种滤色器制造方法，用于通过重复至少一个用感光树脂层涂覆基底的涂布步骤，通过图案曝光固化感光性树脂层的图案曝光步骤，形成过滤器段和黑色矩阵，显影步骤 曝光的感光性树脂层和使显影的感光性树脂层热固化的烧结工序，其次为多次，其特征在于，在曝光工序中，使用激光作为光源，进行接近曝光 通过光掩模重复地发射激光，使得累积曝光量为1〜150mJ / cm 2。

    Colored composition, color filter and method of manufacturing the same
    4.
    发明申请
    Colored composition, color filter and method of manufacturing the same 审中-公开
    彩色组合物，滤色片及其制造方法

    公开(公告)号：US20100253888A1

    公开(公告)日：2010-10-07

    申请号：US12801636

    申请日：2010-06-17

    申请人： Hideyo Tanaka ,  Isao Shigemori ,  Yusuke Iida ,  Mari Iwasaki ,  Kenro Sunahara ,  Morihide Miyamura ,  Takeshi Ikeda ,  Eishi Aoki ,  Genki Harada ,  Azumi Sato

    发明人： Hideyo Tanaka ,  Isao Shigemori ,  Yusuke Iida ,  Mari Iwasaki ,  Kenro Sunahara ,  Morihide Miyamura ,  Takeshi Ikeda ,  Eishi Aoki ,  Genki Harada ,  Azumi Sato

    IPC分类号： G02F1/1335 ,  C08J3/28 ,  B05D3/06

    CPC分类号： G03F7/027 ,  G02B5/201 ,  G03F7/0007

    摘要： Disclosed is a coloring composition including a pigment, a transparent resin, a monomer having an ethylenic unsaturated double bond, and a photo-polymerization initiator, wherein a ratio (M/P) of weight (M) of the monomer having an ethylenic unsaturated double bond to weight (P) of the transparent resin is confined to a range of 0.12 to 1.35, and the coloring composition is adapted to be employed in a manufacturing method of a color filter including coating a surface of a substrate with the coloring composition, irradiating a filter segment-forming region or a black matrix-forming region of the coated coloring composition film with a laser beam having a wavelength of 340 nm to 380 nm, thereby curing the irradiated region, and removing uncured portion of the coated coloring composition film to form the filter segment or the black matrix.

    摘要翻译： 公开了包含颜料，透明树脂，具有烯属不饱和双键的单体和光聚合引发剂的着色组合物，其中具有烯属不饱和双键的单体的重量（M）的比（M / P） 透明树脂的重量（P）限制在0.12至1.35的范围内，并且着色组合物适用于包括用着色组合物涂布基材的表面的滤色器的制造方法，照射 涂布着色组合物膜的过滤器段形成区域或黑色矩阵形成区域，其具有波长为340nm至380nm的激光束，从而固化照射区域，并将涂覆的着色组合物膜的未固化部分除去至 形成滤波器段或黑矩阵。

    Color filter manufacturing method, patterned substrate manufacturing method, and small photomask
    5.
    发明授权
    Color filter manufacturing method, patterned substrate manufacturing method, and small photomask 有权
    彩色滤光片制造方法，图案化基板制造方法和小型光掩模

    公开(公告)号：US08815477B2

    公开(公告)日：2014-08-26

    申请号：US12926433

    申请日：2010-11-17

    申请人： Takeshi Ikeda ,  Eishi Aoki ,  Genki Harada

    发明人： Takeshi Ikeda ,  Eishi Aoki ,  Genki Harada

    IPC分类号： G03F7/20 ,  G02B5/20

    CPC分类号： G02B5/223 ,  G02B5/201 ,  G03F1/50 ,  G03F7/0007 ,  G03F7/105 ,  G03F7/2002

    摘要： A color filter manufacturing method for forming a filter segment and a black matrix by repeating at least a coating step of coating a substrate with a photosensitive resin layer, a pattern exposure step of curing the photosensitive resin layer by pattern exposure, a developing step of developing the exposed photosensitive resin layer, and a sintering step of thermosetting the developed photosensitive resin layer, in this order a plurality of number of times, characterized in that in the exposure step, a laser is used as a light source, and proximity exposure is performed by repetitively emitting the laser via photomask such that a cumulative exposure amount is 1 to 150 mJ/cm2.

    摘要翻译： 一种滤色器制造方法，用于通过重复至少一个用感光树脂层涂覆基底的涂布步骤，通过图案曝光固化感光性树脂层的图案曝光步骤，形成过滤器段和黑色矩阵，显影步骤 曝光的感光性树脂层和使显影的感光性树脂层热固化的烧结工序，其次为多次，其特征在于，在曝光工序中，使用激光作为光源，进行接近曝光 通过光掩模重复地发射激光，使得累积曝光量为1〜150mJ / cm 2。