Resist composition and patterning process
    3.
    发明授权
    Resist composition and patterning process 有权
    抗蚀剂组成和图案化工艺

    公开(公告)号:US07232638B2

    公开(公告)日:2007-06-19

    申请号:US10427939

    申请日:2003-05-02

    IPC分类号: G03F7/004

    CPC分类号: G03F7/0758 G03F7/0397

    摘要: Chemically amplified positive resist compositions comprising a polymer obtained by copolymerizing a silicon-containing monomer with a polar monomer having a value of LogP or cLogP of up to 0.6 and optionally hydroxystyrene, a photoacid generator and an organic solvent are sensitive to high-energy radiation and have a high sensitivity and resolution at a wavelength of less than 300 nm and improved resistance to oxygen plasma etching.

    摘要翻译: 包含通过使含硅单体与LogP或cLogP值高达0.6的极性单体和任选的羟基苯乙烯,光酸产生剂和有机溶剂共聚获得的聚合物的化学扩增的正性抗蚀剂组合物对高能辐射敏感, 在小于300nm的波长下具有高灵敏度和分辨率,并且改善了耐氧等离子体蚀刻的耐受性。

    Silacyclohexane compound, a method of preparing it and a liquid crystal
composition containing it
    9.
    发明授权
    Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it 失效
    硅环己烷化合物,其制备方法和含有它的液晶组合物

    公开(公告)号:US5582764A

    公开(公告)日:1996-12-10

    申请号:US395706

    申请日:1995-02-28

    摘要: A silacyclohexane compound represented by the following general formula (I). ##STR1## In this formula, R denotes a linear-chain alkyl group with a carbon number of 1-10, a fluoroalkyl group with a carbon number of 1-10 in which a fluorine atom(s) is substituted for one or two hydrogen atoms, an alkoxy group, a branched-chain alkyl group with a carbon number of 3-8, an alkoxyalkyl group with a carbon number of 2-7, or an alkenyl group with a carbon number of 2-8. a and b denote 0 or 1 and (a+b)=0 or 1; For ##STR2## at least one of the two denotes a trans-1-sila-1,4-cyclohexylene or a trans-4-sila-1,4-cyclohexylene group whose silicon at position 1 or position 4 has a substitutional group(s) of H, F, Cl or CH.sub.3. X denotes H, CN, F, Cl, CF.sub.3, CF.sub.2 Cl, CHFCl, OCF.sub.3, OCF.sub.2 Cl, OCHFCl, OCHF.sub.2, R or OR. Y and Z denote F, Cl or CH.sub.3. i and j denotes 0, 1 or 2.

    摘要翻译: 由以下通式(I)表示的硅环己烷化合物。 (I)在该式中,R表示碳数为1-10的直链烷基,碳原子数为1-10的氟代烷基,其中氟原子取代一个 或两个氢原子,烷氧基,碳数为3-8的支链烷基,碳数为2-7的烷氧基烷基或碳数为2-8的烯基。 a和b表示0或1,(a + b)= 0或1; 对于,两个中的至少一个表示反式-1-硅烷-1,4-亚环己基或反式-4-硅烷-1,4-亚环己基,其位置1或位置4的硅具有取代基( s)H,F,Cl或CH 3。 X表示H,CN,F,Cl,CF 3,CF 2 Cl,CHFCl,OCF 3,OCF 2 Cl,OCHFCl,OCHF 2,R或OR。 Y和Z表示F,Cl或CH3。 i和j表示0,1或2。

    Silacyclohexane compound, a method of preparaing it and a liquid crystal
composition containing it
    10.
    发明授权
    Silacyclohexane compound, a method of preparaing it and a liquid crystal composition containing it 失效
    硅环己烷化合物,其制备方法和含有它的液晶组合物

    公开(公告)号:US5523440A

    公开(公告)日:1996-06-04

    申请号:US388307

    申请日:1995-02-14

    IPC分类号: C07F7/08 C07F7/12 C09K19/40

    摘要: There is provides a silacyclohexane compound and method of making same. The silacyclohexane compound has the following formula (1): ##STR1## wherein R denotes a linear-chain alkyl group with a carbon number of 1-10, a branched-chain alkyl group with a carbon number of 3-8, an alkoxyalkyl group with a carbon number of 2-7, a mono- or di-fluoroalkyl group with a carbon number of 1-10, or an alkenyl group with a carbon number of 2-8, and ##STR2## denotes a trans-1-sila-1,4-cyclohexylene or a trans-4-sila-1,4-cyclohexylene group whose silicon at position 1 or position 4 has a substitutional group(s) of H, F, Cl or CH.sub.3, X denotes H, CN, F, Cl, CF.sub.3, OCF.sub.3, CF.sub.2 Cl, CHFCl, OCHF.sub.2, OCF.sub.2 Cl, OCHFCl, R or OR group, Z denotes F, and i denotes 0, 1 or 2.

    摘要翻译: 提供硅环己烷化合物及其制备方法。 硅环己烷化合物具有下式(1):其中R表示碳数为1-10的直链烷基,碳数为3-8的支链烷基, 碳数为2-7的烷氧基烷基,碳数为1-10的单 - 或二 - 氟代烷基或碳数为2-8的烯基,< IMAGE> 1-硅烷-1,4-亚环己基或其1位或4位的硅具有H,F,Cl或CH的取代基的反式-4-硅烷-1,4-亚环己基,X表示H ,CN,F,Cl,CF 3,OCF 3,CF 2 Cl,CHFCl,OCHF 2,OCF 2 Cl,OCHFCl,R或OR基,Z表示F,i表示0,1或2。