摘要:
A surface inspection apparatus includes a blocking unit included in a subsequent processing unit that groups data items into having an arbitrary number of data items. The subsequent processing unit acquires a data item from each of the blocks. The blocking unit changes, in accordance with an instruction transmitted from a state monitoring unit, the number of data items to be blocked. A threshold processing unit acquires data items from the blocking unit that have values larger than a threshold, and transmits the data items to a memory. The state monitoring unit monitors an available capacity of the memory. When the state monitoring unit detects a reduction in the available capacity of the memory, it causes the blocking unit to increase the number of data items to be blocked into each of the blocks so that data does not overflow from the memory.
摘要:
To provide a defect inspection apparatus and method adapted to easily assign threshold levels to scattered-light detectors and to appropriately acquire data detected by each scattered-light detector. The apparatus includes a stage device on which to rest a sample; a laser light irradiation device that irradiates the sample on the stage device with inspection light; scattered-light detectors, each of which detects a beam of light, scattered from the sample, and outputs an image signal; a threshold level setter formed so that an associated threshold level for judging whether defects are present is set only for an image signal selected from individual image signals of the scattered-light detectors or from image signals obtained by arithmetic processing based on the image signals, and a threshold level setting circuit that acquires the individual image signals, only if the image signal exceeds the threshold level set in the threshold level setter.
摘要:
To provide a defect inspection apparatus and defect inspection method adapted to make it possible to easily assign threshold levels to a plurality of scattered-light detectors and to appropriately acquire data detected by each of the scattered-light detectors.A defect inspection apparatus of this invention comprises: a stage device 50 on which to rest a wafer 1; a laser light irradiation device 30 that irradiates the wafer 1 on the stage device 50 with inspection light 31; scattered-light detectors 130-132, each of which detects a beam of light, 110-112, scattered from the wafer 1, and outputs an image signal 140a-142a; a threshold level setter 530 formed so that an associated threshold level for judging whether defects are present is set only for an image signal 151a selected from individual image signals 140a-142a of the scattered-light detectors 130-132 or from image signals 151a obtained by arithmetic processing based on the image signals 140a-142a, and; a threshold level setting circuit 160 that acquires the individual image signals 140a-142a, only if the image signal 151a exceeds the threshold level set in the threshold level setter 530.