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1.发明申请Method for producing a purified borazine compound, method for filling a borazine compound, and container for preserving a borazine compound 有权纯化的环硼氮烷化合物的制造方法，填充环硼氮烷化合物的方法和保存环硼氮烷化合物的容器公开(公告)号：US20070208202A1
公开(公告)日：2007-09-06
申请号：US11346551
申请日：2006-02-02
CPC分类号： C07F5/02
摘要： On producing a purified borazine compound, a borazine compound is filtrated under an atmospheric condition of a water content of not higher than 2000 volume ppm. Or, on filling a borazine compound into a container, the above described borazine compound is filled into the above described container under an atmospheric condition of a water content of not higher than 2000 volume ppm. Or, as a container for preservation for preserving a borazine compound, a container for preserving a borazine compound, which has withstanding pressure of not lower than 0.1 MPa, is used.
摘要翻译： 在制备纯化的环硼氮烷化合物时，在含水量不高于2000体积ppm的大气条件下过硼烷化合物。 或者，在将环硼氮烷化合物填充到容器中时，将上述环硼氮烷化合物在含水量不高于2000体积ppm的大气条件下填充到上述容器中。 或者，作为用于保存环硼氮烷化合物的保存用容器，使用耐受压力为0.1MPa以上的保护环硼氮烷化合物的容器。
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2.发明授权Method for producing a purified borazine compound, method for filling a borazine compound, and container for preserving a borazine compound 有权纯化的环硼氮烷化合物的制造方法，填充环硼氮烷化合物的方法和保存环硼氮烷化合物的容器公开(公告)号：US07855307B2
公开(公告)日：2010-12-21
申请号：US11346551
申请日：2006-02-02
IPC分类号： C07F5/02
CPC分类号： C07F5/02
摘要： On producing a purified borazine compound, a borazine compound is filtrated under an atmospheric condition of a water content of not higher than 2000 volume ppm. Or, on filling a borazine compound into a container, the above described borazine compound is filled into the above described container under an atmospheric condition of a water content of not higher than 2000 volume ppm. Or, as a container for preservation for preserving a borazine compound, a container for preserving a borazine compound, which has withstanding pressure of not lower than 0.1 MPa, is used.
摘要翻译： 在制备纯化的环硼氮烷化合物时，在含水量不高于2000体积ppm的大气条件下过硼烷化合物。 或者，在将环硼氮烷化合物填充到容器中时，将上述环硼氮烷化合物在含水量不高于2000体积ppm的大气条件下填充到上述容器中。 或者，作为用于保存环硼氮烷化合物的保存用容器，使用耐受压力为0.1MPa以上的保护环硼氮烷化合物的容器。
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3.发明授权Method for producing a purified borazine compound, method for filling a borazine compound, and container for preserving a borazine compound 失效纯化的环硼氮烷化合物的制造方法，填充环硼氮烷化合物的方法和保存环硼氮烷化合物的容器公开(公告)号：US08779193B2
公开(公告)日：2014-07-15
申请号：US12952610
申请日：2010-11-23
IPC分类号： C07F5/05
CPC分类号： C07F5/02
摘要： On producing a purified borazine compound, a borazine compound is filtrated under an atmospheric condition of a water content of not higher than 2000 volume ppm. Or, on filling a borazine compound into a container, the above described borazine compound is filled into the above described container under an atmospheric condition of a water content of not higher than 2000 volume ppm. Or, as a container for preservation for preserving a borazine compound, a container for preserving a borazine compound, which has withstanding pressure of not lower than 0.1 MPa, is used.
摘要翻译： 在制备纯化的环硼氮烷化合物时，在含水量不高于2000体积ppm的大气条件下过硼烷化合物。 或者，在将环硼氮烷化合物填充到容器中时，将上述环硼氮烷化合物在含水量不高于2000体积ppm的大气条件下填充到上述容器中。 或者，作为用于保存环硼氮烷化合物的保存用容器，使用耐受压力为0.1MPa以上的保护环硼氮烷化合物的容器。
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4.发明申请Method For Producing A Purified Borazine Compound, Method For Filling A Borazine Compound, And Container For Preserving A Borazine Compound 失效用于生产纯化的硼嗪化合物的方法，用于填充硼嗪化合物的方法和用于保存硼嗪化合物的容器公开(公告)号：US20110065956A1
公开(公告)日：2011-03-17
申请号：US12952610
申请日：2010-11-23
IPC分类号： C07F5/05
CPC分类号： C07F5/02
摘要： On producing a purified borazine compound, a borazine compound is filtrated under an atmospheric condition of a water content of not higher than 2000 volume ppm. Or, on filling a borazine compound into a container, the above described borazine compound is filled into the above described container under an atmospheric condition of a water content of not higher than 2000 volume ppm. Or, as a container for preservation for preserving a borazine compound, a container for preserving a borazine compound, which has withstanding pressure of not lower than 0.1 MPa, is used.
摘要翻译： 在制备纯化的环硼氮烷化合物时，在含水量不高于2000体积ppm的大气条件下过硼烷化合物。 或者，在将环硼氮烷化合物填充到容器中时，将上述环硼氮烷化合物在含水量不高于2000体积ppm的大气条件下填充到上述容器中。 或者，作为用于保存环硼氮烷化合物的保存用容器，使用耐受压力为0.1MPa以上的保护环硼氮烷化合物的容器。
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公开(公告)号：US07208627B2
公开(公告)日：2007-04-24
申请号：US11013192
申请日：2004-12-15
IPC分类号： C07F5/02
CPC分类号： C07F5/022
摘要： In the process of synthesizing alkylborazine compound represented by the chemical formula 2, by a reaction of a halogenated borazine compound represented by the chemical formula 1 with a Grignard reagent, thus synthesized alkylborazine compound is washed with water, or subjected to sublimation purification or distillation purification at least three times, and/or subjected to distillation purification at least twice. In the formulas, R1 independently represents alkyl group; R2 independently represents alkyl group; and X represents halogen atom.
摘要翻译： 在合成由化学式2表示的烷基硼氮化合物的过程中，通过化学式1表示的卤代环硼氮烷化合物与格氏试剂的反应，合成的烷基硼氮化合物用水洗涤，或进行升华纯化或蒸馏纯化 至少三次，和/或经蒸馏纯化至少两次。 在式中，R 1独立地表示烷基; R 2独立地表示烷基; X表示卤素原子。
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6.发明授权Composition for chemical vapor deposition film-formation and method for production of low dielectric constant film 有权用于化学气相沉积膜形成的组合物和用于制备低介电常数膜的方法公开(公告)号：US08846148B2
公开(公告)日：2014-09-30
申请号：US12084568
申请日：2006-11-15
申请人： Teruhiko Kumada , Hideharu Nobutoki , Naoki Yasuda , Tetsuya Yamamoto , Yasutaka Nakatani , Takuya Kamiyama
发明人： Teruhiko Kumada , Hideharu Nobutoki , Naoki Yasuda , Tetsuya Yamamoto , Yasutaka Nakatani , Takuya Kamiyama
IPC分类号： C23C16/00 , C07F5/02 , C23C16/30 , H01L21/314 , C23C16/34 , H01L21/318
CPC分类号： C23C16/342 , C07F5/02 , C23C16/30 , H01L21/314 , H01L21/318
摘要： A composition for chemical vapor deposition film-formation comprising a borazine compound represented by the Chemical Formula 1 satisfying at least one of a condition that content of each halogen atom in the composition is 100 ppb or less or a condition that content of each metal element in the composition is 100 ppb or less. In the Chemical Formula 1, R1 may be the same or different, and is hydrogen atom, alkyl group, alkenyl group or alkynyl group, and at least one thereof is hydrogen atom; R2 may be the same or different, and is hydrogen atom, alkyl group, alkenyl group or alkynyl group, and at least one thereof is alkyl group, alkenyl group or alkynyl group.
摘要翻译： 一种用于化学气相沉积膜形成的组合物，其包含由化学式1表示的环硼氮烷化合物，其满足组合物中每个卤素原子的含量为100ppb以下的条件中的至少一种或每种金属元素的含量 组合物为100ppb以下。 在化学式1中，R 1可以相同或不同，为氢原子，烷基，链烯基或炔基，其中至少一个为氢原子; R2可以相同或不同，为氢原子，烷基，烯基或炔基，其中至少一个为烷基，烯基或炔基。
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公开(公告)号：US20080188682A1
公开(公告)日：2008-08-07
申请号：US11667122
申请日：2005-10-28
IPC分类号： C07F5/05
CPC分类号： C07F5/02
摘要： In synthesis of hexaalkylborazine represented by the chemical formula 2 from a borazine compound represented by the chemical formula 1, a borazine compound represented by the chemical formula 1 is reacted with an alkene compound, in the presence of a catalyst. Wherein R1s may be the same or different and each R1 represents an alkyl group; and each R2 represents a hydrogen atom or an alkyl group, and at least one of R2s represents a hydrogen atom; and R3s may be the same or different and each R3 represents an alkyl group.
摘要翻译： 在由化学式1表示的环硼氮烷化合物合成由化学式2表示的六烷基硼嗪的情况下，在催化剂存在下，使化学式1表示的环硼氮烷化合物与烯烃化合物反应。 其中R 1可以相同或不同，并且每个R 1表示烷基; 并且每个R 2表示氢原子或烷基，R 2 2中的至少一个表示氢原子; R 3可以相同或不同，并且每个R 3表示烷基。
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8.发明申请Composition for Chemical Vapor Deposition Film-Formation and Method for Production of Low Dielectric Constant Film 有权化学气相沉积薄膜形成的组成和低介电常数薄膜的制造方法公开(公告)号：US20090232987A1
公开(公告)日：2009-09-17
申请号：US12084568
申请日：2006-11-15
申请人： Teruhiko Kumada , Hideharu Nobutoki , Naoki Yasuda , Tetsuya Yamamoto , Yasutaka Nakatani , Takuya Kamiyama
发明人： Teruhiko Kumada , Hideharu Nobutoki , Naoki Yasuda , Tetsuya Yamamoto , Yasutaka Nakatani , Takuya Kamiyama
CPC分类号： C23C16/342 , C07F5/02 , C23C16/30 , H01L21/314 , H01L21/318
摘要： The present invention provides a composition for chemical vapor deposition film-formation comprising a borazine compound represented by the Chemical Formula 1 satisfying at least one of a condition that content of each halogen atom in the composition is 100 ppb or less or a condition that content of each metal element in the composition is 100 ppb or less. In the Chemical Formula 1, R1 may be the same or different, and is hydrogen atom, alkyl group, alkenyl group or alkynyl group, and at least one thereof is hydrogen atom; R2 may be the same or different, and is hydrogen atom, alkyl group, alkenyl group or alkynyl group, and at least one thereof is alkyl group, alkenyl group or alkynyl group. By using the composition, physical properties such as low dielectric constant property and mechanical strength of the thin film produced from a borazine-ring-containing compound can be improved.
摘要翻译： 本发明提供一种化学气相沉积膜形成用组合物，其含有化学式1表示的环硼氮烷化合物，其满足以下条件中的至少一种：组合物中的各卤素原子的含量为100ppb以下， 组合物中的每种金属元素为100ppb以下。 在化学式1中，R 1可以相同或不同，为氢原子，烷基，链烯基或炔基，其中至少一个为氢原子; R2可以相同或不同，为氢原子，烷基，烯基或炔基，其中至少一个为烷基，烯基或炔基。 通过使用该组合物，可以提高由含有环硼氮烷的化合物制造的薄膜的低介电常数性能和机械强度等物理性能。
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公开(公告)号：US07662998B2
公开(公告)日：2010-02-16
申请号：US11667122
申请日：2005-10-28
IPC分类号： C07F5/02
CPC分类号： C07F5/02
摘要： In synthesis of hexaalkylborazine represented by the chemical formula 2 from a borazine compound represented by the chemical formula 1, a borazine compound represented by the chemical formula 1 is reacted with an alkene compound, in the presence of a catalyst. Wherein R1s may be the same or different and each R1 represents an alkyl group; and each R2 represents a hydrogen atom or an alkyl group, and at least one of R2s represents a hydrogen atom; and R3s may be the same or different and each R3 represents an alkyl group.
摘要翻译： 在由化学式1表示的环硼氮烷化合物合成由化学式2表示的六烷基硼嗪的情况下，在催化剂存在下，使化学式1表示的环硼氮烷化合物与烯烃化合物反应。 其中R 1可以相同或不同，并且每个R 1表示烷基; 并且每个R 2表示氢原子或烷基，并且R 2中的至少一个表示氢原子; 并且R 3可以相同或不同，并且每个R 3表示烷基。
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公开(公告)号：US20050177002A1
公开(公告)日：2005-08-11
申请号：US11013192
申请日：2004-12-15
CPC分类号： C07F5/022
摘要： In the process of synthesizing alkylborazine compound represented by the chemical formula 2, by a reaction of a halogenated borazine compound represented by the chemical formula 1 with a Grignard reagent, thus synthesized alkylborazine compound is washed with water, or subjected to sublimation purification or distillation purification at least three times, and/or subjected to distillation purification at least twice. In the formulas, R1 independently represents alkyl group; R2 independently represents alkyl group; and X represents halogen atom.
摘要翻译： 在合成由化学式2表示的烷基硼氮化合物的过程中，通过化学式1表示的卤代环硼氮烷化合物与格氏试剂的反应，合成的烷基硼氮化合物用水洗涤，或进行升华纯化或蒸馏纯化 至少三次，和/或经蒸馏纯化至少两次。 在式中，R 1独立地表示烷基; R 2独立地表示烷基; X表示卤素原子。
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