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公开(公告)号:US11655572B2
公开(公告)日:2023-05-23
申请号:US16690276
申请日:2019-11-21
IPC分类号: B29C35/08 , B29C61/04 , B32B38/00 , B32B3/26 , D04H1/558 , A61F13/537 , B32B5/26 , D04H1/485
CPC分类号: D04H1/558 , A61F13/53708 , B29C61/04 , B32B3/266 , B32B5/26 , B32B38/0036 , D04H1/485 , B29C2035/0822 , B32B2038/0088
摘要: Aspects of the present disclosure relate to methods and apparatuses for relofting nonwoven substrates. During the relofting process, a substrate is directed to advance in a first direction such that a length of the substrate is in a facing relationship with a radiation source. The advancing substrate is relofted by irradiating the length of the substrate with infrared radiation from the infrared radiation source. The substrate comprises a first caliper upstream of the radiation source and the substrate comprises a second caliper downstream of the radiation source greater than the first caliper. The substrate may also be redirected around an axis to advance the substrate in a second direction, wherein the second direction is different than the first direction. The axis may be selectively movable between a first position and a second position to selectively subject the substrate to infrared radiation and remove the substrate from the infrared radiation.