公开(公告)号：US20130286471A1

公开(公告)日：2013-10-31

申请号：US13846785

申请日：2013-03-18

申请人： Rolf FREIMANN ,  Norman BAER ,  Guido LIMBACH ,  Thure BOEHM ,  Gero WITTICH

发明人： Rolf FREIMANN ,  Norman BAER ,  Guido LIMBACH ,  Thure BOEHM ,  Gero WITTICH

IPC分类号： G02B5/08

CPC分类号： G02B5/0891 ,  B82Y10/00 ,  G03F7/70316 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/061

摘要： A mirror (1a; 1a′; 1b; 1b′; 1c; 1c′) with a substrate (S) and a layer arrangement configured such that light (32) having a wavelength below 250 nm and incident on the mirror at at least an angle of incidence of between 0° and 30° is reflected with more than 20% of its intensity. The layer arrangement has at least one surface layer system (P′″) having a periodic sequence of at least two periods (P3) of individual layers, wherein the periods (P3) include a high refractive index layer (H′″) and a low refractive index layer (L′″). The layer arrangement has at least one graphine layer. Use of graphene (G, SPL, B) on optical elements reduces surface roughness to below 0.1 nm rms HSFR and/or protects the EUV element against a radiation-induced volume change of more than 1%. Graphene is also employed as a barrier layer to prevent layer interdiffusion.

摘要翻译： 具有衬底（S）的反射镜（1a; 1a'; 1b; 1b'; 1c; 1c'）和被配置为使得波长低于250nm的光（32）被配置成入射到反射镜上的至少 0°和30°之间的入射角反映其强度的20％以上。 层布置具有至少一个具有至少两个单独层的周期（P3）的周期性序列的表面层系统（P“），其中周期（P3）包括高折射率层（H”） 和低折射率层（L“'）。 层布置具有至少一个石墨层。 石墨烯（G，SPL，B）在光学元件上的使用将表面粗糙度降低到低于0.1nm rms HSFR，和/或保护EUV元件免受辐射诱导的体积变化超过1％。 石墨烯也被用作阻挡层以防止层相互扩散。

公开(公告)号：US20090002663A1

公开(公告)日：2009-01-01

申请号：US12129235

申请日：2008-05-29

申请人： Rolf FREIMANN ,  Jens Philipps

发明人： Rolf FREIMANN ,  Jens Philipps

IPC分类号： G03B27/54 ,  G01B9/02

CPC分类号： G03F7/706

摘要： A projection illumination system with a plurality of optical components (29, 32) includes an interferometer arrangement (37) whose components are arranged outside a projection beam path (17) of the projection illumination system. Measurement radiation of the interferometer arrangement strikes a surface (35) of the optical component (29) to be measured under a large angle of incidence (α). Actuators (83, 87) of the projection illumination system can be actuated as a function of a measurement radiation intensity distribution detected using the interferometer arrangement in order to change imaging characteristics of the projection illumination system and to keep them stable in particular also with respect to drifting.

摘要翻译： 具有多个光学部件（29,32）的投影照明系统包括其组件布置在投影照明系统的投影光束路径（17）外侧的干涉仪装置（37）。 干涉仪装置的测量辐射以大的入射角（α）撞击待测量的光学部件（29）的表面（35）。 投影照明系统的致动器（83,87）可以作为使用干涉仪装置检测的测量辐射强度分布的函数来致动，以便改变投影照明系统的成像特性，并且特别地相对于 漂流。

公开(公告)号：US20120249985A1

公开(公告)日：2012-10-04

申请号：US13436804

申请日：2012-03-30

申请人： Lars WISCHMEIER ,  Rolf FREIMANN

发明人： Lars WISCHMEIER ,  Rolf FREIMANN

IPC分类号： G03B27/42 ,  G01B9/08

CPC分类号： G03F1/44 ,  G01M11/0264 ,  G03F7/706 ,  G03F7/70683 ,  G03F7/7085

摘要： A device for measuring an imaging optical system, including: a first grating pattern (6), which is positionable in a beam path upstream of the imaging optical system, having a first grating structure (16), a second grating pattern (8), which is positionable in the beam path (4) downstream of the imaging optical system, having a second grating structure (18), and a sensor unit for the spatially resolving measurement of a superposition fringe pattern produced during the imaging of the first grating structure (16) of the first grating pattern (6) onto the second grating structure (18) of the second grating pattern (8). The first grating structure (16) differs in its correction structures (17) from the second grating structure (18).

摘要翻译： 一种用于测量成像光学系统的装置，包括：第一光栅图案（6），其可位于成像光学系统上游的光束路径中，具有第一光栅结构（16），第二光栅图案（8）， 其位于成像光学系统下游的光束路径（4）中，具有第二光栅结构（18）和用于在第一光栅结构的成像期间产生的叠加条纹图案的空间分辨测量的传感器单元（ 16）到第二光栅图案（8）的第二光栅结构（18）上。 第一光栅结构（16）的校正结构（17）与第二光栅结构（18）不同。

公开(公告)号：US20120229814A1

公开(公告)日：2012-09-13

申请号：US13417487

申请日：2012-03-12

申请人： Rolf FREIMANN ,  Bernd BOERBAND ,  Stefan SCHULTE ,  Albrecht HOF ,  Frank RIEPENHAUSEN ,  Matthias MANGER ,  Dietmar NEUGEBAUER ,  Helmut ISSLER ,  Armin BICH

发明人： Rolf FREIMANN ,  Bernd BOERBAND ,  Stefan SCHULTE ,  Albrecht HOF ,  Frank RIEPENHAUSEN ,  Matthias MANGER ,  Dietmar NEUGEBAUER ,  Helmut ISSLER ,  Armin BICH

IPC分类号： G01B11/24 ,  G02B3/02

CPC分类号： G01B11/2441 ,  G01B9/02027 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02072 ,  G01B2290/15 ,  G01M11/005 ,  G01M11/025 ,  G01M11/0271 ,  G02B3/02 ,  G02B5/10

摘要： Measuring a shape of an optical surface (14) of a test object (12) includes: providing an interferometric measuring device (16) generating a measurement wave (18); arranging the measuring device (16) and the test object (12) consecutively at different measurement positions relative to each other, such that different regions (20) of the optical surface (14) are illuminated by the measurement wave (18); measuring positional coordinates of the measuring device (16) at the different measurement positions in relation to the test object (12); obtaining surface region measurements by interferometrically measuring the wavefront of the measurement wave (18) after interaction with the respective region (20) of the optical surface (14) using the measuring device (16) in each of the measurement positions; and determining the actual shape of the optical surface (14) by computationally combining the sub-surface measurements based on the measured positional coordinates of the measuring device (16) at each of the measurement positions.

摘要翻译： 测量被测物体（12）的光学表面（14）的形状包括：提供产生测量波（18）的干涉测量装置（16）; 使测量装置（16）和测试对象（12）相对于彼此的不同测量位置连续布置，使得光学表面（14）的不同区域（20）被测量波（18）照亮; 测量所述测量装置（16）在与所述测试对象（12）相关的不同测量位置处的位置坐标; 通过在每个测量位置中使用测量装置（16）在与光学表面（14）的相应区域（20）相互作用之后干涉测量测量波（18）的波前来获得表面区域测量; 以及通过基于在每个测量位置处测量的测量装置（16）的测量的位置坐标计算地组合子表面测量来确定光学表面（14）的实际形状。

公开(公告)号：US20120127481A1

公开(公告)日：2012-05-24

申请号：US13361442

申请日：2012-01-30

申请人： Frank SCHILLKE ,  Rolf FREIMANN ,  Matthias DREHER

发明人： Frank SCHILLKE ,  Rolf FREIMANN ,  Matthias DREHER

IPC分类号： G01B11/02

CPC分类号： G01B11/2441 ,  G01B9/02039

摘要： An optical element having an optical surface (12; 103), which optical surface has an actual shape, the actual shape deviating from a desired shape by maximum 0.2 nm, wherein the desired shape is either: a free-form surface having a deviation from its best-fitting sphere of at least 5 μm or a substantially rotationally symmetrical surface having a deviation from its best-fitting sphere of at least 0.5 mm.

摘要翻译： 一种具有光学表面（12; 103）的光学元件，该光学表面具有实际形状，实际形状偏离所需形状最大为0.2nm，其中所需形状为：自由曲面与 其最适合的球体至少为5μm，或者具有与其最佳拟合球体至少为0.5mm的偏差的基本上旋转对称的表面。

公开(公告)号：US20110164232A1

公开(公告)日：2011-07-07

申请号：US12983735

申请日：2011-01-03

申请人： Rolf FREIMANN ,  Ulrich Wegmann

发明人： Rolf FREIMANN ,  Ulrich Wegmann

IPC分类号： G03B27/54 ,  G03B27/32 ,  G01J1/44

CPC分类号： G03F7/70491 ,  G01B9/02018 ,  G01B9/02028 ,  G01B9/02065 ,  G01B9/0209 ,  G01B11/002 ,  G01N21/95607 ,  G01N2021/95615 ,  G01N2021/95676 ,  G03F7/70 ,  G03F7/70258 ,  G03F7/706 ,  G03F7/7085

摘要： An optical imaging device, in particular for microlithography, including an imaging unit adapted to image an object point on an image point and a measurement device. The imaging unit has a first optical element group having at least one first optical element. The imaging device is adapted to participate in the imaging of the object point on the image point, and the measurement unit is adapted to determine at least one image defect occurring on the image point when the object point is imaged. The measuring device includes at least one measurement light source, one second optical element group and at least one detection unit. The measurement light source transmits at least one measurement light bundle. The second optical element group includes at least one optical reference element and one second optical element, the elements adapted to direct the at least one measurement light bundle to the at least one detection unit, to produce at least one detection signal. The second optical element has a defined spatial relationship with the first optical element. The optical reference element has an at least partially reflecting first optical surface and the second optical element has an at least partially reflecting second optical surface. The measurement device is adapted to determine the at least one image defect using the at least one detection signal. The first optical surface and the second optical surface are positioned relative to one another such that a multiple reflection of the at least one measurement light bundle occurs between them.

摘要翻译： 一种光学成像装置，特别是用于微光刻，包括适于对图像点上的物点进行成像的成像单元和测量装置。 成像单元具有具有至少一个第一光学元件的第一光学元件组。 成像装置适于参与图像点上的对象点的成像，并且测量单元适于确定当对象点成像时在图像点上发生的至少一个图像缺陷。 测量装置包括至少一个测量光源，一个第二光学元件组和至少一个检测单元。 测量光源透射至少一个测量光束。 第二光学元件组包括至少一个光学参考元件和一个第二光学元件，所述元件适于将至少一个测量光束引导到至少一个检测单元，以产生至少一个检测信号。 第二光学元件与第一光学元件具有限定的空间关系。 光学参考元件具有至少部分反射的第一光学表面，并且第二光学元件具有至少部分反射的第二光学表面。 测量装置适于使用至少一个检测信号来确定至少一个图像缺陷。 第一光学表面和第二光学表面相对于彼此定位，使得在它们之间发生至少一个测量光束的多次反射。