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公开(公告)号：US08915992B2
公开(公告)日：2014-12-23
申请号：US13359790
申请日：2012-01-27
申请人： Timothy John Maykut , Suhas Narayan Ketkar , Benjamin James Arthur Inman , John Irven , Eugene Joseph Karwacki, Jr. , Neil Alexander Downie
发明人： Timothy John Maykut , Suhas Narayan Ketkar , Benjamin James Arthur Inman , John Irven , Eugene Joseph Karwacki, Jr. , Neil Alexander Downie
摘要： A system for providing a high purity acetylene comprising 100 ppm or less solvent to a point of use comprising a storage vessel that houses an acetylene feed steam comprising acetylene and solvent; a cooling system that maintains the storage vessel and provides the acetylene feed stream at a temperature ranging from 20° C. to −50° C.; and a purifier in fluid communication with the storage vessel wherein the acetylene feed stream is introduced into the purifier at a temperature ranging from −50° C. to 30° C. to remove at least a portion of the solvent contained therein and provide the high purity acetylene.
摘要翻译： 一种用于提供包含100ppm或更少溶剂的高纯度乙炔的系统，其用途包括容纳包含乙炔和溶剂的乙炔进料蒸汽的储存容器; 冷却系统，其维持储存容器并在20℃至-50℃的温度范围内提供乙炔进料流; 以及与储存容器流体连通的净化器，其中乙炔进料流在-50℃至30℃的温度下引入净化器中以除去其中所含的至少一部分溶剂，并提供高 纯乙炔。
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公开(公告)号：US20120118763A1
公开(公告)日：2012-05-17
申请号：US13359790
申请日：2012-01-27
申请人： Timothy John Maykut , Suhas Narayan Ketkar , Benjamin James Arthur Inman , John Irven , Eugene Joseph Karwacki, JR. , Neil Alexander Downie
发明人： Timothy John Maykut , Suhas Narayan Ketkar , Benjamin James Arthur Inman , John Irven , Eugene Joseph Karwacki, JR. , Neil Alexander Downie
IPC分类号： B65B3/00
摘要： A system for providing a high purity acetylene comprising 100 ppm or less solvent to a point of use comprising a storage vessel that houses an acetylene feed steam comprising acetylene and solvent; a cooling system that maintains the storage vessel and provides the acetylene feed stream at a temperature ranging from 20° C. to −50° C.; and a purifier in fluid communication with the storage vessel wherein the acetylene feed stream is introduced into the purifier at a temperature ranging from −50° C. to 30° C. to remove at least a portion of the solvent contained therein and provide the high purity acetylene.
摘要翻译： 一种用于提供包含100ppm或更少溶剂的高纯度乙炔的系统，其用途包括容纳包含乙炔和溶剂的乙炔进料蒸汽的储存容器; 冷却系统，其维持储存容器并在20℃至-50℃的温度范围内提供乙炔进料流; 以及与储存容器流体连通的净化器，其中乙炔进料流在-50℃至30℃的温度下引入净化器中以除去其中所含的至少一部分溶剂，并提供高 纯乙炔。
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公开(公告)号：US08129577B2
公开(公告)日：2012-03-06
申请号：US12554052
申请日：2009-09-04
申请人： Timothy John Maykut , Suhas Narayan Ketkar , Benjamin James Arthur Inman , John Irven , Eugene Joseph Karwacki, Jr. , Neil Alexander Downie
发明人： Timothy John Maykut , Suhas Narayan Ketkar , Benjamin James Arthur Inman , John Irven , Eugene Joseph Karwacki, Jr. , Neil Alexander Downie
IPC分类号： B65B1/04
摘要： A system and a process for providing acetylene, preferably at a high purity level (e.g., comprising 100 parts per million (“ppm”), or 10 ppm, or 1 ppm, or 100 parts per billion (“ppb”), or 10 ppb, or 1 ppb or less of solvent), to a point of use, such as a semiconductor manufacturing process, is described herein. In one aspect, there is provided a process for providing a process for providing a high purity acetylene comprising 100 ppm or less solvent to a point of use comprising: providing an acetylene feed stream comprising acetylene and solvent at a temperature ranging from 20° C. to −50° C.; and introducing the acetylene feed stream to a purifier at a temperature ranging from −50° C. to 30° C. to remove at least a portion of the solvent contained therein and provide the high purity acetylene.
摘要翻译： 用于提供乙炔的系统和方法，优选在高纯度水平（例如，包括100ppm（“ppm”）或10ppm，或1ppm，或100ppm（“ppb”）或10 ppb或1ppb或更少的溶剂），到本文中描述的诸如半导体制造工艺的使用点。 在一个方面，提供了一种方法，用于提供一种方法，该方法提供包含100ppm或更少溶剂的高纯度乙炔到使用点，包括：在20℃的温度下提供包含乙炔和溶剂的乙炔进料流 至-50℃。 并在-50℃至30℃的温度范围内将乙炔进料流引入净化器中以除去其中所含溶剂的至少一部分，并提供高纯度乙炔。
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公开(公告)号：US20100069689A1
公开(公告)日：2010-03-18
申请号：US12554052
申请日：2009-09-04
申请人： Timothy John Maykut , Suhas Narayan Ketkar , Benjamin James Arthur Inman , John Irven , Eugene Joseph Karwacki, JR. , Neil Alexander Downie
发明人： Timothy John Maykut , Suhas Narayan Ketkar , Benjamin James Arthur Inman , John Irven , Eugene Joseph Karwacki, JR. , Neil Alexander Downie
摘要： A system and a process for providing acetylene, preferably at a high purity level (e.g., comprising 100 parts per million (“ppm”), or 10 ppm, or 1 ppm, or 100 parts per billion (“ppb”), or 10 ppb, or 1 ppb or less of solvent), to a point of use, such as a semiconductor manufacturing process, is described herein. In one aspect, there is provided a process for providing a process for providing a high purity acetylene comprising 100 ppm or less solvent to a point of use comprising: providing an acetylene feed stream comprising acetylene and solvent at a temperature ranging from 20° C. to −50° C.; and introducing the acetylene feed stream to a purifier at a temperature ranging from −50° C. to 30° C. to remove at least a portion of the solvent contained therein and provide the high purity acetylene.
摘要翻译： 用于提供乙炔的系统和方法，优选在高纯度水平（例如，包括100ppm（“ppm”）或10ppm，或1ppm，或100ppm（“ppb”）或10 ppb或1ppb或更少的溶剂），到本文中描述的诸如半导体制造工艺的使用点。 在一个方面，提供了一种方法，用于提供一种方法，该方法提供包含100ppm或更少溶剂的高纯度乙炔到使用点，包括：在20℃的温度下提供包含乙炔和溶剂的乙炔进料流 至-50℃。 并在-50℃至30℃的温度范围内将乙炔进料流引入净化器中以除去其中所含溶剂的至少一部分，并提供高纯度乙炔。
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