公开(公告)号：US06734967B1

公开(公告)日：2004-05-11

申请号：US09248876

申请日：1999-02-11

申请人： Timothy R. Piwonka-Corle ,  Karen F. Scoffone ,  Xing Chen ,  Lloyd J. Lacomb, Jr. ,  Jean-Louis Stehle ,  Dorian Zahorski ,  John-Pierre Rey

发明人： Timothy R. Piwonka-Corle ,  Karen F. Scoffone ,  Xing Chen ,  Lloyd J. Lacomb, Jr. ,  Jean-Louis Stehle ,  Dorian Zahorski ,  John-Pierre Rey

IPC分类号： G01N2121

CPC分类号： G01N21/211

摘要： A method and system for spectroscopic ellipsometry employing reflective optics to measure a small region of a sample by reflecting radiation (preferably broadband UV, visible, and near infrared radiation) from the region. The system preferably has an autofocus assembly and a processor programmed to determine from the measurements the thickness and/or complex refractive index of a thin film on the sample. Preferably, only reflective optics are employed along the optical path between the polarizer and analyzer, a sample beam reflects with low incidence angle from each component of the reflective optics, the beam is reflectively focused to a small, compact spot on the sample at a range of high incidence angles, and an incidence angle selection element is provided for selecting for measurement only radiation reflected from the sample at a single, selected angle (or narrow range of angles). The focusing mirror preferably has an elliptical shape to reduce off-axis aberrations in the focused beam. Some embodiments include both a spectrophotometer and an ellipsometer integrated together as a single instrument. In such instrument, the spectrophotometer and ellipsometer share a radiation source, and radiation from the source can be focused by either the spectrophotometer or the ellipsometer to the same focal point on a sample. Preferred embodiments of the ellipsometer employ a rotating, minimal-length Rochon prism as a polarizer, and include a spectrometer with an intensified photodiode array to measure reflected radiation from the sample, and a reference channel (in addition to a sample channel which detects radiation reflected from the sample).

摘要翻译： 使用反射光学器件的光谱椭偏仪的方法和系统通过从该区域反射辐射（优选宽带UV，可见光和近红外辐射）来测量样品的小区域。 该系统优选地具有自动对焦组件和被编程用于根据测量结果确定样品上薄膜的厚度和/或复合折射率的处理器。 优选地，沿着偏振器和分析器之间的光路仅采用反射光学元件，样品光束以反射光学器件的每个分量以低入射角反射，光束被反射聚焦到样品上的小的紧密斑点 并且提供入射角选择元件用于仅选择仅以单个选定角度（或窄范围的角度）从样品反射的辐射。 聚焦镜优选具有椭圆形以减少聚焦光束中的离轴像差。 一些实施例包括作为单个仪器集成在一起的分光光度计和椭偏仪。 在这种仪器中，分光光度计和椭偏仪共享一个辐射源，来自源的辐射可以通过分光光度计或椭偏仪聚焦到样品上的同一焦点。 椭偏仪的优选实施例采用旋转的，最小长度的Rochon棱镜作为偏振器，并且包括具有增强的光电二极管阵列的光谱仪，以测量来自样品的反射辐射，以及参考通道（除了检测辐射的样品通道 从样品）。

公开(公告)号：US5608526A

公开(公告)日：1997-03-04

申请号：US375353

申请日：1995-01-19

申请人： Timothy R. Piwonka-Corle ,  Karen F. Scoffone ,  Xing Chen ,  Lloyd J. Lacomb, Jr. ,  Jean-Louis Stehle ,  Dorian Zahorski ,  Jean-Pierre Rey

发明人： Timothy R. Piwonka-Corle ,  Karen F. Scoffone ,  Xing Chen ,  Lloyd J. Lacomb, Jr. ,  Jean-Louis Stehle ,  Dorian Zahorski ,  Jean-Pierre Rey

IPC分类号： G01N21/21

CPC分类号： G01N21/211 ,  G01N2021/213

摘要： A method and system for spectroscopic ellipsometry employing reflective optics to measure a small region of a sample by reflecting radiation (preferably broadband UV, visible, and near infrared radiation) from the region. The system preferably has an autofocus assembly and a processor programmed to determine from the measurements the thickness and/or complex refractive index of a thin film on the sample. Preferably, only reflective optics are employed along the optical path between the polarizer and analyzer, a sample beam reflects with low incidence angle from each component of the reflective optics, the beam is reflectively focused to a small, compact spot on the sample at a range of high incidence angles, and an incidence angle selection element is provided for selecting for measurement only radiation reflected from the sample at a single, selected angle (or narrow range of angles). The focusing mirror preferably has an elliptical shape,to reduce off-axis aberrations in the focused beam. Some embodiments include both a spectrophotometer and an ellipsometer integrated together as a single instrument. In such instrument, the spectrophotometer and ellipsometer share a radiation source, and radiation from the source can be focused by either the spectrophotometer or the ellipsometer to the same focal point on a sample. Preferred embodiments of the ellipsometer employ a rotating, minimal-length Rochon prism as a polarizer, and include a spectrometer with an intensified photodiode array to measure reflected radiation from the sample, and a reference channel (in addition to a sample channel which detects radiation reflected from the sample).

摘要翻译： 使用反射光学器件的光谱椭偏仪的方法和系统通过从该区域反射辐射（优选宽带UV，可见光和近红外辐射）来测量样品的小区域。 该系统优选地具有自动对焦组件和被编程用于根据测量结果确定样品上薄膜的厚度和/或复合折射率的处理器。 优选地，沿着偏振器和分析器之间的光路仅采用反射光学元件，样品光束以反射光学器件的每个分量以低入射角反射，光束被反射聚焦到样品上的小的紧密斑点 并且提供入射角选择元件用于仅选择仅以单个选定角度（或窄范围的角度）从样品反射的辐射。 聚焦镜优选具有椭圆形状，以减少聚焦光束中的离轴像差。 一些实施例包括作为单个仪器集成在一起的分光光度计和椭偏仪。 在这种仪器中，分光光度计和椭偏仪共享一个辐射源，来自源的辐射可以通过分光光度计或椭偏仪聚焦到样品上的同一焦点。 椭偏仪的优选实施例采用旋转的，最小长度的Rochon棱镜作为偏振器，并且包括具有增强的光电二极管阵列的光谱仪，以测量来自样品的反射辐射，以及参考通道（除了检测辐射的样品通道 从样品）。

公开(公告)号：US5910842A

公开(公告)日：1999-06-08

申请号：US753696

申请日：1996-11-27

申请人： Timothy R. Piwonka-Corle ,  Xing Chen ,  Lloyd J. Lacomb, Jr. ,  Jean-Louis Stehle ,  Dorian Zahorski

发明人： Timothy R. Piwonka-Corle ,  Xing Chen ,  Lloyd J. Lacomb, Jr. ,  Jean-Louis Stehle ,  Dorian Zahorski

IPC分类号： G01N21/21

CPC分类号： G01N21/211 ,  G01N2021/213

摘要： A method and system for spectroscopic ellipsometry employing reflective optics to measure a small region of a sample by reflecting radiation (preferably broadband UV, visible, and near infrared radiation) from the region. The system preferably has an autofocus assembly and a processor programmed to determine from the measurements the thickness and/or complex refractive index of a thin film on the sample. Preferably, only reflective optics are employed along the optical path between the polarizer and analyzer, a sample beam reflects with low incidence angle from each component of the reflective optics, the beam is reflectively focused to a small, compact spot on the sample at a range of high incidence angles, and an incidence angle selection element is provided for selecting for measurement only radiation reflected from the sample at a single, selected angle (or narrow range of angles). The focusing mirror preferably has an elliptical shape to reduce off-axis aberrations in the focused beam. Some embodiments include both a spectrophotometer and an ellipsometer integrated together as a single instrument. In such instrument, the spectrophotometer and ellipsometer share a radiation source, and radiation from the source can be focused by either the spectrophotometer or the ellipsometer to the same focal point on a sample. Preferred embodiments of the ellipsometer employ a rotating, minimal-length Rochon prism as a polarizer, and include a spectrometer with an intensified photodiode array to measure reflected radiation from the sample, and a reference channel (in addition to a sample channel which detects radiation reflected from the sample).

摘要翻译： 使用反射光学器件的光谱椭偏仪的方法和系统通过从该区域反射辐射（优选宽带UV，可见光和近红外辐射）来测量样品的小区域。 该系统优选地具有自动对焦组件和被编程用于根据测量结果确定样品上薄膜的厚度和/或复合折射率的处理器。 优选地，沿着偏振器和分析器之间的光路仅采用反射光学元件，样品光束以反射光学器件的每个分量以低入射角反射，光束被反射聚焦到样品上的小的紧密斑点 并且提供入射角选择元件用于仅选择仅以单个选定角度（或窄范围的角度）从样品反射的辐射。 聚焦镜优选具有椭圆形以减少聚焦光束中的离轴像差。 一些实施例包括作为单个仪器集成在一起的分光光度计和椭偏仪。 在这种仪器中，分光光度计和椭偏仪共享一个辐射源，来自源的辐射可以通过分光光度计或椭偏仪聚焦到样品上的同一焦点。 椭偏仪的优选实施例采用旋转的，最小长度的Rochon棱镜作为偏振器，并且包括具有增强的光电二极管阵列的光谱仪，以测量来自样品的反射辐射，以及参考通道（除了检测辐射的样品通道 从样品）。

公开(公告)号：US20050105090A1

公开(公告)日：2005-05-19

申请号：US11007420

申请日：2004-12-07

申请人： Timothy Piwonka-Corle ,  Karen Scoffone ,  Xing Chen ,  Lloyd Lacomb ,  Jean-Louis Stehle ,  Dorian Zahorski ,  John-Pierre Rey

发明人： Timothy Piwonka-Corle ,  Karen Scoffone ,  Xing Chen ,  Lloyd Lacomb ,  Jean-Louis Stehle ,  Dorian Zahorski ,  John-Pierre Rey

IPC分类号： G01N21/21 ,  G01J4/00

CPC分类号： G01N21/211 ,  G01N2021/213

摘要： A method and system for spectroscopic ellipsometry employing reflective optics to measure a small region of a sample by reflecting radiation (preferably broadband UV, visible, and near infrared radiation) from the region. The system preferably has an autofocus assembly and a processor programmed to determine from the measurements the thickness and/or complex refractive index of a thin film on the sample. Preferably, only reflective optics are employed along the optical path between the polarizer and analyzer, a sample beam reflects with low incidence angle from each component of the reflective optics, the beam is reflectively focused to a small, compact spot on the sample at a range of high incidence angles, and an incidence angle selection element is provided for selecting for measurement only radiation reflected from the sample at a single, selected angle (or narrow range of angles). The focusing mirror preferably has an elliptical shape to reduce off-axis aberrations in the focused beam. Some embodiments include both a spectrophotometer and an ellipsometer integrated together as a single instrument. In such instrument, the spectrophotometer and ellipsometer share a radiation source, and radiation from the source can be focused by either the spectrophotometer or the ellipsometer to the same focal point on a sample. Preferred embodiments of the ellipsometer employ a rotating, minimal-length Rochon prism as a polarizer, and include a spectrometer with an intensified photodiode array to measure reflected radiation from the sample, and a reference channel (in addition to a sample channel which detects radiation reflected from the sample).

摘要翻译： 使用反射光学器件的光谱椭偏仪的方法和系统通过从该区域反射辐射（优选宽带UV，可见光和近红外辐射）来测量样品的小区域。 该系统优选地具有自动对焦组件和被编程用于根据测量结果确定样品上薄膜的厚度和/或复合折射率的处理器。 优选地，沿着偏振器和分析器之间的光路仅采用反射光学元件，样品光束以反射光学器件的每个分量以低入射角反射，光束被反射聚焦到样品上的小的紧密斑点 并且提供入射角选择元件用于仅选择仅以单个选定角度（或窄范围的角度）从样品反射的辐射。 聚焦镜优选具有椭圆形以减少聚焦光束中的离轴像差。 一些实施例包括作为单个仪器集成在一起的分光光度计和椭偏仪。 在这种仪器中，分光光度计和椭偏仪共享一个辐射源，来自源的辐射可以通过分光光度计或椭偏仪聚焦到样品上的同一焦点。 椭偏仪的优选实施例采用旋转的，最小长度的Rochon棱镜作为偏振器，并且包括具有增强的光电二极管阵列的光谱仪，以测量来自样品的反射辐射，以及参考通道（除了检测辐射的样品通道 从样品）。

公开(公告)号：US5991037A

公开(公告)日：1999-11-23

申请号：US386

申请日：1998-01-27

申请人： Jean-Philippe Piel ,  Jean-Louis Stehle ,  Dorian Zahorski

发明人： Jean-Philippe Piel ,  Jean-Louis Stehle ,  Dorian Zahorski

IPC分类号： G01N21/21

CPC分类号： G01N21/211

摘要： The ellipsometry device includes a first focusing device, combined with a first optical system, for focusing the light beam from the first optical system onto the sample, a second focusing device, combined with a second optical system, for focusing the beam reflected by the sample surface onto the input of the second optical system, and an optical correction device for correcting, together with the first and second focusing devices, the position of the focused reflected beam so as to reject the interference reflections generated by the surface of the sample opposite the light beam receiving surface, and to obtain a maximum signal level at the photodetector.

摘要翻译： PCT No.PCT / FR96 / 01035 Sec。 371日期：1998年1月27日 102（e）1998年1月27日PCT PCT 1996年7月3日PCT公布。 公开号WO97 / 07392 日期1997年2月27日椭圆测量装置包括与第一光学系统组合的第一聚焦装置，用于将来自第一光学系统的光束聚焦到样品上，与第二光学系统组合的第二聚焦装置， 由样品表面反射的光束到第二光学系统的输入上;以及光学校正装置，用于与第一和第二聚焦装置一起校正聚焦反射光束的位置，以便抑制表面产生的干涉反射 并且在光电检测器处获得最大信号电平。

公开(公告)号：US06687002B2

公开(公告)日：2004-02-03

申请号：US09866503

申请日：2001-05-25

申请人： Jean-Louis Stehle ,  Pierre Boher

发明人： Jean-Louis Stehle ,  Pierre Boher

IPC分类号： G01J400

CPC分类号： G01N21/211 ,  H01L22/12

摘要： An ellipsometric metrology apparatus for a sample contained in a chamber. A light source outside the chamber produces the illuminating beam. A polarizing device outside the chamber polarizes the illuminating beam. A window of selected dimensions and features is disposed in a plane substantially parallel to the sample surface and at least partly closes the chamber. A first directing device directs the polarized illuminating beam on to an area of the sample along a first optical path extending from the polarizing device to the area of the sample through the window. The first optical path forms a predetermined oblique angle of incidence relative to the sample surface. A polarization analyzing device is outside the chamber, a second directing device directs the reflected beam resulting from the illumination of the sample by the illuminating beam on to the analyzing device along a second optical path extending from the sample towards the analyzing device through the window. The reflected beam is symmetrical to the illuminating beam relative to a normal to the sample surface. A detecting device detects the output beam transmitted by the analyzing device in order to supply an output signal processing means processes the output signal in order to determine the changes in stage of polarization in phase and in amplitude caused by the reflection on the area of the sample.

摘要翻译： 用于容纳在室中的样品的椭偏计量测量装置。 室外的光源产生照明光束。 室外的偏振装置使照明光束偏振。 所选择的尺寸和特征的窗口设置在基本上平行于样品表面的平面中并且至少部分地封闭室。 第一引导装置将偏振照明光束沿着从偏振装置延伸到通过窗口的样品区域的第一光路引导到样品的区域。 第一光路相对于样品表面形成预定的入射角。 偏振分析装置在室外，第二引导装置将通过照射光束照射的样品产生的反射光束沿着从样品向分析装置通过窗口延伸的第二光路引导到分析装置。 反射光束相对于样品表面的法线对称于照明光束。 检测装置检测由分析装置发送的输出光束，以便提供输出信号处理装置处理输出信号，以便确定由样本面积上的反射引起的相位和幅度偏振阶段的变化 。

公开(公告)号：US07763394B2

公开(公告)日：2010-07-27

申请号：US10587194

申请日：2005-01-26

申请人： Jean-Louis Stehle

发明人： Jean-Louis Stehle

IPC分类号： G03F1/14 ,  A61N5/00 ,  G03B27/62

CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/62

摘要： A mask (MM) with patterns (MF) for use in a reflection lithography device with a photon beam with a wavelength of less than about 120 nm. Said mask (MM) comprises a planar substrate (ST) fixed to a reflecting structure (SMR) comprising a front face provided with selected patterns (MF) made from a material which is absorbent at the given wavelength and further comprises protection means (SP) which are transparent to the given wavelength and arranged such as to maintain a distance (H) between the perturbing particles (PP) and the patterns (MF) greater than or equal to one of the values of the depth of focus of the lithographic device and the height associated with the percentage of photon absorption by the perturbing particles (PP) which is acceptable.

摘要翻译： 具有图案（MF）的掩模（MM），用于具有波长小于约120nm的光子束的反射光刻设备。 所述掩模（MM）包括固定到反射结构（SMR）的平面基板（ST），该平面基板包括具有由以给定波长吸收的材料制成的选定图案（MF）的正面，并且还包括保护装置（SP） 其对于给定的波长是透明的，并且布置成保持扰动颗粒（PP）和图案（MF）之间的距离（H）大于或等于光刻设备的焦深深度值之一，以及 与通过扰动颗粒（PP）的光子吸收百分比相关的高度是可以接受的。

公开(公告)号：US07714992B2

公开(公告)日：2010-05-11

申请号：US11991613

申请日：2006-09-11

申请人： Jean-Philippe Piel ,  Jean-Louis Stehle

发明人： Jean-Philippe Piel ,  Jean-Louis Stehle

IPC分类号： G01N21/41

CPC分类号： G03F7/70858 ,  G01N21/431 ,  G03F7/70341

摘要： The invention concerns an equipment for monitoring an immersion lithography device provided with a main light source and a projection optics for printing images on a wafer. The propagating medium extending from the projection optics to the wafer consists of a liquid (3). The equipment comprises: a chamber (51) for receiving at least part of said liquid (3), a diffraction grating (50) immersed in the chamber; a secondary light source (271) for emitting a secondary incident beam (20) towards the grating so as to obtain a diffracted beam; angle measuring members (57) capable of measuring at least one diffraction angle corresponding to a maximum intensity of an order of diffraction of the beam diffracted by the grating (500), and computing means (505) for calculating an estimate of a physical quantity concerning the refractive index of the liquid.

摘要翻译： 本发明涉及一种用于监测浸没式光刻设备的设备，该设备具有主光源和用于在晶片上打印图像的投影光学元件。 从投影光学器延伸到晶片的传播介质由液体（3）组成。 该设备包括：用于容纳所述液体（3）的至少一部分的腔室（51），浸入所述腔室中的衍射光栅（50）; 用于向光栅发射次级入射光束（20）的二次光源（271），以便获得衍射光束; 能够测量与由光栅（500）衍射的光束的衍射级的最大强度对应的至少一个衍射角的角度测量部件（57），以及用于计算与光栅（500）相关的物理量的估计的计算装置（505） 液体的折射率。

公开(公告)号：US07230701B2

公开(公告)日：2007-06-12

申请号：US10333415

申请日：2001-07-16

申请人： Jean-Louis Stehle ,  Jean-Philippe Piel ,  Pierre Boher ,  Luc Tantart ,  Jean-Pierre Rey

发明人： Jean-Louis Stehle ,  Jean-Philippe Piel ,  Pierre Boher ,  Luc Tantart ,  Jean-Pierre Rey

IPC分类号： G01J4/00

CPC分类号： G01J4/04 ,  G01N21/211

摘要： The invention concerns an ellipsometer comprising: a source (2) capable of emitting a broadband ray (4), a polarizer (10) for producing a polarised incident beam (12) adapted to illuminate a sample (16) according to at least a selected angle; an analyzer (24) providing an output beam (28) in response to said reflected beam (20) and at least a reflecting optical element (14) arranged between the source (2) and the sample (16) and/or between the sample (16) and the sensor, and capable of focusing the incident beam (12) and/or the reflected beam (20) according to a selected spot The ellipsometer further comprises at least a first refracting optical element (22) arranged between the sample (16) and the sensor and/or between the source (2) and the sample (16) to collect and focus said reflected beam and/or said incident beam, thereby enabling to provide at least a refracting element (22) and a reflecting element (14) on either side of the sample (16) and hence to place the source and the sensor on the same side relative to said spot.

摘要翻译： 本发明涉及一种光谱椭偏仪，包括：能够发射宽带射线（4）的源极（2），用于偏振宽带光束（4）的偏振器（10），以及用于产生适于照射光束的偏振入射光束 至少一个选定角度的样品（16）; 分析器（24），用于接收由所述照明样品（16）反射的光束（20）并响应于所述反射光束（20）产生输出光束（28）; 以及至少一个布置在源（2）和样品（16）之间和/或样品和传感器之间并且能够聚焦入射光束（12）和/或反射光线（12）的反射光学元件（14） 20）根据选定的地点。 椭偏仪还包括布置在样品（16）和传感器之间和/或在源（2）和样品（16）之间的至少第一折射元件（22），以收集和聚焦所述反射光束和/或所述事件 从而能够在样品（16）的任一侧上提供至少一个折射元件（22）和反射元件（14），从而使源和传感器相对于所述光斑位于同一侧。

公开(公告)号：US5329357A

公开(公告)日：1994-07-12

申请号：US50766

申请日：1993-04-21

申请人： Franck Bernoux ,  Jean-Louis Stehle

发明人： Franck Bernoux ,  Jean-Louis Stehle

IPC分类号： G01J3/12 ,  G01N21/21

CPC分类号： G01N21/211 ,  G01J3/12 ,  G01N2201/08

摘要： A spectroscopic ellipsometer comprises a wideband light source, together with a first optical system including a rotating polarizer which applies a parallel beam to a sample contained in an enclosure. The reflected beam is picked up by an analyzer in a second optical system which transmits said reflected beam to a monochromator which is followed by a photodetector which is connected to control electronics connected, in turn, to a microcomputer. An optical fiber is provided between the source and the first optical system. Advantageously, a second optical fiber provided between the second optical system and the monochromator.

摘要翻译： 分光椭偏仪包括宽带光源，以及包括旋转偏振器的第一光学系统，该旋转偏振器将平行光束施加到容纳在外壳中的样品。 反射光束由第二光学系统中的分析仪拾取，该第二光学系统将所述反射光束传输到单色仪，该单色仪之后是连接到控制电子设备的光电检测器，而控制电子设备依次连接到微型计算机。 在光源和第一光学系统之间提供光纤。 有利地，设置在第二光学系统和单色仪之间的第二光纤。