公开(公告)号：US20160293388A1

公开(公告)日：2016-10-06

申请号：US15089011

申请日：2016-04-01

Applicant: Tokyo Electron Limited

Inventor： Lee Chen ,  Colin Campbell ,  Merritt Funk

IPC: H01J37/32

CPC classification number: H01J37/32568 ,  H01J37/32807

Abstract: A plasma processing system for performing a plasma processing application includes a plasma processing chamber, first and second electrodes residing in the plasma processing chamber, and a pneumatic counterbalance system operatively connected to the first electrode. The pneumatic counterbalance system is configured to support and maintain a position of the first electrode during a plasma processing application for gap control. A drive assembly separate from the pneumatic counterbalance system is configured to move the first electrode with respect to the second electrode in the plasma processing chamber for gap adjustment.

Abstract translation: 用于执行等离子体处理应用的等离子体处理系统包括等离子体处理室，位于等离子体处理室中的第一和第二电极以及可操作地连接到第一电极的气动平衡系统。 气动平衡系统构造成在用于间隙控制的等离子体处理应用期间支撑并保持第一电极的位置。 与气动平衡系统分离的驱动组件被配置为相对于等离子体处理室中的第二电极移动第一电极，用于间隙调节。