公开(公告)号：US10807027B2

公开(公告)日：2020-10-20

申请号：US16117664

申请日：2018-08-30

Applicant: Tokyo Electron Limited

Inventor： Katsunori Ichino ,  Tsunenaga Nakashima ,  Hideo Funakoshi ,  Nobuaki Matsuoka ,  Masayuki Kajiwara

IPC: B01D36/00 ,  B01D35/26 ,  B05C11/10 ,  B05C5/00 ,  G03F7/20 ,  H01L21/67 ,  G03F7/30 ,  G03F7/16 ,  H01L21/027

Abstract: A treatment solution supply apparatus to supply a treatment solution to a treatment solution discharge unit via a supply path that is provided with a filter configured to remove foreign substances in the treatment solution and a tubephragm pump to send the treatment solution, the supply path has an opening/closing valve on an upstream side of the tubephragm pump and the filter, and a suck-back valve on a downstream side of the tubephragm pump and the filter, and includes a control unit to control at least the tubephragm pump, the opening/closing valve, and the suck-back valve, wherein the control unit performs: a control of stopping sending of the treatment solution from the tubephragm pump; and a control of suspending discharge of the treatment solution from the treatment solution discharge unit by operation of the suck-back valve, and then closing the opening/closing valve to stop the discharge.

公开(公告)号：US20150096441A1

公开(公告)日：2015-04-09

申请号：US14490887

申请日：2014-09-19

Applicant: Tokyo Electron Limited

Inventor： Tomohiro Iseki ,  Hideo Funakoshi ,  Seiya Totsuka

IPC: B01D19/00

CPC classification number: B01D19/0063 ,  B01D19/0036

Abstract: Disclosed is a bubble removing method in which fine bubbles are removed from a filter to improve the performance of the filter. The bubble removing method includes a step of degassing a processing liquid supplied from a supply source to prepare a highly degassed liquid (highly degassed liquid preparation), a step of supplying the prepared highly degassed liquid at a first processing liquid from a pump device to a filter device (temporary liquid permeation), a step of supplying the highly degassed liquid at a second processing liquid flow rate higher than the first processing liquid flow rate from the pump device to the filter device (initial liquid permeation), and a step of causing the highly degassed liquid to flow from the pump device to the filter device for a predetermined length of time (liquid permeation).

Abstract translation: 公开了一种气泡去除方法，其中从过滤器除去细小气泡以提高过滤器的性能。 气泡去除方法包括对从供给源供给的处理液进行脱气以制备高度脱气的液体（高度脱气的液体制剂）的步骤，将制备的高度脱气的液体从第一处理液体从泵装置供给到 过滤装置（临时液体渗透），以高于第一处理液体流量从泵装置向过滤装置供给高脱气液体的步骤（初始液体渗透），以及引起 高度脱气的液体从泵装置流过过滤器装置达预定长度的时间（液体渗透）。

公开(公告)号：US09649577B2

公开(公告)日：2017-05-16

申请号：US14490887

申请日：2014-09-19

Applicant: Tokyo Electron Limited

Inventor： Tomohiro Iseki ,  Hideo Funakoshi ,  Seiya Totsuka

IPC: B01D19/00

CPC classification number: B01D19/0063 ,  B01D19/0036

Abstract: Disclosed is a bubble removing method in which fine bubbles are removed from a filter to improve the performance of the filter. The bubble removing method includes a step of degassing a processing liquid supplied from a supply source to prepare a highly degassed liquid (highly degassed liquid preparation), a step of supplying the prepared highly degassed liquid at a first processing liquid from a pump device to a filter device (temporary liquid permeation), a step of supplying the highly degassed liquid at a second processing liquid flow rate higher than the first processing liquid flow rate from the pump device to the filter device (initial liquid permeation), and a step of causing the highly degassed liquid to flow from the pump device to the filter device for a predetermined length of time (liquid permeation).