公开(公告)号：US10714355B2

公开(公告)日：2020-07-14

申请号：US16018466

申请日：2018-06-26

Applicant: Tokyo Electron Limited

Inventor： Hiroki Sato ,  Hisashi Hirose

IPC: H01L21/3065 ,  H01J37/32 ,  H01L21/683 ,  H01L21/67 ,  H01L21/311

Abstract: A shape of a hole can be improved. The plasma etching method includes a recess forming of forming a recess having a depth smaller than a thickness of a silicon oxide film by etching the silicon oxide film by plasma; a removing process of removing a reaction product adhering to the recess by plasma generated from a fluorocarbon gas; and a penetrating process of forming a hole penetrating the silicon oxide film by etching the recess, from which the reaction product is removed, by plasma.

公开(公告)号：US20190006186A1

公开(公告)日：2019-01-03

申请号：US16018466

申请日：2018-06-26

Applicant: Tokyo Electron Limited

Inventor： Hiroki Sato ,  Hisashi Hirose

IPC: H01L21/3065 ,  H01J37/32 ,  H01L21/683

Abstract: A shape of a hole can be improved. The plasma etching method includes a recess forming of forming a recess having a depth smaller than a thickness of a silicon oxide film by etching the silicon oxide film by plasma; a removing process of removing a reaction product adhering to the recess by plasma generated from a fluorocarbon gas; and a penetrating process of forming a hole penetrating the silicon oxide film by etching the recess, from which the reaction product is removed, by plasma.

公开(公告)号：US11199785B2

公开(公告)日：2021-12-14

申请号：US17030735

申请日：2020-09-24

Applicant: Tokyo Electron Limited

Inventor： Tsuyoshi Watanabe ,  Masashi Tsuchiyama ,  Hiroki Sato ,  Ippei Hamada

IPC: G03F7/20 ,  H01L21/67 ,  G03F7/16

Abstract: An apparatus includes: a treatment block including treatment modules; and a relay block coupling the treatment block and an exposure apparatus in a width direction, and including a transfer-in/out mechanism for the exposure apparatus. In the treatment block being multilayered in an up-down direction, a transfer mechanism is provided in a transfer region extending in the width direction. In a layer, in the treatment block, at a position accessible from the transfer-in/out mechanism, a deliverer on which the substrate is mounted when the substrate is delivered between the blocks is provided at an end on the relay block side. Pre-exposure storages storing the substrate before the exposure are provided along the width direction in two regions between which the transfer region is interposed in a depth direction. A non-treatment unit is provided at a portion where the pre-exposure storages are not provided in the two regions.

公开(公告)号：US11079691B2

公开(公告)日：2021-08-03

申请号：US17030810

申请日：2020-09-24

Applicant: Tokyo Electron Limited

Inventor： Tsuyoshi Watanabe ,  Masashi Tsuchiyama ,  Hiroki Sato ,  Ippei Hamada

IPC: G03F7/20 ,  H01L21/677 ,  G03F7/16 ,  H01L21/67

Abstract: An apparatus includes: a treatment block; and a relay block including a first transfer-in/out module for an exposure apparatus. In the treatment block, a treatment module is provided in each layer, and a deliverer is provided at an end on the relay block side in the layer including a pre-exposure treatment module. In the relay block, a second transfer-in/out module for the deliverer and a post-exposure treatment module is provided in a region adjacent, in the width direction, to the deliverer, the first transfer-in/out module is provided in a relay side transfer region extending in a depth direction from a region overlapping with the second transfer-in/out module, the post-exposure treatment module is provided in a region adjacent, in an up-down direction, to the relay side transfer region and adjacent, in the depth direction, to the second transfer-in/out module, and a relay mechanism is provided.