公开(公告)号：US20130226752A1

公开(公告)日：2013-08-29

申请号：US13861657

申请日：2013-04-12

申请人： Tokyo Electron Limited

发明人： Tsuyoshi Moriya ,  Kenichi Kataoka ,  Shigeru Senzaki ,  Youichi Shimanuki ,  Kazuhiko Kano

IPC分类号： G06Q30/04

CPC分类号： G06Q30/04 ,  B01D61/12 ,  C02F1/008 ,  G06Q20/145 ,  G06Q30/0207 ,  G06Q50/06 ,  G07F13/025 ,  G07F15/12 ,  G07F17/0021 ,  Y02A20/16

摘要： To provide a billing method for use of a water purification system that gives incentives for using the water purification system. Such a water purification system is equipped with water purification apparatus having controller and with monitoring server connected to water purification apparatus via public network and having controller. Filtration filter of water purification apparatus has water quality sensor, which measures water quality data of inflow water, and water quality sensor, which measures water quality data of purified water. Water quality data measured by water quality sensors are transmitted to controller and controller. Usage fees for the water purification system are calculated corresponding to improvement rates of water quality, which are calculated based on water quality data of inflow water and water quality data of purified water.

摘要翻译： 提供使用水净化系统的计费方法，其给予使用水净化系统的激励。 这种水净化系统配备有具有控制器的净水装置，监控服务器通过公共网络连接到净水装置并具有控制器。 水净化装置过滤器具有水质传感器，用于测量入水水质数据，水质传感器，用于测量净水水质数据。 由水质传感器测量的水质数据传输给控制器和控制器。 水净化系统的使用费用是根据水质改善率计算的，这是根据流入水质量数据和纯净水水质数据计算出来的。

公开(公告)号：US20130240479A1

公开(公告)日：2013-09-19

申请号：US13890529

申请日：2013-05-09

申请人： Tokyo Electron Limited

发明人： Tsuyoshi MORIYA ,  Kenichi Kataoka ,  Shigeru Senzaki ,  Youichi Shimanuki ,  Kazuhiko Kano ,  Yu Wamura ,  Song yun Kang ,  Eiichi Nishimura

IPC分类号： B01D67/00

CPC分类号： B01D67/0023 ,  B01D61/025 ,  B01D67/0034 ,  B01D67/0062 ,  B01D69/10 ,  B01D71/022 ,  B01D71/024 ,  B01D2323/225 ,  B01D2323/24 ,  B01D2323/283 ,  B01D2325/02 ,  B01D2325/08 ,  B01D2325/48 ,  Y10T156/10

摘要： To provide a method for producing a filtration filter that can simplify the process for providing clean water or freshwater. By etching silicon substrate 1 using masking film formed on a surface of substrate 1 and having numerous openings to expose portions of the surface, numerous circular holes 2 with an approximate diameter of 100 nm are formed in substrate 1. Diameter (D1) at minimum-diameter portions 4 near the openings of circular holes 2 to be reduced by silica film 3 is adjusted to be 1 nm˜100 nm by depositing silica film 3 on the inner surfaces of circular holes 2.

摘要翻译： 提供一种生产可以简化提供清水或淡水的过程的过滤器的方法。 通过使用形成在基板1的表面上并且具有许多开口以暴露表面部分的掩模膜来蚀刻硅基板1，在基板1中形成大约直径为100nm的许多圆形孔2。 通过将二氧化硅膜3还原的圆形孔2的开口附近的直径部分4通过在圆形孔2的内表面上沉积二氧化硅膜3而调节为1nm〜100nm。