公开(公告)号：US20130228200A1

公开(公告)日：2013-09-05

申请号：US13779969

申请日：2013-02-28

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takahisa Otsuka ,  Hirotaka Maruyama ,  Nobuhiro Ogata ,  Kazuyuki Kudo

IPC: B08B3/04

CPC classification number: B08B3/04 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/6715

Abstract: Provided is a liquid processing apparatus that selectively supplies processing liquids with a switching operation to the surface of a substrate to perform a liquid processing. The liquid processing apparatus includes a first processing liquid supply unit including a first nozzle block that selectively supplies an acidic chemical liquid and a rinse liquid, and a second processing liquid supply unit including a second nozzle block that selectively supplies an alkaline chemical liquid and a rinse liquid. When a chemical liquid is supplied to the substrate from one of the first and second nozzle blocks, the other of the first and second nozzle blocks is retreated to a retreat position. When the rinse liquid is supplied to the substrate from one of the first and second nozzle blocks, the other of the first and second nozzle blocks is moved to a processing position.

Abstract translation: 提供了一种液体处理装置，其选择性地向处理液体表面提供切换操作以进行液体处理。 液体处理装置包括第一处理液体供给单元，其包括选择性地供给酸性化学液体和冲洗液体的第一喷嘴块，以及第二处理液体供给单元，其包括选择性地供给碱性化学液体和冲洗液的第二喷嘴块 液体。 当从第一和第二喷嘴块中的一个向基板提供化学液体时，第一和第二喷嘴块中的另一个被退回到退避位置。 当冲洗液体从第一和第二喷嘴块之一提供给基板时，第一和第二喷嘴块中的另一个被移动到处理位置。

公开(公告)号：US09108228B2

公开(公告)日：2015-08-18

申请号：US13779969

申请日：2013-02-28

Applicant: Tokyo Electron Limited

Inventor： Takahisa Otsuka ,  Hirotaka Maruyama ,  Nobuhiro Ogata ,  Kazuyuki Kudo

IPC: H01L21/00 ,  B08B3/04 ,  H01L21/67

CPC classification number: B08B3/04 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/6715

Abstract: Provided is a liquid processing apparatus that selectively supplies processing liquids with a switching operation to the surface of a substrate to perform a liquid processing. The liquid processing apparatus includes a first processing liquid supply unit including a first nozzle block that selectively supplies an acidic chemical liquid and a rinse liquid, and a second processing liquid supply unit including a second nozzle block that selectively supplies an alkaline chemical liquid and a rinse liquid. When a chemical liquid is supplied to the substrate from one of the first and second nozzle blocks, the other of the first and second nozzle blocks is retreated to a retreat position. When the rinse liquid is supplied to the substrate from one of the first and second nozzle blocks, the other of the first and second nozzle blocks is moved to a processing position.

Abstract translation: 提供了一种液体处理装置，其选择性地向处理液体表面提供切换操作以进行液体处理。 液体处理装置包括第一处理液体供给单元，其包括选择性地供给酸性化学液体和冲洗液体的第一喷嘴块，以及第二处理液体供给单元，其包括选择性地供给碱性化学液体和冲洗液的第二喷嘴块 液体。 当从第一和第二喷嘴块中的一个向基板提供化学液体时，第一和第二喷嘴块中的另一个被退回到退避位置。 当冲洗液体从第一和第二喷嘴块之一提供给基板时，第一和第二喷嘴块中的另一个被移动到处理位置。