公开(公告)号：US12007692B2

公开(公告)日：2024-06-11

申请号：US18077577

申请日：2022-12-08

申请人： Tokyo Electron Limited

发明人： Hiroki Sakurai ,  Nobuhiro Ogata ,  Daisuke Goto ,  Kanta Mori ,  Kenji Yada ,  Yusuke Hashimoto ,  Shoki Mizuguchi ,  Yenrui Hsu

IPC分类号： G03F7/30 ,  G03F7/42

CPC分类号： G03F7/3021 ,  G03F7/426

摘要： A nozzle that mixes fluid containing steam or mist of pressurized pure water and processing liquid containing at least sulfuric acid and ejects mixed fluid of the fluid and the processing liquid, the nozzle comprising: at least one first ejection port ejecting the fluid; at least one second ejection port ejecting the processing liquid; and at least one lead-out path being in fluid communication with the at least one first ejection port and the at least one second ejection port and leading out the mixed fluid of the fluid ejected from the at least one first ejection port and the processing liquid ejected from the at least one second ejection port, wherein the at least one first ejection port or the at least one second ejection port is arranged to be directed to position deviated from central axis of the at least one lead-out path in a plan view.

公开(公告)号：US10475671B2

公开(公告)日：2019-11-12

申请号：US15390902

申请日：2016-12-27

申请人： Tokyo Electron Limited

发明人： Jiro Higashijima ,  Nobuhiro Ogata ,  Yusuke Hashimoto

IPC分类号： H01L21/67 ,  H01L21/02 ,  B08B3/10 ,  B08B17/02 ,  C11D11/00

摘要： Disclosed is a substrate processing apparatus including: a holding unit configured to hold a substrate; a processing liquid supply unit configured to supply a first processing liquid and a second processing liquid to the substrate; a first cup configured to recover the first processing liquid; a second cup disposed adjacent to the first cup and configured to recover the second processing liquid; a recovery portion defined by a peripheral wall portion that is erected on a bottom portion of the first cup; and a cleaning liquid supply unit configured to supply a cleaning liquid to the recovery portion. The peripheral wall portion is cleaned by causing the cleaning liquid supplied by the cleaning liquid supply unit to overflow from the peripheral wall portion to the second cup side.

公开(公告)号：US20140360540A1

公开(公告)日：2014-12-11

申请号：US14466240

申请日：2014-08-22

申请人： Tokyo Electron Limited

发明人： Nobuhiro Ogata ,  Terufumi Wakiyama

IPC分类号： B08B3/10

CPC分类号： B08B3/10 ,  B08B3/02 ,  B08B3/022 ,  B08B3/024 ,  B08B3/04 ,  B08B3/041 ,  B08B3/048 ,  H01L21/67017 ,  H01L21/67034 ,  H01L21/67051 ,  H01L21/6715 ,  Y10S134/902

摘要： Disclosed is a liquid processing apparatus including first and second cups installed so as to surround a rotation holding unit of a substrate and guide a processing liquid scattered from the rotating substrate downwards. A first driving unit and a second driving unit elevate the first cup and the second cup between a position receiving the processing liquid and the lower position thereof. A controller controls that the first cup and the second cup are ascended at the same time by transferring the driving force of the first driving unit while the first cup or a first elevating member thereof is overlapped with the second cup or a second elevating member thereof from the lower side by setting the ascending speed of the first cup to be higher than the ascending speed of the second cup when the first and second cups are ascended at the same time.

摘要翻译： 公开了一种液体处理装置，包括安装成围绕基板的旋转保持单元安装的第一和第二杯，并将从旋转底板散射的处理液向下引导。 第一驱动单元和第二驱动单元使第一杯和第二杯在接收处理液的位置和其下部位置之间升高。 控制器通过转移第一驱动单元的驱动力同时将第一杯和第二杯同时上升，同时第一杯或第一升降构件与第二杯或其第二升降构件重叠， 当第一杯和第二杯同时上升时，将第一杯的上升速度设定为高于第二杯的上升速度的下侧。

公开(公告)号：US20230001458A1

公开(公告)日：2023-01-05

申请号：US17810385

申请日：2022-07-01

申请人： Tokyo Electron Limited

发明人： Yusuke Hashimoto ,  Daisuke Goto ,  Kanta Mori ,  Jiro Higashijima ,  Nobuhiro Ogata

IPC分类号： B08B3/04 ,  B05B1/10 ,  B08B3/08

摘要： A substrate processing apparatus includes a holder configured to hold a substrate; a driving unit configured to rotate the holder; an inner cup body provided in the holder to surround the substrate held by the holder; a mist guard, surrounding the holder and the inner cup body, configured to be moved up and down; a cleaning liquid supply configured to supply a cleaning liquid; and a controller. The controller is configured to perform: supplying a processing liquid to the substrate from a processing liquid supply, in a state that the substrate is held by the holder and the mist guard is raised; and dispersing, after the supplying of the processing liquid, the cleaning liquid supplied from the cleaning liquid supply to an entire inner peripheral surface of the mist guard, in a state that the substrate is carried out from the holder and the mist guard is raised.

公开(公告)号：US11024518B2

公开(公告)日：2021-06-01

申请号：US15747921

申请日：2016-07-28

申请人： Tokyo Electron Limited

发明人： Norihiro Ito ,  Jiro Higashijima ,  Nobuhiro Ogata ,  Takahisa Otsuka ,  Yuichi Douki ,  Yusuke Hashimoto ,  Kazuhiro Aiura ,  Daisuke Goto

IPC分类号： B08B3/02 ,  H01L21/67 ,  B08B17/02 ,  H01L21/687 ,  B08B3/08 ,  H01L21/02

摘要： A substrate processing apparatus includes a stationary cup body 51 provided to surround a substrate holding unit 31 and configured to receive a processing liquid or mist of the processing liquid discharged onto a substrate, the stationary cup body not being moved relatively with respect to a processing vessel; a mist guard 80; and a guard elevating mechanism 84 configured to elevate the mist guard. Here, the mist guard is provided at an outside of the stationary cup body to surround the stationary cup body and configured to block a liquid scattered outwards beyond a space above the stationary cup body. Further, the mist guard includes a cylindrical portion 81 of a cylindrical shape and a protruding portion 82 protruded from an upper portion of the cylindrical portion toward an inside of the cylindrical portion.

公开(公告)号：US20130228200A1

公开(公告)日：2013-09-05

申请号：US13779969

申请日：2013-02-28

申请人： TOKYO ELECTRON LIMITED

发明人： Takahisa Otsuka ,  Hirotaka Maruyama ,  Nobuhiro Ogata ,  Kazuyuki Kudo

IPC分类号： B08B3/04

CPC分类号： B08B3/04 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/6715

摘要： Provided is a liquid processing apparatus that selectively supplies processing liquids with a switching operation to the surface of a substrate to perform a liquid processing. The liquid processing apparatus includes a first processing liquid supply unit including a first nozzle block that selectively supplies an acidic chemical liquid and a rinse liquid, and a second processing liquid supply unit including a second nozzle block that selectively supplies an alkaline chemical liquid and a rinse liquid. When a chemical liquid is supplied to the substrate from one of the first and second nozzle blocks, the other of the first and second nozzle blocks is retreated to a retreat position. When the rinse liquid is supplied to the substrate from one of the first and second nozzle blocks, the other of the first and second nozzle blocks is moved to a processing position.

摘要翻译： 提供了一种液体处理装置，其选择性地向处理液体表面提供切换操作以进行液体处理。 液体处理装置包括第一处理液体供给单元，其包括选择性地供给酸性化学液体和冲洗液体的第一喷嘴块，以及第二处理液体供给单元，其包括选择性地供给碱性化学液体和冲洗液的第二喷嘴块 液体。 当从第一和第二喷嘴块中的一个向基板提供化学液体时，第一和第二喷嘴块中的另一个被退回到退避位置。 当冲洗液体从第一和第二喷嘴块之一提供给基板时，第一和第二喷嘴块中的另一个被移动到处理位置。

公开(公告)号：US11158525B2

公开(公告)日：2021-10-26

申请号：US16074445

申请日：2017-01-20

申请人： TOKYO ELECTRON LIMITED

发明人： Yasuhiro Takaki ,  Shinichi Umeno ,  Takashi Nagai ,  Hisashi Morita ,  Nobuhiro Ogata ,  Yusuke Takamatsu ,  Jiro Higashijima

IPC分类号： H01L21/67

摘要： A recovery route returns, to a retaining tank, mixed solution supplied to a substrate processing unit. A discarding route discards the supplied mixed solution to a place other than the retaining tank. A switching controller causes the supplied mixed solution to flow into the discarding route during a time interval until a first time interval has elapsed from a time point when the substrate processing unit starts to supply the mixed solution; causes the supplied mixed solution to flow into the recovery route during a time interval until a second time interval, which is decided based on a predetermined recovery rate, has elapsed after the first time interval elapses; and causes the supplied mixed solution to flow into the discarding route during a time interval until supply of the mixed solution has been ended from a time point when the second time interval elapses.

公开(公告)号：US20170200624A1

公开(公告)日：2017-07-13

申请号：US15390902

申请日：2016-12-27

申请人： Tokyo Electron Limited

发明人： Jiro Higashijima ,  Nobuhiro Ogata ,  Yusuke Hashimoto

IPC分类号： H01L21/67 ,  H01L21/02 ,  B08B3/10 ,  B08B11/00 ,  B08B3/04 ,  B08B3/08

CPC分类号： H01L21/67051 ,  B08B3/10 ,  B08B17/025 ,  B08B2203/0229 ,  C11D11/0047 ,  H01L21/02041

摘要： Disclosed is a substrate processing apparatus including: a holding unit configured to hold a substrate; a processing liquid supply unit configured to supply a first processing liquid and a second processing liquid to the substrate; a first cup configured to recover the first processing liquid; a second cup disposed adjacent to the first cup and configured to recover the second processing liquid; a recovery portion defined by a peripheral wall portion that is erected on a bottom portion of the first cup; and a cleaning liquid supply unit configured to supply a cleaning liquid to the recovery portion. The peripheral wall portion is cleaned by causing the cleaning liquid supplied by the cleaning liquid supply unit to overflow from the peripheral wall portion to the second cup side.

公开(公告)号：US20170059996A1

公开(公告)日：2017-03-02

申请号：US15251072

申请日：2016-08-30

申请人： Tokyo Electron Limited

发明人： Jiro Higashijima ,  Nobuhiro Ogata

IPC分类号： G03F7/42

CPC分类号： G03F7/423

摘要： A processing fluid can be discharged according to a discharge type for a process involved, without a discharge defect. A substrate processing apparatus includes a nozzle and a pipeline. The nozzle is configured to discharge the processing fluid toward a substrate, and the processing fluid is supplied to the nozzle through the pipeline. The pipeline has a three-layer structure having a first layer, a second layer and a third layer in this sequence from an inner side thereof. Further, a leading end portion of the first layer and a leading end portion of the third layer are bonded to the nozzle, and the leading end portion of the first layer is located at a position which is not protruded more than a leading end portion of the second layer with respect to a discharging direction of the processing fluid.

摘要翻译： 可以根据所涉及的处理的排放类型排出处理流体，而没有排出缺陷。 基板处理装置包括喷嘴和管道。 喷嘴被配置为将处理流体朝向基板排出，并且处理流体通过管道供应到喷嘴。 管线具有从其内侧开始依次具有第一层，第二层和第三层的三层结构。 此外，第一层的前端部和第三层的前端部分接合到喷嘴，并且第一层的前端部位于不比第一层的前端部突出的位置 相对于处理流体的排出方向的第二层。

公开(公告)号：US09108231B2

公开(公告)日：2015-08-18

申请号：US14466240

申请日：2014-08-22

申请人： Tokyo Electron Limited

发明人： Nobuhiro Ogata ,  Terufumi Wakiyama

IPC分类号： B08B3/10 ,  B08B3/04 ,  B08B3/02 ,  H01L21/67

CPC分类号： B08B3/10 ,  B08B3/02 ,  B08B3/022 ,  B08B3/024 ,  B08B3/04 ,  B08B3/041 ,  B08B3/048 ,  H01L21/67017 ,  H01L21/67034 ,  H01L21/67051 ,  H01L21/6715 ,  Y10S134/902

摘要： Disclosed is a liquid processing apparatus including first and second cups installed so as to surround a rotation holding unit of a substrate and guide a processing liquid scattered from the rotating substrate downwards. A first driving unit and a second driving unit elevate the first cup and the second cup between a position receiving the processing liquid and the lower position thereof. A controller controls that the first cup and the second cup are ascended at the same time by transferring the driving force of the first driving unit while the first cup or a first elevating member thereof is overlapped with the second cup or a second elevating member thereof from the lower side by setting the ascending speed of the first cup to be higher than the ascending speed of the second cup when the first and second cups are ascended at the same time.

摘要翻译： 公开了一种液体处理装置，包括安装成围绕基板的旋转保持单元安装的第一和第二杯，并将从旋转底板散射的处理液向下引导。 第一驱动单元和第二驱动单元使第一杯和第二杯在接收处理液的位置和其下部位置之间升高。 控制器通过转移第一驱动单元的驱动力同时将第一杯和第二杯同时上升，同时第一杯或第一升降构件与第二杯或其第二升降构件重叠， 当第一杯和第二杯同时上升时，将第一杯的上升速度设定为高于第二杯的上升速度的下侧。