公开(公告)号：US20190228950A1

公开(公告)日：2019-07-25

申请号：US15880435

申请日：2018-01-25

Applicant: Tokyo Electron Limited

Inventor： Merritt Funk ,  Megan Doppel ,  Kazuki Moyama ,  Chelsea DuBose ,  Justin Moses

IPC: H01J37/32 ,  H01L21/3065

Abstract: Embodiments of method and system for controlling plasma performance are described. In an embodiment a method may include supplying power at a first set of power parameters to a plasma chamber. Additionally, the method may include forming plasma within the plasma chamber using the first set of power parameters. The method may also include measuring power coupling to the plasma at the first set of power parameters. Also, the method may include supplying power at a second set of power parameters to the plasma chamber. The method may additionally include measuring power coupling to the plasma at the second set of power parameters to the plasma. The method may also include adjusting the first set of power parameters based, at least in part, on the measuring of the power coupling at the second set of power parameters.

公开(公告)号：US10424462B2

公开(公告)日：2019-09-24

申请号：US14534870

申请日：2014-11-06

Applicant: Tokyo Electron Limited

Inventor： Merritt Funk ,  Megan Doppel ,  John Entralgo ,  Jianping Zhao ,  Toshihisa Nozawa

IPC: H01J37/32

Abstract: A processing system is disclosed, having a multiple power transmission elements with an interior cavity that may be arranged around a plasma processing chamber. Each of the power transmission elements may propagates electromagnetic energy that may be used to generate plasma within the plasma process chamber. The power transmission elements may be designed to accommodate a range of power and frequency ranges that range from 500 W to 3500 W and 0.9 GHz to 9 GHz. In one embodiment, the power transmission elements may include a rectangular interior cavity that enables the generation of a standing wave with two or more modes. In another embodiment, the power transmission elements may have a cylindrical interior cavity that may be placed along the plasma processing chamber or have one end of the cylinder placed against the plasma processing chamber.

公开(公告)号：US10510512B2

公开(公告)日：2019-12-17

申请号：US15880435

申请日：2018-01-25

Applicant: Tokyo Electron Limited

Inventor： Merritt Funk ,  Megan Doppel ,  Kazuki Moyama ,  Chelsea DuBose ,  Justin Moses

IPC: H01J37/32 ,  H01L21/3065

Abstract: Embodiments of method and system for controlling plasma performance are described. In an embodiment a method may include supplying power at a first set of power parameters to a plasma chamber. Additionally, the method may include forming plasma within the plasma chamber using the first set of power parameters. The method may also include measuring power coupling to the plasma at the first set of power parameters. Also, the method may include supplying power at a second set of power parameters to the plasma chamber. The method may additionally include measuring power coupling to the plasma at the second set of power parameters to the plasma. The method may also include adjusting the first set of power parameters based, at least in part, on the measuring of the power coupling at the second set of power parameters.

公开(公告)号：US20150126046A1

公开(公告)日：2015-05-07

申请号：US14534870

申请日：2014-11-06

Applicant: Tokyo Electron Limited

Inventor： Merritt Funk ,  Megan Doppel ,  John Entralgo ,  Jianping Zhao ,  Toshihisa Nozawa

IPC: H01J37/32 ,  H01L21/02 ,  H01L21/3065 ,  H01L21/67

Abstract: A processing system is disclosed, having a multiple power transmission elements with an interior cavity that may be arranged around a plasma processing chamber. Each of the power transmission elements may propagates electromagnetic energy that may be used to generate plasma within the plasma process chamber. The power transmission elements may be designed to accommodate a range of power and frequency ranges that range from 500W to 3500W and 0.9 GHz to 9 GHz. In one embodiment, the power transmission elements may include a rectangular interior cavity that enables the generation of a standing wave with two or more modes. In another embodiment, the power transmission elements may have a cylindrical interior cavity that may be placed along the plasma processing chamber or have one end of the cylinder placed against the plasma processing chamber.

Abstract translation: 公开了一种处理系统，其具有多个功率传输元件，其具有可设置在等离子体处理室周围的内腔。 每个电力传输元件可以传播可用于在等离子体处理室内产生等离子体的电磁能。 功率传输元件可以被设计为适应范围从500W到3500W和0.9GHz到9GHz的一系列功率和频率范围。 在一个实施例中，动力传递元件可以包括能够产生具有两种或更多种模式的驻波的矩形内腔。 在另一个实施例中，动力传递元件可以具有可以沿等离子体处理室放置的圆柱形内部空腔或使气缸的一端靠在等离子体处理室上。