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公开(公告)号:US20240006214A1
公开(公告)日:2024-01-04
申请号:US18345100
申请日:2023-06-30
Applicant: Tokyo Electron Limited
Inventor: Shingo Katsuki , Kenichirou Matsuyama , Sho Kano , Saori Kosaki
IPC: H01L21/677 , H01L21/67 , B65G47/90
CPC classification number: H01L21/67727 , H01L21/67173 , B65G47/90
Abstract: A substrate transfer method performed in a substrate processing apparatus including a transfer mechanism group configured to transfer a substrate into a carrier via a module group and an exposure apparatus is provided. The transfer mechanism group includes a first transfer mechanism configured to transfer the substrate in an order of the pre-stage module, the exposure apparatus, and a first post-stage module, and a second transfer mechanism configured to transfer the substrate in an order of the first post-stage module, a heating module, a developing module, and a second post-stage module, a post-stage transfer mechanism. The substrate transfer method includes comparing an exposure apparatus cycle time with a section transfer time required to transfer the substrate from a transfer section by the second transfer mechanism to a transfer section by the post-stage transfer mechanism; and setting the section transfer time based on a result of the comparing.
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公开(公告)号:US20240006205A1
公开(公告)日:2024-01-04
申请号:US18345073
申请日:2023-06-30
Applicant: Tokyo Electron Limited
Inventor: Kenichirou Matsuyama , Sho Kano
IPC: H01L21/67 , H01L21/677
CPC classification number: H01L21/67225 , H01L21/67745 , H01L21/6715
Abstract: A substrate transfer method performed in a substrate processing apparatus including a transfer mechanism group configured to transfer a substrate into a carrier via a module group and an exposure apparatus is provided. The transfer mechanism group includes a first transfer mechanism configured to transfer the substrate in an order of a pre-stage module, the exposure apparatus, and a first post-stage module, and a second transfer mechanism configured to transfer the substrate in an order of the first post-stage module, a heating module, a developing module, and a second post-stage module, and a post-stage transfer mechanism. The substrate transfer method includes acquiring a section transfer time required to transfer the substrate to a next transfer section; and performing a carry-in or a carry-out of the substrate into/from the exposure apparatus based on a maximum section transfer time, which is the longest in the acquired section transfer times.
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