公开(公告)号：US20210366740A1

公开(公告)日：2021-11-25

申请号：US17326821

申请日：2021-05-21

Applicant: Tokyo Electron Limited

Inventor： Keita HIRASE ,  Koji OGURA ,  Hiroshi YOSHIDA ,  Takashi NAGAI ,  Jun NONAKA ,  Takumi HONDA

IPC: H01L21/67 ,  H01L21/311

Abstract: A substrate processing apparatus includes: a processing container, a mixing device, a liquid feeding path, and a controller. The processing container processes a substrate by immersing the substrate in a processing liquid. The mixing device mixes a phosphoric acid aqueous solution and an additive, to produce a mixed liquid to be used as a raw material of the processing liquid. The liquid feeding path feeds the mixed liquid from the mixing device to the processing container. The controller controls the substrate processing apparatus. The controller performs a control to feed the mixed liquid from the mixing device to the processing container in which the substrate is immersed, after a phosphoric acid concentration of the mixed liquid is regulated from a first concentration to a second concentration higher than the first concentration. The first concentration is a concentration when the phosphoric acid aqueous solution is supplied to the mixing device.

公开(公告)号：US20210368586A1

公开(公告)日：2021-11-25

申请号：US17321514

申请日：2021-05-17

Applicant: Tokyo Electron Limited

Inventor： Koji OGURA ,  Hiroshi YOSHIDA ,  Takashi NAGAI ,  Jun NONAKA ,  Keita HIRASE

IPC: H05B1/02 ,  H01L21/67

Abstract: A storage device according to an aspect of the present disclosure includes a storage tank, a heating mechanism, and a controller. The storage tank stores a processing liquid that contains an aqueous solution of phosphoric acid and an additive. The heating mechanism heats the processing liquid that is stored in the storage tank. The controller controls the heating mechanism to execute a concentration maintaining process where a temperature of the processing liquid is adjusted in such a manner that an amount of evaporation of water for the processing liquid in the storage tank approaches an amount of absorption of moisture for the processing liquid in the storage tank.

公开(公告)号：US20140045281A1

公开(公告)日：2014-02-13

申请号：US13956705

申请日：2013-08-01

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazuhiro AIURA ,  Norihiro ITOH ,  Yusuke HASHIMOTO ,  Takashi NAGAI

IPC: H01L21/66

CPC classification number: H01L22/30 ,  H01L21/67259 ,  H01L21/68728 ,  H01L21/68792 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Provided is a substrate processing apparatus in which flexibility of disposing a device configured to determine a holding state of a substrate and the flexibility of timing of determining the holding state are enhanced. The substrate processing apparatus includes a light projector configured to radiate detection light toward a region where a substrate may exist when the substrate is held by a substrate holding member and a light receiver configured to receive the detection light radiated from the light projector. A light path of the detection light from the light projector toward the light receiver passes a substrate surrounding member installed around the substrate held by the substrate holding member. The detection light penetrates the substrate surrounding member and has a wavelength which does not penetrate the substrate.

Abstract translation: 提供了一种基板处理装置，其中设置配置成确定基板的保持状态的装置和确定保持状态的定时的灵活性的灵活性。 基板处理装置包括：投光器，被配置为当基板被基板保持部件保持时朝向可存在基板的区域发射检测光;以及光接收器，被配置为接收从投影仪辐射的检测光。 来自投光器的检测光的光路通过安装在由基板保持部件保持的基板周围的基板周围。 检测光穿透基板周围元件并具有不穿透基板的波长。