公开(公告)号：US20240124984A1

公开(公告)日：2024-04-18

申请号：US18483608

申请日：2023-10-10

Applicant: Tokyo Electron Limited

Inventor： Yusuke HASHIMOTO ,  Daisuke GOTO ,  Nobuhiro OGATA ,  Jiro HIGASHIJIMA ,  Tomoaki OBARU ,  Kanta MORI

IPC: C23F1/08

CPC classification number: C23F1/08 ,  H01L21/67023

Abstract: A substrate processing apparatus that supplies a processing liquid to a front surface of a substrate which is rotating, includes: a substrate holder configured to hold the substrate, wherein the substrate holder includes: a gripper configured to come into contact with a periphery of the substrate to grip the substrate; and a base to which the gripper is attached.