公开(公告)号：US20160305688A1

公开(公告)日：2016-10-20

申请号：US15089662

申请日：2016-04-04

Applicant: Tokyo Electron Limited

Inventor： Hisakazu Nakayama ,  Tomoaki Ojima

IPC: F24H9/20 ,  F24H1/14 ,  F24H1/00

Abstract: A control device configured to control a power to be supplied to a heater unit. The control device cuts off the power to be supplied to a heating portion when it is determined that an event where a maximum temperature that the processing liquid within the heater unit reaches exceeds a processing liquid upper limit temperature is likely to occur even when a supply of the power to the heating portion is stopped based on an actual temperature of the processing liquid measured by a temperature detector under an assumption that a flow of the processing liquid flowing in a processing liquid supply line is stopped.

Abstract translation: 一种控制装置，被配置为控制供给到加热器单元的功率。 当确定加热器单元中的处理液达到的最大温度达到超过处理液上限温度的事件即使在供应的情况下也可能发生提供给加热部分的功率， 基于在处理液供给管路中流动的处理液的流动停止的假设，基于由温度检测器测定的处理液的实际温度来停止加热部的动力。

公开(公告)号：US11691172B2

公开(公告)日：2023-07-04

申请号：US16918678

申请日：2020-07-01

Applicant: Tokyo Electron Limited

Inventor： Chikara Nobukuni ,  Tomoaki Ojima ,  Takuya Itahashi ,  Ryoichi Horiguchi ,  Shota Wakayama

IPC: B05C3/02 ,  B05C11/10 ,  H01L21/67

CPC classification number: B05C3/02 ,  B05C11/1015 ,  B05C11/1026 ,  B05C11/1039 ,  B05C11/1042 ,  H01L21/67023

Abstract: A liquid processing apparatus includes: a tank configured to store a processing liquid supplied from a processing liquid supply source; a circulation passage connected to the tank; a pump installed at the circulation passage; a plurality of liquid processors configured to perform liquid processing on a substrate; and a plurality of supply passages configured to supply the processing liquid to the plurality of liquid processors respectively, wherein the circulation passage includes a main passage portion provided with the pump, and a first branch passage portion and a second branch passage portion branching from the main passage portion, and the processing liquid flowing out from the tank passes through the main passage portion, then flows into the first branch passage portion and the second branch passage portion, and then returns to the tank through the first branch passage portion and the second branch passage portion.

公开(公告)号：US12070769B2

公开(公告)日：2024-08-27

申请号：US18129150

申请日：2023-03-31

Applicant: Tokyo Electron Limited

Inventor： Chikara Nobukuni ,  Tomoaki Ojima ,  Takuya Itahashi ,  Ryoichi Horiguchi ,  Shota Wakayama

IPC: B05C3/02 ,  B05C11/10 ,  H01L21/67

CPC classification number: B05C3/02 ,  B05C11/1015 ,  B05C11/1026 ,  B05C11/1039 ,  B05C11/1042 ,  H01L21/67023

Abstract: A liquid processing apparatus includes: a tank configured to store a processing liquid supplied from a processing liquid supply source; a circulation passage connected to the tank; a pump installed at the circulation passage; a plurality of liquid processors configured to perform liquid processing on a substrate; and a plurality of supply passages configured to supply the processing liquid to the plurality of liquid processors respectively, wherein the circulation passage includes a main passage portion provided with the pump, and a first branch passage portion and a second branch passage portion branching from the main passage portion, and the processing liquid flowing out from the tank passes through the main passage portion, then flows into the first branch passage portion and the second branch passage portion, and then returns to the tank through the first branch passage portion and the second branch passage portion.

公开(公告)号：US10422551B2

公开(公告)日：2019-09-24

申请号：US15089662

申请日：2016-04-04

Applicant: Tokyo Electron Limited

Inventor： Hisakazu Nakayama ,  Tomoaki Ojima

IPC: F24H9/20 ,  H05B3/42 ,  F24H1/00 ,  F24H1/14 ,  G05D23/19 ,  H01L21/67

Abstract: A control device configured to control a power to be supplied to a heater unit. The control device cuts off the power to be supplied to a heating portion when it is determined that an event where a maximum temperature that the processing liquid within the heater unit reaches exceeds a processing liquid upper limit temperature is likely to occur even when a supply of the power to the heating portion is stopped based on an actual temperature of the processing liquid measured by a temperature detector under an assumption that a flow of the processing liquid flowing in a processing liquid supply line is stopped.