公开(公告)号：US10591935B2

公开(公告)日：2020-03-17

申请号：US16188525

申请日：2018-11-13

Applicant: Tokyo Electron Limited

Inventor： Yasuhiro Takaki ,  Hiroshi Komiya ,  Chikara Nobukuni ,  Keigo Satake ,  Atsushi Anamoto

IPC: G05D11/13

Abstract: A substrate liquid processing apparatus includes a tank; a circulation line; a processing unit connected to the circulation line through a branch line and configured to perform a liquid processing on a substrate using a processing liquid flowing through the circulation line; a processing liquid producing mechanism configured to produce the processing liquid by mixing at least two kinds of raw material liquids supplied from respective raw material liquid sources at a controlled mixing ratio; a concentration measuring device configured to measure a concentration of the processing liquid flowing through the circulation line and a concentration of the processing liquid flowing through the processing liquid supply line; and a control device configured to control the processing liquid producing mechanism based on the measured concentrations of the processing liquid.

公开(公告)号：US11691172B2

公开(公告)日：2023-07-04

申请号：US16918678

申请日：2020-07-01

Applicant: Tokyo Electron Limited

Inventor： Chikara Nobukuni ,  Tomoaki Ojima ,  Takuya Itahashi ,  Ryoichi Horiguchi ,  Shota Wakayama

IPC: B05C3/02 ,  B05C11/10 ,  H01L21/67

CPC classification number: B05C3/02 ,  B05C11/1015 ,  B05C11/1026 ,  B05C11/1039 ,  B05C11/1042 ,  H01L21/67023

Abstract: A liquid processing apparatus includes: a tank configured to store a processing liquid supplied from a processing liquid supply source; a circulation passage connected to the tank; a pump installed at the circulation passage; a plurality of liquid processors configured to perform liquid processing on a substrate; and a plurality of supply passages configured to supply the processing liquid to the plurality of liquid processors respectively, wherein the circulation passage includes a main passage portion provided with the pump, and a first branch passage portion and a second branch passage portion branching from the main passage portion, and the processing liquid flowing out from the tank passes through the main passage portion, then flows into the first branch passage portion and the second branch passage portion, and then returns to the tank through the first branch passage portion and the second branch passage portion.

公开(公告)号：US10162371B2

公开(公告)日：2018-12-25

申请号：US14536989

申请日：2014-11-10

Applicant: Tokyo Electron Limited

Inventor： Yasuhiro Takaki ,  Hiroshi Komiya ,  Chikara Nobukuni ,  Keigo Satake ,  Atsushi Anamoto

IPC: B01F15/00 ,  B01F3/08 ,  G05D11/13

Abstract: A substrate liquid processing apparatus includes a tank; a circulation line; a processing unit connected to the circulation line through a branch line and configured to perform a liquid processing on a substrate using a processing liquid flowing through the circulation line; a processing liquid producing mechanism configured to produce the processing liquid by mixing at least two kinds of raw material liquids supplied from respective raw material liquid sources at a controlled mixing ratio; a concentration measuring device configured to measure a concentration of the processing liquid flowing through the circulation line and a concentration of the processing liquid flowing through the processing liquid supply line; and a control device configured to control the processing liquid producing mechanism based on the measured concentrations of the processing liquid.

公开(公告)号：US20150131403A1

公开(公告)日：2015-05-14

申请号：US14536989

申请日：2014-11-10

Applicant: Tokyo Electron Limited

Inventor： Yasuhiro Takaki ,  Hiroshi Komiya ,  Chikara Nobukuni ,  Keigo Satake ,  Atsushi Anamoto

IPC: B01F15/00 ,  B01F3/08

CPC classification number: G05D11/138

Abstract: A substrate liquid processing apparatus includes a tank; a circulation line; a processing unit connected to the circulation line through a branch line and configured to perform a liquid processing on a substrate using a processing liquid flowing through the circulation line; a processing liquid producing mechanism configured to produce the processing liquid by mixing at least two kinds of raw material liquids supplied from respective raw material liquid sources at a controlled mixing ratio; a concentration measuring device configured to measure a concentration of the processing liquid flowing through the circulation line and a concentration of the processing liquid flowing through the processing liquid supply line; and a control device configured to control the processing liquid producing mechanism based on the measured concentrations of the processing liquid.

Abstract translation: 基板液体处理装置包括罐; 循环线 处理单元，其通过分支管线连接到循环管线，并且被配置为使用流过循环管线的处理液体在基板上进行液体处理; 处理液生成机构，其通过以受控混合比混合由各原料液源供给的至少两种原料液体来制造处理液; 浓度测量装置，被配置为测量流过所述循环管线的处理液体的浓度和流经所述处理液体供给管线的处理液体的浓度; 以及控制装置，其被配置为基于所测量的处理液体的浓度来控制处理液生成机构。

公开(公告)号：US12070769B2

公开(公告)日：2024-08-27

申请号：US18129150

申请日：2023-03-31

Applicant: Tokyo Electron Limited

Inventor： Chikara Nobukuni ,  Tomoaki Ojima ,  Takuya Itahashi ,  Ryoichi Horiguchi ,  Shota Wakayama

IPC: B05C3/02 ,  B05C11/10 ,  H01L21/67

CPC classification number: B05C3/02 ,  B05C11/1015 ,  B05C11/1026 ,  B05C11/1039 ,  B05C11/1042 ,  H01L21/67023

Abstract: A liquid processing apparatus includes: a tank configured to store a processing liquid supplied from a processing liquid supply source; a circulation passage connected to the tank; a pump installed at the circulation passage; a plurality of liquid processors configured to perform liquid processing on a substrate; and a plurality of supply passages configured to supply the processing liquid to the plurality of liquid processors respectively, wherein the circulation passage includes a main passage portion provided with the pump, and a first branch passage portion and a second branch passage portion branching from the main passage portion, and the processing liquid flowing out from the tank passes through the main passage portion, then flows into the first branch passage portion and the second branch passage portion, and then returns to the tank through the first branch passage portion and the second branch passage portion.

公开(公告)号：US11043399B2

公开(公告)日：2021-06-22

申请号：US16728136

申请日：2019-12-27

Applicant: Tokyo Electron Limited

Inventor： Tomiyasu Maezono ,  Sadamichi Mori ,  Kouji Takuma ,  Chikara Nobukuni ,  Keigo Satake ,  Shinji Sugahara ,  Masahiro Yoshida

IPC: B08B3/08 ,  H01L21/67 ,  H01L21/687

Abstract: A plasma processing apparatus includes a storage; processors; a liquid supply which supplies, into the storage, at least a first liquid composed of a processing liquid or source liquids for composing the processing liquid; a detector which detects a value of a parameter indicating a state of the first liquid supplied into the storage or a state of the processing liquid in the storage; and a controller which controls the processors to perform a liquid processing in sequence. The controller determines, based on a detection result of the value of the parameter, whether it is possible to supply the processing liquid continuously into a preset number of processors concurrently under a condition requested by the processors, and, if not, the controller performs a simultaneous processing restricting control of reducing a number of processors which are supposed to perform the liquid processing concurrently to be lower than the preset number.

公开(公告)号：US20200211867A1

公开(公告)日：2020-07-02

申请号：US16728136

申请日：2019-12-27

Applicant: Tokyo Electron Limited

Inventor： Tomiyasu Maezono ,  Sadamichi Mori ,  Kouji Takuma ,  Chikara Nobukuni ,  Keigo Satake ,  Shinji Sugahara ,  Masahiro Yoshida

IPC: H01L21/67 ,  H01L21/687 ,  B08B3/08

Abstract: A plasma processing apparatus includes a storage; processors; a liquid supply which supplies, into the storage, at least a first liquid composed of a processing liquid or source liquids for composing the processing liquid; a detector which detects a value of a parameter indicating a state of the first liquid supplied into the storage or a state of the processing liquid in the storage; and a controller which controls the processors to perform a liquid processing in sequence. The controller determines, based on a detection result of the value of the parameter, whether it is possible to supply the processing liquid continuously into a preset number of processors concurrently under a condition requested by the processors, and, if not, the controller performs a simultaneous processing restricting control of reducing a number of processors which are supposed to perform the liquid processing concurrently to be lower than the preset number.

公开(公告)号：US20190079544A1

公开(公告)日：2019-03-14

申请号：US16188525

申请日：2018-11-13

Applicant: Tokyo Electron Limited

Inventor： Yasuhiro Takaki ,  Hiroshi Komiya ,  Chikara Nobukuni ,  Keigo Satake ,  Atsushi Anamoto

IPC: G05D11/13

Abstract: A substrate liquid processing apparatus includes a tank; a circulation line; a processing unit connected to the circulation line through a branch line and configured to perform a liquid processing on a substrate using a processing liquid flowing through the circulation line; a processing liquid producing mechanism configured to produce the processing liquid by mixing at least two kinds of raw material liquids supplied from respective raw material liquid sources at a controlled mixing ratio; a concentration measuring device configured to measure a concentration of the processing liquid flowing through the circulation line and a concentration of the processing liquid flowing through the processing liquid supply line; and a control device configured to control the processing liquid producing mechanism based on the measured concentrations of the processing liquid.