公开(公告)号：US20210011468A1

公开(公告)日：2021-01-14

申请号：US16919992

申请日：2020-07-02

Applicant: Tokyo Electron Limited

Inventor： Nobutoshi TERASAWA ,  Noriaki KOYAMA ,  Tomonori YAMASHITA ,  Takazumi TANAKA ,  Takehiro KINOSHITA ,  Fumiaki NAGAI ,  Eiji KIKAMA

IPC: G05B23/02 ,  G05B19/418 ,  H01L21/67 ,  G06F17/18

Abstract: A substrate processing system includes: an acquiring unit configured to acquire process data of each step when each step included in a predetermined process is executed under different control conditions; an extracting unit configured to divide each step into a first section in which the process data fluctuates and a second section in which the process data is converged, and extract first data belonging to the first section and second data belonging to the second section from the process data; and a monitoring unit configured to monitor the process data by comparing one or both of an evaluation value that evaluates the first data and an evaluation value that evaluates the second data with corresponding upper and lower limit values.