公开(公告)号：US20040261710A1

公开(公告)日：2004-12-30

申请号：US10892190

申请日：2004-07-16

申请人： Tokyo Electron Limited

发明人： Minoru Matsushita ,  Yasushi Kodashima ,  Toshikazu Kumai

IPC分类号： C23C016/00

CPC分类号： H01L21/67745 ,  C23C16/54 ,  H01L21/67161 ,  H01L21/67167 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67742 ,  Y10S414/139

摘要： Processing apparatus is disclosed, that comprises substrate container holding table that can hold substrate container that contains plurality of target substrates, first transferring chamber, disposed adjacent to the substrate container holding table, that maintains the interior at first pressure, first processing unit group, disposed around the first transferring chamber, that processes target substrate at the first pressure, first transferring mechanism, disposed in the first transferring chamber, that transfers target substrate, second transferring chamber, disposed adjacent to the first transferring chamber, that maintains the interior at second pressure, second processing unit group, disposed around the second transferring chamber, that processes target substrate at the second pressure, and second transferring mechanism, disposed in the second transferring chamber, wherein the first transferring mechanism and/or the second transferring mechanism has at least two transferring arms.