公开(公告)号：US20230297056A1

公开(公告)日：2023-09-21

申请号：US18118546

申请日：2023-03-07

Applicant: Tokyo Electron Limited

Inventor： Ryota AOI ,  Yoshitaka ENOKI ,  Yasuhiko OKADA

IPC: G05B19/042

CPC classification number: G05B19/0428

Abstract: An information processing apparatus includes: an operation status data collecting unit that collects operation status data of a plurality of heat treatment apparatuses installed in a manufacturing plant; an operation status data storing unit that stores the operation status data for each of the plurality of heat treatment apparatuses; and an operation status data providing unit that provides list information of the operation status data for each of the plurality of heat treatment apparatuses stored in the operation status data storing unit, as information that supports restoration of the plurality of heat treatment apparatuses when operations of the plurality of heat treatment apparatuses are forcibly stopped.

公开(公告)号：US20210018905A1

公开(公告)日：2021-01-21

申请号：US16926944

申请日：2020-07-13

Applicant: Tokyo Electron Limited

Inventor： Ryota AOI ,  Yasuhiko OKADA ,  Yoshitaka ENOKI ,  Kakeru HIRATOKO

IPC: G05B23/02

Abstract: A state management system includes: an acquisition unit that acquires data accumulated in an apparatus; an execution unit that executes a process of combining a plurality of types of data selected in advance among the acquired data and calculating one index indicating a normality of the apparatus at predetermined intervals; and a display controller that displays the calculated one index in a display.

公开(公告)号：US20210327045A1

公开(公告)日：2021-10-21

申请号：US17223349

申请日：2021-04-06

Applicant: Tokyo Electron Limited

Inventor： Tsuyoshi MORIYA ,  Yoshitaka ENOKI ,  Tokio TOYAMA ,  Michihiro TAKAHASHI ,  Takuya MORI

IPC: G06T7/00 ,  G06T11/00 ,  G06T7/70

Abstract: A contaminant detection system includes a light source configured to emit excitation light on an object to be inspected; a detector configured to detect fluorescence emitted from a contaminant adhering to the object to be inspected; and a processor. The fluorescence is caused by emission of the excitation light from the light source onto the object to be inspected. The processor is configured to perform a determination of a location of the contaminant and a type of the contaminant, based on the fluorescence emitted from the contaminant; and output a result of the determination.

公开(公告)号：US20200312621A1

公开(公告)日：2020-10-01

申请号：US16826491

申请日：2020-03-23

Applicant: Tokyo Electron Limited

Inventor： Shigehiro MIURA ,  Masato YONEZAWA ,  Takehiro FUKADA ,  Yoshitaka ENOKI ,  Yuji SAWADA

IPC: H01J37/32 ,  H01L21/02 ,  C23C16/40 ,  C23C16/455

Abstract: A deposition method performed by a deposition apparatus is provided. The deposition apparatus includes an antenna that forms an inductive magnetic field in a plasma processing region; and a rotary table that revolves a substrate around a rotational center of the rotary table. The method includes: supplying an ignition gas containing a noble gas and an additive gas to the plasma processing region; setting electric power supplied to the antenna to a first predetermined value to form a plasma of the ignition gas; increasing the electric power to a second predetermined value; stopping the supply of the additive gas; switching a gas supplied to the plasma processing region from the ignition gas to a gas for forming the film; and lifting an end of the antenna on a side closer to the rotational center while maintaining a height of another end of the antenna.