公开(公告)号：US20210017646A1

公开(公告)日：2021-01-21

申请号：US16928740

申请日：2020-07-14

Applicant: Tokyo Electron Limited

Inventor： Yoshitaka MIURA

IPC: C23C16/458 ,  C23C16/52

Abstract: A substrate processing apparatus including: a processing container; an injector provided inside the processing container to have a shape extending in a longitudinal direction and configured to supply a processing gas; a holder fixed to the injector; a windmill fixed to the holder; a first driving-gas supply part configured to supply a driving-gas that rotates the windmill in a first direction; a second driving-gas supply part configured to supply the driving-gas that rotates the windmill in a second direction opposite the first direction; and a driving-gas controller configured to control the supply of the driving-gas from the first driving-gas supply part and the second driving-gas supply part. The injector is rotated about the longitudinal direction corresponding to a rotational axis by rotating the windmill through the supply of the driving-gas from at least one of the first and second driving-gas supply parts under the control of the driving-gas controller.

公开(公告)号：US20240332047A1

公开(公告)日：2024-10-03

申请号：US18610344

申请日：2024-03-20

Applicant: Tokyo Electron Limited

Inventor： Yoshitaka MIURA ,  Tomoyuki NAGATA

IPC: H01L21/67

CPC classification number: H01L21/67248 ,  H01L21/67017 ,  H01L21/6719 ,  H01L21/67253

Abstract: A substrate processing apparatus includes: a process container accommodating a substrate holder that holds a plurality of substrates and including an opening at a lower end of the process container; a lid configured to open and close the opening; and a thermal insulator installed on the lid and configured to thermally insulate a first space below the substrate holder. The thermal insulator includes a partition member that forms a second space partitioned from the first space. The lid includes a supply port for supplying a temperature regulation fluid to the second space and an exhaust port for discharging the temperature regulation fluid from the second space.

公开(公告)号：US20240332043A1

公开(公告)日：2024-10-03

申请号：US18616594

申请日：2024-03-26

Applicant: Tokyo Electron Limited

Inventor： Tomoyuki NAGATA ,  Yoshitaka MIURA

IPC: H01L21/67

CPC classification number: H01L21/67109

Abstract: A substrate processing apparatus includes a vacuum container configured to accommodate a substrate holder configured to hold a plurality of substrates and having an opening provided in a lower end of the vacuum container, a lid configured to open/close the opening, and a heat-insulating unit configured to insulate a first space below the substrate holder, wherein the heat-insulating unit includes a partition member that forms a second space partitioned from the first space, and the partition member is provided to be rotatable with respect to the lid.

公开(公告)号：US20240060184A1

公开(公告)日：2024-02-22

申请号：US18446634

申请日：2023-08-09

Applicant: Tokyo Electron Limited

Inventor： Yoshitaka MIURA

IPC: C23C16/46 ,  C23C16/458 ,  H01L21/67

CPC classification number: C23C16/46 ,  C23C16/4583 ,  H01L21/67109

Abstract: A heat treatment apparatus includes: a processing container having a roof in a cylindrical shape and a lower end opening, and in which a first space is formed; a lid for closing the lower end opening; a support including a shaft portion and a placement portion; a boat installed on the placement portion to vertically hold substrates; a partitioning member provided around the shaft portion with a gap left from a lower surface of the placement portion to form a second space partitioned from the first space; and a heat insulating material provided in the second space. An exhaust port is provided in a sidewall of the processing container. In a circumferential direction of the processing container, the gap includes a first gap having at least an angular position where the exhaust port is provided, and a second gap provided at an angular position excluding the first gap.