Apparatus for plasma processing
    1.
    发明授权

    公开(公告)号:US11646178B2

    公开(公告)日:2023-05-09

    申请号:US17241755

    申请日:2021-04-27

    Abstract: A controller of a plasma processing apparatus stores a frequency spectrum related to a first timing into a storage unit, controls a microwave generator to generate a microwave in correspondence to a setting frequency, setting power, and a setting bandwidth at a second timing, controls a demodulator to measure travelling wave power and reflected wave power of the microwave for each frequency, calculates the frequency spectrum related to the second timing on the basis of a measurement result from the demodulator, calculates a correction value for correcting a waveform of the travelling wave power for each frequency such that a difference for each frequency between the frequency spectrum related to the second timing and the frequency spectrum related to the first timing, stored in the storage unit, is small, and controls the microwave generator on the basis of the calculated correction value for each frequency.

    Microwave output device and plasma processing device

    公开(公告)号:US11031213B2

    公开(公告)日:2021-06-08

    申请号:US16491012

    申请日:2018-05-02

    Abstract: A device includes a microwave generation unit that averages the first measured values and the second measured values at a predetermined movement average time and a predetermined sampling interval, and controls the microwave such that a value obtained by subtracting the averaged second measured value from the averaged first measured value comes close to the setting power, and in which the predetermined movement average time is 60 μs or less, and a relationship of y≥78.178x0.1775 is satisfied when the predetermined sampling interval is indicated by x, and the predetermined movement average time is indicated by y.

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