摘要:
A zoom lens comprises a magnification changing system and a relay lens system succeeding the magnification changing system. The magnification changing system comprises, in succession from the object side, a first group as a focusing portion having a positive refractive power, a second group as a variator portion having a negative refractive power and movable along the optical axis to thereby change chiefly the focal length, and a third group as a compensator portion having a negative refractive power and maintaining the image plane fluctuated by movement of the variator portion at a predetermined position. The relay lens system comprises a fourth group as a forward relay system group having a positive refractive power and a fifth group as a rearward relay system group having a positive refractive power. The fourth group has three positive lens components of which at least the middle lens component is a cemented lens component having a convex cemented surface in the direction of the image side. The fifth group has at least one positive lens component which is a cemented lens having a convex cemented surface on the object side.
摘要:
A high-performance projection exposure apparatus and method which can adjust optical characteristics which are rotationally asymmetric with respect to the optical axis of projection optical system and which remain in the projection optical system. In exemplary embodiments, the projection exposure apparatus includes an illumination optical system, a projection optical system and a plurality of optical elements. The illumination optical system illuminates a first object, and the projection optical system projects an image of the first object onto a second object under a predetermined magnification. The optical elements are set between the first object and the second object, and has rotationally asymmetric powers with respect to an optical axis of the projection optical system. Consequently, the optical elements can correct an optical characteristic rotationally asymmetric with respect to the optical axis of the projection optical system remaining in the projection optical system.
摘要:
In the projection optical system that projects an image of the first object onto the second object with a fixed reduction ratio and a projection aligner equipped therewith, said projection optical system comprises, viewed from said first object side, in order of succession, the first group of lenses with positive refractive power, and the second group of lenses virtually consists of afocal system, and the third group of lens with positive refractive power, and if the focal length of said projection optical system is represented by F, the projection magnification ratio of said projection optical system is represented by B, the distance between said first object and said second object is represented by L, the distance from said first object to the lens surface that is closest to said first group of lenses is represented by d.sub.0, the focal length of said first group of lenses is represented by f.sub.1, and the focal length of said third group of lenses is represented by f.sub.3 herein, then the following conditions should be satisfied:1.8.ltoreq..vertline.F/(B.multidot.L).vertline.d.sub.0 /L.ltoreq.0.20.80.ltoreq.f.sub.3 /f.sub.1 .ltoreq.1.5.
摘要翻译:在将第一物体的图像以固定的减速比投影到第二物体的投影光学系统和配备有投影对准器的投影光学系统中,所述投影光学系统从所述第一物体侧观察,依次依次包括第一组 具有正屈光力的透镜,第二组透镜实际上由无焦点系统组成,并且具有正屈光力的第三组透镜,并且如果所述投影光学系统的焦距由F表示,投影放大率 所述投影光学系统由B表示,所述第一物体与所述第二物体之间的距离用L表示,最接近所述第一组透镜的距离所述第一物体到透镜表面的距离由d0表示,焦点 所述第一组透镜的长度由f1表示,并且所述第三组透镜的焦距由f3表示,则f 应满足机翼条件:1.8 = | F /(BxL)| d0 / L = 0.2 0.80 = f3 / f1 = 1.5。
摘要:
In the projection optical system that projects an image of the first object onto the second object with a fixed reduction ratio and a projection aligner equipped therewith, said projection optical system comprises, viewed from said first object side, in order of succession, the first group of lenses with positive refractive power, and the second group of lenses virtually consists of afocal system, and the third group of lens with positive refractive power, and if the focal length of the overall system is represented by F, the projection magnification ratio of said projection optical system is represented by B, the distance between said first object and said second object is represented by L, and when a ray from the second object side of said projection optical system that is parallel to the optical axis of said projection optical system is incident on said projection optical system, a distance between a point where an extension on the first object side of said ray intercepts the optical axis and said first object plane is represented by e, and a height of said ray on said first object from the optical axis of said projection optical system, when said ray, coming through said projection optical system, reaches said first object is represented by h, then the following conditions should be satisfied: 1.8.ltoreq..vertline.F/(B.cndot.L).vertline. .vertline.h/e.vertline..ltoreq.3/1000.
摘要翻译:在将第一物体的图像以固定的减速比投影到第二物体的投影光学系统和配备有投影对准器的投影光学系统中,所述投影光学系统从所述第一物体侧观察,依次依次包括第一组 具有正屈光力的透镜,第二组透镜实际上由无焦点系统组成,而具有正屈光力的第三组透镜,并且如果整个系统的焦距由F表示,则所述透镜的投影倍率 投影光学系统由B表示,所述第一物体与所述第二物体之间的距离由L表示,并且当来自所述投影光学系统的与所述投影光学系统的光轴平行的第二物体侧的光线为 在所述投影光学系统上的事件之间,所述光线的第一物体侧上的延伸线与光学镜片之间的距离 并且所述第一物体平面由e表示,并且当通过所述投影光学系统通过所述投影光学系统的所述光线到达所述第一物体时,所述第一物体上的所述光线从所述投影光学系统的光轴的高度由 h,则应满足以下条件:1.8 = | F /(BL)|| h / e | = 3/1000。
摘要:
There are provided an imaging optical system and imaging equipment, which are compatible with a solid-state imaging device having a size of ½ inches or less and which include an optical system having a small size and lightness in weight and also having an excellent mass productivity and a low cost while keeping optical performance at a wide field angle, for example, at a total angle of view of 80 degrees or more. When predetermined conditions are satisfied for a plurality of lenses constituting the imaging optical system, the absolute value of power of each lens group is suppressed to be small, and thus the generation of aberration is suppressed and a preferable aberration is obtained.
摘要:
In the projection optical system that projects an image of the first object onto the second object with a fixed reduction ratio and a projection aligner equipped therewith, said projection optical system comprises, viewed from said first object side, in order of succession, the first group of lenses with positive refractive power, and the second group of lenses virtually consists of afocal system, and the third group of lens with positive refractive power, and if the focal length of the overall system is represented by F, the projection magnification ratio of said projection optical system is represented by B, the distance between said first object and said second object is represented by L, and when a ray from the second object side of said projection optical system that is parallel to the optical axis of said projection optical system is incident on said projection optical system, a distance between a point where an extension on the first object side of said ray intercepts the optical axis and said first object plane is represented by e, and a height of said ray on said first object from the optical axis of said projection optical system, when said ray, coming through said projection optical system, reaches said first object is represented by h, then the following conditions should be satisfied: 1.8≦|F/(B·L)| |h/e|≦3/1000.
摘要:
A method of manufacturing an exposure apparatus includes a step of providing a projection optical system that projects a pattern image formed on a mask onto a photosensitive substrate. Additionally, a surface of a correction member having a predetermined thickness is locally tooled or processed in order to correct random aberration that remains in the projection optical system. The tooled correction member is arranged between the mask and the substrate, irrespective of the mask. Furthermore, when the projection optical system is provided, an aberration caused due to the predetermined thickness of the correction member is taken into account in advance.
摘要:
There are provided an imaging optical system and imaging equipment, which are compatible with a solid-state imaging device having a size of ½ inches or less and which include an optical system having a small size and lightness in weight and also having an excellent mass productivity and a low cost while keeping optical performance at a wide field angle, for example, at a total angle of view of 80 degrees or more. When predetermined conditions are satisfied for a plurality of lenses constituting the imaging optical system, the absolute value of power of each lens group is suppressed to be small, and thus the generation of aberration is suppressed and a preferable aberration is obtained.
摘要:
A method of characterizing photolithographic tool performance is presented. Variations in performance over an image or exposure field are evaluated and contributions to the variation due to the partial coherence factor of the tool separated from other contributing factors. Methods of determining the relative magnitude of these variations is provided and a photolithographic tool that incorporates these methods described.
摘要:
A projection optical system that projects an image of an object in an object surface onto an image surface with a fixed reduction magnification comprises, in light path order from the object surface: a first group of lenses with positive refractive power; a second group of lenses forming an approximately afocal system; and a third group of lenses with positive refractive power. The projection optical system has a focal length F, the projection optical system has a projection magnification B, the object surface and the image surface are separated by a distance L, and a lens surface in the first group of lenses that is closest to the object surface is separated from the object surface by a distance d.sub.0. A paraxial marginal ray from an axial object point on the object surface enters the second group of lenses G.sub.2 at an entrance height h.sub.1 from an optical axis, and the paraxial marginal ray from the axial object point on the object surface emerges from the second group of lenses G.sub.2 at an emergence height h.sub.2 from the optical axis. The optical system is characterized by the following: 1.8.ltoreq..vertline.F/(B.multidot.L).vertline..ltoreq.6, d.sub.0 /L.ltoreq.0.2, and 4.ltoreq..vertline.h.sub.2 /h.sub.1 .vertline..ltoreq.10.