Zoom lens
    1.
    发明授权
    Zoom lens 失效
    变焦镜头

    公开(公告)号:US4437733A

    公开(公告)日:1984-03-20

    申请号:US280102

    申请日:1981-07-02

    CPC分类号: G02B15/22

    摘要: A zoom lens comprises a magnification changing system and a relay lens system succeeding the magnification changing system. The magnification changing system comprises, in succession from the object side, a first group as a focusing portion having a positive refractive power, a second group as a variator portion having a negative refractive power and movable along the optical axis to thereby change chiefly the focal length, and a third group as a compensator portion having a negative refractive power and maintaining the image plane fluctuated by movement of the variator portion at a predetermined position. The relay lens system comprises a fourth group as a forward relay system group having a positive refractive power and a fifth group as a rearward relay system group having a positive refractive power. The fourth group has three positive lens components of which at least the middle lens component is a cemented lens component having a convex cemented surface in the direction of the image side. The fifth group has at least one positive lens component which is a cemented lens having a convex cemented surface on the object side.

    摘要翻译: 变焦镜头包括放大倍率改变系统和继续放大倍率改变系统之后的中继透镜系统。 倍率变化系统从物体侧连续地包括作为具有正折光力的聚焦部分的第一组,作为具有负屈光力的变倍部分的第二组,并且沿着光轴可移动,从而主要改变焦点 长度和第三组作为具有负屈光力的补偿器部分,并且通过变化器部分在预定位置的移动来保持图像平面波动。 中继透镜系统包括具有正屈光力的正向中继系统组的第四组和具有正屈光力的后向中继系统组的第五组。 第四组具有三个正透镜部件,其中至少中间透镜部件是在图像侧的方向上具有凸形胶合表面的胶合透镜部件。 第五组具有至少一个正透镜部件,该正透镜部件是在物体侧上具有凸形胶合表面的胶合透镜。

    Projection exposure apparatus and method with adjustment of rotationally asymmetric optical characteristics
    2.
    发明授权
    Projection exposure apparatus and method with adjustment of rotationally asymmetric optical characteristics 失效
    投影曝光装置和调整旋转非对称光学特性的方法

    公开(公告)号:US06958803B2

    公开(公告)日:2005-10-25

    申请号:US10619515

    申请日:2003-07-16

    摘要: A high-performance projection exposure apparatus and method which can adjust optical characteristics which are rotationally asymmetric with respect to the optical axis of projection optical system and which remain in the projection optical system. In exemplary embodiments, the projection exposure apparatus includes an illumination optical system, a projection optical system and a plurality of optical elements. The illumination optical system illuminates a first object, and the projection optical system projects an image of the first object onto a second object under a predetermined magnification. The optical elements are set between the first object and the second object, and has rotationally asymmetric powers with respect to an optical axis of the projection optical system. Consequently, the optical elements can correct an optical characteristic rotationally asymmetric with respect to the optical axis of the projection optical system remaining in the projection optical system.

    摘要翻译: 一种可以调节相对于投影光学系统的光轴旋转不对称且保留在投影光学系统中的光学特性的高性能投影曝光装置和方法。 在示例性实施例中,投影曝光装置包括照明光学系统,投影光学系统和多个光学元件。 照明光学系统照亮第一物体,并且投影光学系统以预定的倍率将第一物体的图像投射到第二物体上。 光学元件设置在第一物体和第二物体之间,并且相对于投影光学系统的光轴具有旋转非对称的能量。 因此,光学元件可以校正相对于保留在投影光学系统中的投影光学系统的光轴旋转不对称的光学特性。

    Projection optical system and projection exposure apparatus
    3.
    发明授权
    Projection optical system and projection exposure apparatus 失效
    投影光学系统和投影曝光装置

    公开(公告)号:US5943172A

    公开(公告)日:1999-08-24

    申请号:US929155

    申请日:1997-09-11

    CPC分类号: G02B9/12 G02B13/24 G03F7/7025

    摘要: In the projection optical system that projects an image of the first object onto the second object with a fixed reduction ratio and a projection aligner equipped therewith, said projection optical system comprises, viewed from said first object side, in order of succession, the first group of lenses with positive refractive power, and the second group of lenses virtually consists of afocal system, and the third group of lens with positive refractive power, and if the focal length of said projection optical system is represented by F, the projection magnification ratio of said projection optical system is represented by B, the distance between said first object and said second object is represented by L, the distance from said first object to the lens surface that is closest to said first group of lenses is represented by d.sub.0, the focal length of said first group of lenses is represented by f.sub.1, and the focal length of said third group of lenses is represented by f.sub.3 herein, then the following conditions should be satisfied:1.8.ltoreq..vertline.F/(B.multidot.L).vertline.d.sub.0 /L.ltoreq.0.20.80.ltoreq.f.sub.3 /f.sub.1 .ltoreq.1.5.

    摘要翻译: 在将第一物体的图像以固定的减速比投影到第二物体的投影光学系统和配备有投影对准器的投影光学系统中,所述投影光学系统从所述第一物体侧观察,依次依次包括第一组 具有正屈光力的透镜,第二组透镜实际上由无焦点系统组成,并且具有正屈光力的第三组透镜,并且如果所述投影光学系统的焦距由F表示,投影放大率 所述投影光学系统由B表示,所述第一物体与所述第二物体之间的距离用L表示,最接近所述第一组透镜的距离所述第一物体到透镜表面的距离由d0表示,焦点 所述第一组透镜的长度由f1表示,并且所述第三组透镜的焦距由f3表示,则f 应满足机翼条件:1.8

    Projection optical system and projection exposure apparatus
    4.
    发明授权
    Projection optical system and projection exposure apparatus 失效
    投影光学系统和投影曝光装置

    公开(公告)号:US5805344A

    公开(公告)日:1998-09-08

    申请号:US729096

    申请日:1996-10-11

    摘要: In the projection optical system that projects an image of the first object onto the second object with a fixed reduction ratio and a projection aligner equipped therewith, said projection optical system comprises, viewed from said first object side, in order of succession, the first group of lenses with positive refractive power, and the second group of lenses virtually consists of afocal system, and the third group of lens with positive refractive power, and if the focal length of the overall system is represented by F, the projection magnification ratio of said projection optical system is represented by B, the distance between said first object and said second object is represented by L, and when a ray from the second object side of said projection optical system that is parallel to the optical axis of said projection optical system is incident on said projection optical system, a distance between a point where an extension on the first object side of said ray intercepts the optical axis and said first object plane is represented by e, and a height of said ray on said first object from the optical axis of said projection optical system, when said ray, coming through said projection optical system, reaches said first object is represented by h, then the following conditions should be satisfied: 1.8.ltoreq..vertline.F/(B.cndot.L).vertline. .vertline.h/e.vertline..ltoreq.3/1000.

    摘要翻译: 在将第一物体的图像以固定的减速比投影到第二物体的投影光学系统和配备有投影对准器的投影光学系统中,所述投影光学系统从所述第一物体侧观察,依次依次包括第一组 具有正屈光力的透镜,第二组透镜实际上由无焦点系统组成,而具有正屈光力的第三组透镜,并且如果整个系统的焦距由F表示,则所述透镜的投影倍率 投影光学系统由B表示,所述第一物体与所述第二物体之间的距离由L表示,并且当来自所述投影光学系统的与所述投影光学系统的光轴平行的第二物体侧的光线为 在所述投影光学系统上的事件之间,所述光线的第一物体侧上的延伸线与光学镜片之间的距离 并且所述第一物体平面由e表示,并且当通过所述投影光学系统通过所述投影光学系统的所述光线到达所述第一物体时,所述第一物体上的所述光线从所述投影光学系统的光轴的高度由 h,则应满足以下条件:1.8

    Imaging optical system and imaging equipment
    5.
    发明授权
    Imaging optical system and imaging equipment 有权
    成像光学系统和成像设备

    公开(公告)号:US09195033B2

    公开(公告)日:2015-11-24

    申请号:US14227721

    申请日:2014-03-27

    申请人: Toshihiro Sasaya

    发明人: Toshihiro Sasaya

    摘要: There are provided an imaging optical system and imaging equipment, which are compatible with a solid-state imaging device having a size of ½ inches or less and which include an optical system having a small size and lightness in weight and also having an excellent mass productivity and a low cost while keeping optical performance at a wide field angle, for example, at a total angle of view of 80 degrees or more. When predetermined conditions are satisfied for a plurality of lenses constituting the imaging optical system, the absolute value of power of each lens group is suppressed to be small, and thus the generation of aberration is suppressed and a preferable aberration is obtained.

    摘要翻译: 提供了一种与具有1/2英寸或更小尺寸的固态成像装置兼容的成像光学系统和成像设备,其包括具有小尺寸和轻重量的光学系统,并且还具有优异的质量生产率 并且在将光学性能保持在宽视场角的同时成本低,例如在80度以上的总视角。 当对构成成像光学系统的多个透镜满足预定条件时,每个透镜组的功率的绝对值被抑制得较小,从而抑制像差的产生,并且获得优选的像差。

    Projection optical system and projection exposure apparatus
    6.
    再颁专利
    Projection optical system and projection exposure apparatus 有权
    投影光学系统和投影曝光装置

    公开(公告)号:USRE38403E1

    公开(公告)日:2004-01-27

    申请号:US09659376

    申请日:2000-09-08

    IPC分类号: G02B1304

    摘要: In the projection optical system that projects an image of the first object onto the second object with a fixed reduction ratio and a projection aligner equipped therewith, said projection optical system comprises, viewed from said first object side, in order of succession, the first group of lenses with positive refractive power, and the second group of lenses virtually consists of afocal system, and the third group of lens with positive refractive power, and if the focal length of the overall system is represented by F, the projection magnification ratio of said projection optical system is represented by B, the distance between said first object and said second object is represented by L, and when a ray from the second object side of said projection optical system that is parallel to the optical axis of said projection optical system is incident on said projection optical system, a distance between a point where an extension on the first object side of said ray intercepts the optical axis and said first object plane is represented by e, and a height of said ray on said first object from the optical axis of said projection optical system, when said ray, coming through said projection optical system, reaches said first object is represented by h, then the following conditions should be satisfied: 1.8≦|F/(B·L)| |h/e|≦3/1000.

    摘要翻译: 投影光学系统,其将形成在掩模版上的图案的图像投影到基板上,所述投影光学系统以从光掩模的光程顺序投影:具有正折光力的第一组,所述第一组包括至少两个正透镜; 包括至少四个正透镜和至少四个负透镜的第二组; 具有正屈光力的第三组,所述第三组包括至少两个正透镜; 以及包括在所述第一,第二和/或第三组中的至少一个中的至少一个非球面透镜表面。

    Method of manufacturing and using correction member to correct aberration in projection exposure apparatus
    7.
    发明授权
    Method of manufacturing and using correction member to correct aberration in projection exposure apparatus 失效
    制造和使用校正构件以校正投影曝光装置中的像差的方法

    公开(公告)号:US06262793B1

    公开(公告)日:2001-07-17

    申请号:US08360515

    申请日:1994-12-21

    IPC分类号: G03B2742

    摘要: A method of manufacturing an exposure apparatus includes a step of providing a projection optical system that projects a pattern image formed on a mask onto a photosensitive substrate. Additionally, a surface of a correction member having a predetermined thickness is locally tooled or processed in order to correct random aberration that remains in the projection optical system. The tooled correction member is arranged between the mask and the substrate, irrespective of the mask. Furthermore, when the projection optical system is provided, an aberration caused due to the predetermined thickness of the correction member is taken into account in advance.

    摘要翻译: 制造曝光装置的方法包括提供将形成在掩模上的图案图像投影到感光基板上的投影光学系统的步骤。 此外,具有预定厚度的校正构件的表面被局部加工或加工,以便校正残留在投影光学系统中的随机像差。 加工的校正构件布置在掩模和基板之间,而不管掩模。 此外,当设置投影光学系统时,预先考虑由于校正构件的预定厚度引起的像差。

    IMAGING OPTICAL SYSTEM AND IMAGING EQUIPMENT
    8.
    发明申请
    IMAGING OPTICAL SYSTEM AND IMAGING EQUIPMENT 有权
    成像光学系统和成像设备

    公开(公告)号:US20140293100A1

    公开(公告)日:2014-10-02

    申请号:US14227721

    申请日:2014-03-27

    申请人: Toshihiro Sasaya

    发明人: Toshihiro Sasaya

    IPC分类号: G02B3/04 H04N5/351

    摘要: There are provided an imaging optical system and imaging equipment, which are compatible with a solid-state imaging device having a size of ½ inches or less and which include an optical system having a small size and lightness in weight and also having an excellent mass productivity and a low cost while keeping optical performance at a wide field angle, for example, at a total angle of view of 80 degrees or more. When predetermined conditions are satisfied for a plurality of lenses constituting the imaging optical system, the absolute value of power of each lens group is suppressed to be small, and thus the generation of aberration is suppressed and a preferable aberration is obtained.

    摘要翻译: 提供了一种与具有1/2英寸或更小尺寸的固态成像装置兼容的成像光学系统和成像设备,其包括具有小尺寸和轻重量的光学系统,并且还具有优异的质量生产率 并且在将光学性能保持在宽视场角的同时成本低,例如在80度以上的总视角。 当对构成成像光学系统的多个透镜满足预定条件时,每个透镜组的功率的绝对值被抑制得较小,从而抑制像差的产生,并且获得优选的像差。

    Method of characterizing photolithographic tool performance and photolithographic tool thereof
    9.
    发明授权
    Method of characterizing photolithographic tool performance and photolithographic tool thereof 失效
    表征光刻工具性能的方法及其光刻工具

    公开(公告)号:US06323938B1

    公开(公告)日:2001-11-27

    申请号:US09067309

    申请日:1998-04-27

    IPC分类号: G03B2732

    CPC分类号: G03F7/706

    摘要: A method of characterizing photolithographic tool performance is presented. Variations in performance over an image or exposure field are evaluated and contributions to the variation due to the partial coherence factor of the tool separated from other contributing factors. Methods of determining the relative magnitude of these variations is provided and a photolithographic tool that incorporates these methods described.

    摘要翻译: 提出了一种表征光刻工具性能的方法。 对图像或曝光场的性能变化进行评估,并且由于工具的部分相干因子与其他影响因素分离而对变化的贡献。 提供了确定这些变化的相对幅度的方法和包含这些方法的光刻工具。

    Projection optical system and projection exposure apparatus
    10.
    发明授权
    Projection optical system and projection exposure apparatus 失效
    投影光学系统和投影曝光装置

    公开(公告)号:US5831776A

    公开(公告)日:1998-11-03

    申请号:US944590

    申请日:1997-10-06

    CPC分类号: G02B13/24 G03F7/7025

    摘要: A projection optical system that projects an image of an object in an object surface onto an image surface with a fixed reduction magnification comprises, in light path order from the object surface: a first group of lenses with positive refractive power; a second group of lenses forming an approximately afocal system; and a third group of lenses with positive refractive power. The projection optical system has a focal length F, the projection optical system has a projection magnification B, the object surface and the image surface are separated by a distance L, and a lens surface in the first group of lenses that is closest to the object surface is separated from the object surface by a distance d.sub.0. A paraxial marginal ray from an axial object point on the object surface enters the second group of lenses G.sub.2 at an entrance height h.sub.1 from an optical axis, and the paraxial marginal ray from the axial object point on the object surface emerges from the second group of lenses G.sub.2 at an emergence height h.sub.2 from the optical axis. The optical system is characterized by the following: 1.8.ltoreq..vertline.F/(B.multidot.L).vertline..ltoreq.6, d.sub.0 /L.ltoreq.0.2, and 4.ltoreq..vertline.h.sub.2 /h.sub.1 .vertline..ltoreq.10.

    摘要翻译: 以固定的缩小倍率将物体表面上的物体的图像投影到图像表面上的投影光学系统包括从物体表面的光路顺序:具有正折射光焦度的第一组透镜; 第二组透镜,形成大致无焦的系统; 以及具有正屈光力的第三组透镜。 投影光学系统具有焦距F,投影光学系统具有投影倍率B,物体表面和图像表面间隔距离L,并且第一组透镜中最靠近物体的透镜表面 表面与物体表面分开距离d0。 来自物体表面上的轴向物点的近轴边缘射线在距离光轴的入口高度h1处进入第二组透镜G2,并且来自物体表面上的轴向物点的近轴边缘射线从第二组 距离光轴出现高度h2的透镜G2。 光学系统的特征在于:1.8