Gas barrier film and method of manufacturing the same

    公开(公告)号:US10961622B2

    公开(公告)日:2021-03-30

    申请号:US16149509

    申请日:2018-10-02

    Inventor: Nao Takashima

    Abstract: A method of manufacturing a gas barrier film includes depositing an atomic layer deposition film on a surface of a plastic substrate to form a gas barrier laminate, using atomic layer deposition; depositing a curable resin layer on a support from which the layer is peelable, to form an overcoat laminate; laminating the overcoat laminate to the gas barrier laminate, with the atomic layer deposition film and the curable resin layer facing each other, and transferring the curable resin layer onto the atomic layer deposition film; curing the curable resin layer through application of heat or an active energy beam; and releasing the curable resin layer from the support.

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