ELECTRON BEAM WRITING METHOD AND APPARATUS
    1.
    发明申请
    ELECTRON BEAM WRITING METHOD AND APPARATUS 审中-公开
    电子束写入方法和装置

    公开(公告)号:US20100237262A1

    公开(公告)日:2010-09-23

    申请号:US12724856

    申请日:2010-03-16

    IPC分类号: G21K5/00

    摘要: When performing pattern writing by emitting an electron beam, a fixed frequency component, which is a component of a variation in an encoder signal from the encoder in one rotation of the rotation stage that commonly appears in a plurality of different rotational speeds of the rotation stage, is compensated for by deflection correcting the electron beam in a circumferential direction, and a variable frequency component, which is a component of the variation in the encoder signal other than the fixed frequency component, is compensated for by changing the clock frequency of a write clock.

    摘要翻译: 当通过发射电子束执行图案写入时,固定频率分量是作为编码器信号的变化的一部分的编码器信号的一部分,所述编码器信号来自编码器,所述编码器信号在所述旋转平台的一次旋转中,所述编码器信号通常以旋转台 通过在圆周方向校正电子束的偏转进行补偿,并且通过改变写入的时钟频率来补偿作为除了固定频率分量之外的编码器信号的变化的分量的可变频率分量 时钟。

    METHOD OF MANUFACTURING MOTHER STAMPER AND METHOD OF MANUFACTURING STAMPER
    3.
    发明申请
    METHOD OF MANUFACTURING MOTHER STAMPER AND METHOD OF MANUFACTURING STAMPER 审中-公开
    制造母印机的方法及其制造方法

    公开(公告)号:US20080261152A1

    公开(公告)日:2008-10-23

    申请号:US11949819

    申请日:2007-12-04

    申请人: Kenji SUGIYAMA

    发明人: Kenji SUGIYAMA

    IPC分类号: G03F7/004

    摘要: A method of manufacturing a mother stamper comprises: a first resist layer formation process for forming a first resist layer on a substrate; a first electron beam irradiation process for irradiating electron beam at a first pattern on the first resist layer; a first development process for developing the first resist layer to remove the non-exposed area; a second resist layer formation process for forming a second resist layer on the substrate onto which the first resist layer remains; a second electron beam irradiation process for irradiating electron beam at a second pattern on the second resist layer; a second development process for developing the second resist layer to remove the exposed area that has been exposed in the second electron beam irradiation process; and an etching process for etching the substrate to provide a grooved pattern with different depths.

    摘要翻译: 母压模的制造方法包括:在基板上形成第一抗蚀剂层的第一抗蚀剂层形成工序; 用于在第一抗蚀剂层上以第一图案照射电子束的第一电子束照射处理; 用于显影第一抗蚀剂层以除去未曝光区域的第一显影工艺; 用于在其上保留有第一抗蚀剂层的基板上形成第二抗蚀剂层的第二抗蚀剂层形成工艺; 用于在第二抗蚀剂层上以第二图案照射电子束的第二电子束照射处理; 用于显影第二抗蚀剂层以去除在第二电子束照射过程中暴露的暴露区域的第二显影工艺; 以及用于蚀刻基板以提供具有不同深度的凹槽图案的蚀刻工艺。