摘要:
A process for producing geranylgeraniol is provided, which comprising the steps of subjecting a mixture of at least one ester derivative wherein one or more carbon-carbon double bonds in the molecule are in cis form represented by the general formula (1): ##STR1## wherein R represents an aromatic group which can be substituted with at least one substituent, or a higher aliphatic group having from 7 to 25 carbon atoms, and wavy lines, respectively, represent a state where each carbon-carbon double bond can be present in cis or trans form, and an ester derivative of the general formula (2): ##STR2## wherein R is as defined above, to crystallization to obtain the ester derivative of the formula (2) selectively, and hydrolyzing the thus obtained ester derivative.
摘要:
A process for producing 2,4-dihydroxyacetophenone is provided wherein resorcinol and acetic acid are reacted in the presence of a proton acid catalyst while removing formed water.
摘要:
4-N-substituted amino-2-aza-1-oxabicyclo[3.3.0]oct-2-ene-6-carboxylic acid esters are produced by adding a Brønsted acid to a mixture of a 2-azabicyclo[2.2.1]hept-5-en-3-one and an alcohol, thereby causing these components to react with each other to give a salt of cis-4-amino-2-cyclopentene-1-carboxylic acid ester, then allowing the salt of cis-4-amino-2-cyclopentene-1-carboxylic acid ester thus obtained to react with an amino-protecting group introducing compound in the presence of a base, thereby giving cis-4-N-substituted amino-2-cyclopentene-1-carboxylic acid ester, and then allowing this cis-4-N-substituted amino-2-cyclopentene-1-carboxylic acid ester to react with a hypohalogenite and an aldoxime.
摘要:
Provided are a polymerizable compound shown below which is useful as a raw material for a polymer having less swelling in developing, a polymer obtained by polymerizing a raw material containing the above polymerizable compound, a photoresist composition which contains the above polymer and which is improved in LWR and an efficient production process for the polymerizable compound described above: wherein n represents an integer of 0 to 2; R1 represents a hydrogen atom, methyl or trifluoromethyl; R2, R3, R4, R5, R6, R7, R8, R9 and R10 represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or the like; W represents an alkylene group having 1 to 10 carbon atoms or the like; and Y1 and Y2 represent an oxygen atom or a sulfur atom.
摘要翻译:提供下述可聚合化合物,其可用作显影时溶胀较小的聚合物的原料,通过聚合含有上述可聚合化合物的原料获得的聚合物,含有上述聚合物的光致抗蚀剂组合物, LWR和上述可聚合化合物的有效制备方法:其中n表示0至2的整数; R1表示氢原子,甲基或三氟甲基; R 2,R 3,R 4,R 5,R 6,R 7,R 8,R 9和R 10表示氢原子,碳原子数1〜6的烷基等; W表示碳原子数1〜10的亚烷基等; Y 1和Y 2表示氧原子或硫原子。
摘要:
An acrylate derivative represented by the following general formula (1): (in the formula, R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group; each of R2, R3, R5, R7, R8, R9 and R10 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkoxy group; each of R4 and R6 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkoxy group, or R4 and R6 are bonded to each other to represent an alkylene group, —O— or —S—; n represents 0, 1 or 2; and W represents an alkylene group or a cycloalkylene group); an intermediate thereof; a method for producing the same; a polymer compound which is obtainable from polymerization of a raw material containing the foregoing acrylate derivative and which is excellent in solubility in an organic solvent used for the preparation of a photoresist composition; and a photoresist composition containing the polymer compound, an organic solvent and a photo acid generator and having excellent adhesion to substrate and less pattern collapse, are provided.
摘要:
The present invention provides a method of producing 2-isopropenyl-5-methyl-4-hexen-1-yl 3-methyl-2-butenoate industrially advantageously in a high yield. More particularly, the present invention provides a method of producing 2-isopropenyl-5-methyl-4-hexen-1-yl 3-methyl-2-butenoate represented by the following formula (IV): which comprises reacting 2-isopropenyl-5-methyl-4-hexen-1-ol with an organic sulfonyl halide in the presence of a basic substance to give a sulfonate compound represented by the following formula (III): wherein R is a hydrocarbon group, and reacting the obtained sulfonate compound with senecionic acid in the presence of a basic substance.
摘要:
An acrylate derivative represented by the following general formula (1): (in the formula, R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group; each of R2, R3, R5, R7, R8, R9 and R10 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkoxy group; each of R4 and R6 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkoxy group, or R4 and R6 are bonded to each other to represent an alkylene group, —O— or —S—; n represents 0, 1 or 2; and W represents an alkylene group or a cycloalkylene group); an intermediate thereof; a method for producing the same; a polymer compound which is obtainable from polymerization of a raw material containing the foregoing acrylate derivative and which is excellent in solubility in an organic solvent used for the preparation of a photoresist composition; and a photoresist composition containing the polymer compound, an organic solvent and a photo acid generator and having excellent adhesion to substrate and less pattern collapse, are provided.
摘要:
Provided are a polymerizable compound shown below which is useful as a raw material for a polymer having less swelling in developing, a polymer obtained by polymerizing a raw material containing the above polymerizable compound, a photoresist composition which contains the above polymer and which is improved in LWR and an efficient production process for the polymerizable compound described above: wherein n represents an integer of 0 to 2; R1 represents a hydrogen atom, methyl or trifluoromethyl; R2, R3, R4, R5, R6, R7, R8, R9 and R10 represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or the like; W represents an alkylene group having 1 to 10 carbon atoms or the like; and Y1 and Y2 represent an oxygen atom or a sulfur atom.
摘要翻译:提供下述可聚合化合物,其可用作显影时溶胀较小的聚合物的原料,通过聚合含有上述可聚合化合物的原料获得的聚合物,含有上述聚合物的光致抗蚀剂组合物, LWR和上述可聚合化合物的有效制备方法:其中n表示0至2的整数; R1表示氢原子,甲基或三氟甲基; R 2,R 3,R 4,R 5,R 6,R 7,R 8,R 9和R 10表示氢原子,碳原子数1〜6的烷基等; W表示碳原子数1〜10的亚烷基等; Y 1和Y 2表示氧原子或硫原子。
摘要:
The present invention provides a method of producing 2-isopropenyl-5-methyl-4-hexen-1-yl 3-methyl-2-butenoate industrially advantageously in a high yield. More particularly, the present invention provides a method of producing 2-isopropenyl-5-methyl-4-hexen-1-yl 3-methyl-2-butenoate represented by the following formula (IV): which comprises reacting 2-isopropenyl-5-methyl-4-hexen-1-ol with an organic sulfonyl halide in the presence of a basic substance to give a sulfonate compound represented by the following formula (III): wherein R is a hydrocarbon group, and reacting the obtained sulfonate compound with senecionic acid in the presence of a basic substance.
摘要:
Disclosed is a loading unit for use in loading a bundle of objects to be conveyed, the loading unit being installed on a lifting member of a feeding device. The loading unit includes a first movable base on which a downstream side in a conveying direction of a bundle of objects to be conveyed is loaded, the first movable base being rotatable; and a second movable base on which an upstream side in the conveying direction of the bundle of objects is loaded, the second movable base being rotatable and disposed on a more upstream side in the conveying direction than the first movable base.