公开(公告)号：US20190242024A1

公开(公告)日：2019-08-08

申请号：US16209147

申请日：2018-12-04

Applicant: U.S. Army Research Laboratory ATTN: RDRL-LOC-I

Inventor： Nathan S. Lazarus ,  Kristin E. Angel

IPC: C25D5/12 ,  C25D7/12 ,  C25D3/12 ,  B29C64/336 ,  B29C64/118 ,  B29C64/112 ,  B29C64/295

CPC classification number: C25D5/12 ,  B29C64/112 ,  B29C64/118 ,  B29C64/295 ,  B29C64/336 ,  C25D3/12 ,  C25D7/123

Abstract: Systems, methods, architectures, mechanisms and/or apparatus configured to provide selective electroplating of a fused deposition modeling (FDM) printed article without the use of additional intermediate steps.