-
公开(公告)号:US20190088639A1
公开(公告)日:2019-03-21
申请号:US15987911
申请日:2018-05-24
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Chen-Hsien Hsu , Chien-Fu Chen , Cheng-Yang Tsai , Wei-Jen Wang , Chao-Wei Lin , Zhi-Hong Huang , Cheng-Tsung Ku , Chin-Sheng Yang
IPC: H01L27/02 , H03K19/0948 , H01L23/528 , H01L27/092 , H01L23/522 , H03K19/20 , H01L29/167
Abstract: The present invention provides an integrated circuit with a standard cell of an inverter standard cell. The integrated circuit includes: a first metal line and a second metal line stretching along a first direction; a first dummy gate and a second dummy gate stretching along a second direction; Plural fin structures stretching along the first direction; A gate structure disposed on the fin structures and stretching along the second direction; Two long contact plugs disposed at one side of the gate structure; two short contact plugs disposed at the other side of the gate structure; a gate contact plug disposed on the gate structure; Plural via plugs disposed on the long contact plugs, the short contact plugs and the gate contact plugs; A metal layer includes the first metal line, the second metal line, a third metal line and a fourth metal line.
-
公开(公告)号:US10262982B2
公开(公告)日:2019-04-16
申请号:US15785447
申请日:2017-10-17
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Chen-Hsien Hsu , Chien-Fu Chen , Cheng-Yang Tsai , Wei-Jen Wang , Chao-Wei Lin , Zhi-Hong Huang , Cheng-Tsung Ku , Chin-Sheng Yang
IPC: H01L27/02 , H03K19/0948 , H01L23/528 , H01L23/522 , H01L27/092 , H01L29/167 , H03K19/20
Abstract: The present invention provides an integrated circuit with a standard cell of an inverter. The integrated circuit includes: a first metal line and a second metal line stretching along a first direction; a first dummy gate and a second dummy gate stretching along a second direction; Plural fin structures stretching along the first direction; A gate structure disposed on the fin structures and stretching along the second direction; Two long contact plugs disposed at one side of the gate structure; two short contact plugs disposed at the other side of the gate structure; a gate contact plug disposed on the gate structure; Plural via plugs disposed on the long contact plugs, the short contact plugs and the gate contact plugs; A metal layer includes the first metal line, the second metal line, a third metal line and a fourth metal line.
-
公开(公告)号:US10090289B1
公开(公告)日:2018-10-02
申请号:US15813163
申请日:2017-11-15
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Chen-Hsien Hsu , Chien-Fu Chen , Cheng-Yang Tsai , Wei-Jen Wang , Chao-Wei Lin , Zhi-Hong Huang , Cheng-Tsung Ku , Chin-Sheng Yang
IPC: H01L27/02 , H01L23/522 , H01L27/088 , H01L23/528
Abstract: The present invention provides an integrated circuit with a dummy standard cell. The integrated circuit includes: a first metal line and a second metal line stretching along a first direction; a first dummy gate and a second dummy gate stretching along a second direction; Plural fin structures stretching along the first direction; A gate structure disposed on the fin structures and stretching along the second direction; Plural sets of short contact plug and long contact plug disposed between the first dummy gate, the second dummy gate and the gate structures; a doping region overlaps with the long contact plugs; a gate contact plug disposed on the gate structures; plural contact plugs disposed on and electrical contact the long contact plugs; A metal layer includes the first metal line, the second metal line.
-
公开(公告)号:US10319709B2
公开(公告)日:2019-06-11
申请号:US15987911
申请日:2018-05-24
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Chen-Hsien Hsu , Chien-Fu Chen , Cheng-Yang Tsai , Wei-Jen Wang , Chao-Wei Lin , Zhi-Hong Huang , Cheng-Tsung Ku , Chin-Sheng Yang
IPC: H01L27/02 , H01L27/092 , H01L23/522 , H01L23/528 , H03K19/0948 , H03K19/20 , H01L29/167
Abstract: The present invention provides an integrated circuit with a standard cell of an inverter standard cell. The integrated circuit includes: a first metal line and a second metal line stretching along a first direction; a first dummy gate and a second dummy gate stretching along a second direction; Plural fin structures stretching along the first direction; A gate structure disposed on the fin structures and stretching along the second direction; Two long contact plugs disposed at one side of the gate structure; two short contact plugs disposed at the other side of the gate structure; a gate contact plug disposed on the gate structure; Plural via plugs disposed on the long contact plugs, the short contact plugs and the gate contact plugs; A metal layer includes the first metal line, the second metal line, a third metal line and a fourth metal line.
-
公开(公告)号:US20190088638A1
公开(公告)日:2019-03-21
申请号:US15785447
申请日:2017-10-17
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Chen-Hsien Hsu , Chien-Fu Chen , Cheng-Yang Tsai , Wei-Jen Wang , Chao-Wei Lin , Zhi-Hong Huang , Cheng-Tsung Ku , Chin-Sheng Yang
IPC: H01L27/02 , H03K19/0948 , H01L23/528 , H01L27/092 , H01L23/522
Abstract: The present invention provides an integrated circuit with a standard cell of an inverter. The integrated circuit includes: a first metal line and a second metal line stretching along a first direction; a first dummy gate and a second dummy gate stretching along a second direction; Plural fin structures stretching along the first direction; A gate structure disposed on the fin structures and stretching along the second direction; Two long contact plugs disposed at one side of the gate structure; two short contact plugs disposed at the other side of the gate structure; a gate contact plug disposed on the gate structure; Plural via plugs disposed on the long contact plugs, the short contact plugs and the gate contact plugs; A metal layer includes the first metal line, the second metal line, a third metal line and a fourth metal line.
-
-
-
-