公开(公告)号：US09653404B1

公开(公告)日：2017-05-16

申请号：US15245161

申请日：2016-08-23

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Yi-Jing Wang ,  En-Chiuan Liou ,  Mei-Chen Chen ,  Han-Lin Zeng ,  Chia-Hung Lin ,  Chun-Chi Yu

IPC: H01L23/544

CPC classification number: H01L23/544 ,  G03F7/70633 ,  G03F7/70683 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2223/5446

Abstract: The present invention provides an overlay target. The overlay target includes a plurality of first pattern blocks and a plurality of second pattern blocks. The first pattern blocks and the second patterns blocks are arranged in array by being separated by at least one first gaps stretching along a first direction and at least one second gaps stretching along a second direction. Each first pattern block is composed of a plurality of first stripe patterns stretching along a third direction, and each second pattern block is composed of a plurality of second stripe patterns stretching along a fourth direction. The first direction is orthogonal to the second direction, the third direction and the fourth direction are 45 degrees relative to the first direction.