公开(公告)号：US09672309B2

公开(公告)日：2017-06-06

申请号：US14696498

申请日：2015-04-27

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Harn-Jiunn Wang ,  Teng-Yao Chang ,  Chin-Lung Lin ,  Chih-Hsien Tang ,  Yao-Jen Fan

IPC: G06F17/50 ,  H01L29/66

CPC classification number: G06F17/5068 ,  H01L29/66795 ,  H01L29/6681

Abstract: A method for generating a layout pattern includes following steps. A basic layout pattern including a plurality of first stripe patterns in a first cluster region is provided. Each first stripe pattern extends in a first direction, and the first stripe patterns have equal pitches in a second direction. A plurality of anchor bar patterns are generated. Each anchor bar pattern extends in the first direction, and the anchor bar patterns have equal pitches in the second direction. Edges of at least one of the anchor bar patterns in the second direction are aligned with edges of two adjacent first stripe patterns respectively. At least one of the anchor bar patterns overlaps a first space between two adjacent first stripe patterns. At least one first mandrel pattern is generated at the first space overlapped by the anchor bar pattern, and the first mandrel pattern is outputted to a photomask.

公开(公告)号：US20160275226A1

公开(公告)日：2016-09-22

申请号：US14696498

申请日：2015-04-27

Applicant: United Microelectronics Corp.

Inventor： Harn-Jiunn Wang ,  Teng-Yao Chang ,  Chin-Lung Lin ,  Chih-Hsien Tang ,  Yao-Jen Fan

IPC: G06F17/50

CPC classification number: G06F17/5068 ,  H01L29/66795 ,  H01L29/6681

Abstract: A method for generating a layout pattern includes following steps. A basic layout pattern including a plurality of first stripe patterns in a first cluster region is provided. Each first stripe pattern extends in a first direction, and the first stripe patterns have equal pitches in a second direction. A plurality of anchor bar patterns are generated. Each anchor bar pattern extends in the first direction, and the anchor bar patterns have equal pitches in the second direction. Edges of at least one of the anchor bar patterns in the second direction are aligned with edges of two adjacent first stripe patterns respectively. At least one of the anchor bar patterns overlaps a first space between two adjacent first stripe patterns. At least one first mandrel pattern is generated at the first space overlapped by the anchor bar pattern, and the first mandrel pattern is outputted to a photomask.

Abstract translation: 用于生成布局图案的方法包括以下步骤。 提供了包括第一群集区域中的多个第一条纹图案的基本布局图案。 每个第一条纹图案沿第一方向延伸，并且第一条纹图案在第二方向上具有相等的间距。 产生多个锚杆图案。 每个锚杆图案沿第一方向延伸，并且锚杆图案在第二方向上具有相等的间距。 第二方向上的至少一个锚杆图案的边缘分别与两个相邻的第一条纹图案的边缘对齐。 锚杆图案中的至少一个与两个相邻的第一条纹图案之间的第一空间重叠。 在由锚杆图案重叠的第一空间处产生至少一个第一心轴图案，并且将第一心轴图案输出到光掩模。