公开(公告)号：US06639225B2

公开(公告)日：2003-10-28

申请号：US09951762

申请日：2001-09-14

申请人： Ulf-Carsten Kirschstein ,  Erik Beckert ,  Andrew Hoffmann ,  Christoph Schaeffel ,  Eugen Saffert ,  Johannes Zentner ,  Torsten Gramsch

发明人： Ulf-Carsten Kirschstein ,  Erik Beckert ,  Andrew Hoffmann ,  Christoph Schaeffel ,  Eugen Saffert ,  Johannes Zentner ,  Torsten Gramsch

IPC分类号： G21K510

CPC分类号： G03F7/707 ,  G03F7/70716 ,  H01J2237/202 ,  H01L21/68

摘要： The invention refers to an arrangement for positioning substrates, in particular for positioning wafers, within a device that is provided for exposure of the substrates and/or for measurement on the substrates by means of radiation under high-vacuum conditions. The following are provided according to the present invention: a retention system (4), displaceable on a linear guidance system (3), for receiving the substrate, the guidance direction of the linear guidance system (3) being oriented parallel or substantially parallel to the Y coordinate of an X, Y, Z spatial coordinate system; drives for limited modification of the inclination of the guidance direction relative to the Y coordinate; drives for limited rotation of the linear guidance system (3), including the retention system (4), about the guidance direction; and drives for parallel displacement of the linear guidance system (3), including the retention system (4), in the direction of the X coordinate, the Y coordinate, and/or the Z coordinate.