An Arrangement in a Thermal Process, and a Method for Measuring the Thickness of a Contamination Layer

    公开(公告)号:US20160245599A2

    公开(公告)日:2016-08-25

    申请号:US14649542

    申请日:2013-11-25

    Inventor: Joni Maunula

    Abstract: An arrangement of a thermal device and a surface reflecting and/or scattering electromagnetic radiation in the inner part of the thermal device. A source of electromagnetic radiation is arranged at a first distance (L1) from the surface, and a detector of electromagnetic radiation is arranged at a second distance (L2) from the surface. The source is configured to emit radiation to the surface, which is reflected and/or scattered from the surface as reflected radiation. The detector receives reflected radiation; and the processing unit determines data dependent on the first and/or second distance by the emitted and reflected radiation. A wall of the thermal device has a window or aperture for emitting an optical signal from the light source to the surface. An electromagnetic distance measurement device measures the thickness or the increase in the thickness of a contamination layer from a thermal device.

    Arrangement in a thermal process, and a method for measuring the thickness of a contamination layer

    公开(公告)号:US09739547B2

    公开(公告)日:2017-08-22

    申请号:US14649542

    申请日:2013-11-25

    Inventor: Joni Maunula

    Abstract: An arrangement of a thermal device and a surface reflecting and/or scattering electromagnetic radiation in the inner part of the thermal device. A source of electromagnetic radiation is arranged at a first distance (L1) from the surface, and a detector of electromagnetic radiation is arranged at a second distance (L2) from the surface. The source is configured to emit radiation to the surface, which is reflected and/or scattered from the surface as reflected radiation. The detector receives reflected radiation; and the processing unit determines data dependent on the first and/or second distance by the emitted and reflected radiation. A wall of the thermal device has a window or aperture for emitting an optical signal from the light source to the surface. An electromagnetic distance measurement device measures the thickness or the increase in the thickness of a contamination layer from a thermal device.

    An Arrangement in a Thermal Process, and a Method for Measuring the Thickness of a Contamination Layer
    3.
    发明申请
    An Arrangement in a Thermal Process, and a Method for Measuring the Thickness of a Contamination Layer 有权
    热处理中的布置以及测量污染层厚度的方法

    公开(公告)号:US20150369549A1

    公开(公告)日:2015-12-24

    申请号:US14649542

    申请日:2013-11-25

    Inventor: Joni Maunula

    Abstract: An arrangement of a thermal device and a surface reflecting and/or scattering electromagnetic radiation in the inner part of the thermal device. A source of electromagnetic radiation is arranged at a first distance (L1) from the surface, and a detector of electromagnetic radiation is arranged at a second distance (L2) from the surface. The source is configured to emit radiation to the surface, which is reflected and/or scattered from the surface as reflected radiation. The detector receives reflected radiation; and the processing unit determines data dependent on the first and/or second distance by the emitted and reflected radiation. A wall of the thermal device has a window or aperture for emitting an optical signal from the light source to the surface. An electromagnetic distance measurement device measures the thickness or the increase in the thickness of a contamination layer from a thermal device.

    Abstract translation: 在热装置的内部部分中的热装置和表面反射和/或散射电磁辐射的布置。 电磁辐射源被布置在离表面的第一距离(L1)处,并且电磁辐射检测器被布置在离表面的第二距离(L2)处。 源被配置为向表面发射辐射,其作为反射辐射从表面反射和/或散射。 检测器接收反射辐射; 并且处理单元通过发射和反射的辐射确定取决于第一和/或第二距离的数据。 热装置的壁具有用于从光源向表面发射光信号的窗口或孔。 电磁距离测量装置测量来自热装置的污染层的厚度或厚度的增加。

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