公开(公告)号：US20240175133A1

公开(公告)日：2024-05-30

申请号：US18519548

申请日：2023-11-27

Applicant: VEECO INSTRUMENTS INC.

Inventor： Ajit Paranjpe ,  Johannes Kaeppeler ,  Alexander Gurary

IPC: C23C16/458 ,  C23C16/455 ,  C30B25/10 ,  C30B25/12 ,  C30B25/14

CPC classification number: C23C16/4584 ,  C23C16/45502 ,  C23C16/45565 ,  C23C16/4586 ,  C30B25/10 ,  C30B25/12 ,  C30B25/14

Abstract: A multi-wafer metal organic chemical vapor deposition system in which adjacent wafers positioned within the system rotate about their own axes, including a reaction chamber comprising an exhaust system including a peripheral port, a multi-wafer carrier comprising a wafer carrier body and a plurality of wafer carrier discs supported within the wafer carrier body, wherein adjacent wafer carrier discs of the plurality wafer carrier discs are configured and the wafer carrier body are configured to rotate at different speeds, a multi-zone injection block positioned over the wafer carrier body, a central gas port positioned in the center of the wafer carrier body that can be configured as a gas exhaust or a gas injection port, and a multi-zone heater assembly positioned beneath the multi-wafer carrier.

公开(公告)号：US20250109493A1

公开(公告)日：2025-04-03

申请号：US18899637

申请日：2024-09-27

Applicant: VEECO INSTRUMENTS INC.

Inventor： Johannes Kaeppeler ,  Ajit Paranjpe

IPC: C23C16/44 ,  C23C16/458

Abstract: A chemical vapor deposition system includes a reaction chamber and a removable wafer carrier including a wafer carrier body that is configured to support a wafer. The system includes a removable cover plate that supports the wafer carrier body and a susceptor base is disposed below the cover plate that supports the cover plate. The removable cover plate is in a nested arrangement with respect to the susceptor base as a result of first nesting structure of the removable cover plate mating with a second nesting structure of the susceptor base.