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    Reactor with Centering Pin for Epitaxial Deposition
    5.
    发明申请
    Reactor with Centering Pin for Epitaxial Deposition 有权

    公开(公告)号：US20220068700A1

    公开(公告)日：2022-03-03

    申请号：US17458768

    申请日：2021-08-27

    申请人： Veeco Instruments, Inc.

    发明人： Alexander Gurary ,  Sandeep Krishnan ,  Aniruddha Bagchi ,  Yuliy Rashkovsky ,  Siddharth Patel

    IPC分类号： H01L21/687 ,  C23C16/458 ,  C30B25/12

    摘要： A substrate reactor with centering pin for epitaxial deposition includes a vacuum chamber and a tube configured to rotate in the vacuum chamber around a tube geometrical center axis. A substrate carrier forming a pocket dimensioned for holding a substrate on a top surface includes an aperture that is centrally located on a bottom surface. The substrate carrier is positioned on and in contact with a top surface of the tube. A centering pin is positioned along a geometrical center axis of rotation of the substrate carrier. The centering pin has a first end positioned in the aperture on the bottom surface of the substrate carrier and a second end fixed inside the reactor so that the substrate carrier rotates around the geometrical center axis of the substrate carrier independent of the geometrical center axis of the tube.

    PLANETARY WAFER CARRIERS
    6.
    发明申请
    PLANETARY WAFER CARRIERS 审中-公开
    运输轮运输车

    公开(公告)号：US20170076972A1

    公开(公告)日：2017-03-16

    申请号：US15266308

    申请日：2016-09-15

    申请人： Veeco Instruments Inc.

    发明人： Sandeep Krishnan ,  Lukas Urban ,  Alexander Gurary ,  Keng Moy ,  Ajit Paranjpe

    IPC分类号： H01L21/687

    CPC分类号： H01L21/68771 ,  H01L21/68757 ,  H01L21/68764 ,  H01L21/68785 ,  H01L21/68792

    摘要： A wafer carrier for a plurality of wafers, the wafer carrier having a platen with a plurality of openings and a plurality of wafer retention platforms, the platen configured to rotate about a first axis, the plurality of wafer retention platforms configured to rotate about respective second axes, each of the wafer retention platforms rotatably coupled to one of the plurality of openings by friction reducing bearings, the platen and the plurality of wafer retention platforms and the friction reducing bearings all being constructed of the same material.

    摘要翻译： 用于多个晶片的晶片载体，所述晶片载体具有带有多个开口的压板和多个晶片保持平台，所述压板被配置为围绕第一轴线旋转，所述多个晶片保持平台被配置为围绕相应的第二 每个晶片保持平台通过摩擦减小轴承可旋转地联接到多个开口中的一个开口，压板和多个晶片保持平台和减摩轴承全部由相同的材料构成。

    Wafer carrier with a multi-pocket configuration
    7.
    外观设计
    Wafer carrier with a multi-pocket configuration 有权
    具有多口袋配置的晶圆载体

    公开(公告)号：USD778247S1

    公开(公告)日：2017-02-07

    申请号：US29524104

    申请日：2015-04-16

    申请人： Veeco Instruments, Inc.

    设计人： Alexander Gurary ,  Mandar Deshpande ,  Aniruddh Parekh ,  Yuliy Rashkovsky

    CPC分类号： H01L21/68771 ,  C23C16/4584 ,  H01L21/68721 ,  H01L21/68764

    摘要： A wafer carrier including thirty-five pockets arranged on a top surface, configured to be used with a chemical vapor deposition device, is provided. The wafer carrier comprises: a body having a top surface and a bottom surface arranged opposite one another, and a plurality of pockets defined in the top surface of the wafer carrier, wherein the plurality of pockets consist of a total of thirty-five pockets, each of the pockets is arranged along one of three circles, and the three circles are concentric with one another and with a circular outline formed by a perimeter of the top surface.

    摘要翻译： 提供了一种晶片载体，其包括配置成与化学气相沉积装置一起使用的顶表面上的三十五个凹穴。 晶片载体包括：主体，其具有彼此相对布置的顶表面和底表面，以及限定在晶片载体的顶表面中的多个凹穴，其中多个凹穴由总共三十五个凹穴组成， 每个凹穴沿着三个圆圈中的一个布置，并且三个圆圈彼此同心并具有由顶部表面的周边形成的圆形轮廓。