公开(公告)号：US10468224B2

公开(公告)日：2019-11-05

申请号：US15948736

申请日：2018-04-09

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Svetlana Radovanov ,  Ana Samolov ,  Shengwu Chang ,  Frank Sinclair ,  Peter L. Kellerman

IPC: H01J37/05 ,  H01J37/12 ,  H01J37/317

Abstract: An apparatus may include an electrode assembly, the electrode assembly comprising a plurality of electrodes, arranged in a plurality of electrode pairs arranged to conduct an ion beam therethrough. A given electrode pair lies along a radius of an arc describing a nominal central ray trajectory, wherein a radius of a first electrode pair and an adjacent electrode pair define an angular spacing. The plurality of electrode pairs may define a plurality of angular spacings, wherein, in a first configuration, the plurality of angular spacings are not all equal. The apparatus may also include a power supply in communication with the EM, the power supply configured to independently supply voltage to the plurality of electrodes.

公开(公告)号：US11049691B2

公开(公告)日：2021-06-29

申请号：US15850184

申请日：2017-12-21

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Bon-Woong Koo ,  Robert C. Lindberg ,  Eric D. Hermanson ,  Frank Sinclair ,  Antonella Cucchetti ,  Randy Martin ,  Michael D. Johnson ,  Ana Samolov ,  Svetlana B. Radovanov

IPC: H01J37/317 ,  H01L21/04

Abstract: A system and method for optimizing a ribbon ion beam in a beam line implantation system is disclosed. The system includes a mass resolving apparatus having a resolving aperture, in which the resolving aperture may be moved in the X and Z directions. Additionally, a controller is able to manipulate the mass analyzer and quadrupole lenses so that the crossover point of desired ions can also be moved in the X and Z directions. By manipulating the crossover point and the resolving aperture, the parameters of the ribbon ion beam may be manipulated to achieve a desired result. Movement of the crossover point in the X direction may affect the mean horizontal angle of the beamlets, while movement of the crossover point in the Z direction may affect the horizontal angular spread and beam current.

公开(公告)号：US20190198292A1

公开(公告)日：2019-06-27

申请号：US15850184

申请日：2017-12-21

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Bon-Woong Koo ,  Robert C. Lindberg ,  Eric D. Hermanson ,  Frank Sinclair ,  Antonella Cucchetti ,  Randy Martin ,  Michael D. Johnson ,  Ana Samolov ,  Svetlana B. Radovanov

IPC: H01J37/317 ,  H01L21/04

CPC classification number: H01J37/3171 ,  H01J2237/04926 ,  H01J2237/05 ,  H01J2237/31713 ,  H01L21/0415

Abstract: A system and method for optimizing a ribbon ion beam in a beam line implantation system is disclosed. The system includes a mass resolving apparatus having a resolving aperture, in which the resolving aperture may be moved in the X and Z directions. Additionally, a controller is able to manipulate the mass analyzer and quadrupole lenses so that the crossover point of desired ions can also be moved in the X and Z directions. By manipulating the crossover point and the resolving aperture, the parameters of the ribbon ion beam may be manipulated to achieve a desired result. Movement of the crossover point in the X direction may affect the mean horizontal angle of the beamlets, while movement of the crossover point in the Z direction may affect the horizontal angular spread and beam current.

公开(公告)号：US20190198283A1

公开(公告)日：2019-06-27

申请号：US15948736

申请日：2018-04-09

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Svetlana Radovanov ,  Ana Samolov ,  Shengwu Chang ,  Frank Sinclair ,  Peter L. Kellerman

IPC: H01J37/05 ,  H01J37/12

Abstract: An apparatus may include an electrode assembly, the electrode assembly comprising a plurality of electrodes, arranged in a plurality of electrode pairs arranged to conduct an ion beam therethrough. A given electrode pair lies along a radius of an arc describing a nominal central ray trajectory, wherein a radius of a first electrode pair and an adjacent electrode pair define an angular spacing. The plurality of electrode pairs may define a plurality of angular spacings, wherein, in a first configuration, the plurality of angular spacings are not all equal. The apparatus may also include a power supply in communication with the EM, the power supply configured to independently supply voltage to the plurality of electrodes.