公开(公告)号：US20220243150A1

公开(公告)日：2022-08-04

申请号：US17596199

申请日：2020-06-15

申请人： Versum Materials US, LLC

发明人： LILI WANG ,  AIPING WU ,  LAISHENG SUN ,  YI-CHIA LEE ,  YUANMEI CAO

IPC分类号： C11D11/00 ,  G03F7/42 ,  H01L21/02 ,  C11D7/32 ,  C11D7/26 ,  C11D7/50

摘要： Compositions and methods useful for removing residue and photoresist from a semiconductor substrate comprising: from about 5 to about 60% by wt. of water; from about 10 to about 90% by wt. of a water-miscible organic solvent; from about 5 to about 90% by wt. of at least one alkanolamine; from about 0.05 to about 20% by wt. of at least one polyfunctional organic acid; and from about 0.1 to about 10% by wt. of at least one phenol-type corrosion inhibitor, wherein the composition is substantially free of hydroxylamine.

公开(公告)号：US20220251480A1

公开(公告)日：2022-08-11

申请号：US17597530

申请日：2020-07-14

申请人： Versum Materials US, LLC

发明人： Laisheng Sun ,  LILI WANG ,  ALPING WU ,  YI-CHIA LEE ,  TIANNIU R. CHEN

IPC分类号： C11D7/32 ,  C11D7/26 ,  C11D11/00 ,  G03F7/42

摘要： This disclosed and claimed subject matter relates to a post etch residue cleaning compositions that include an alkanolamine having two or more or more than two alkanol groups, an alpha-hydroxy acid and water as well as methods for use thereof in microelectronics manufacturing.

公开(公告)号：US20220380705A1

公开(公告)日：2022-12-01

申请号：US17753256

申请日：2020-09-24

申请人： Versum Materials US, LLC

发明人： LAISHENG SUN ,  LILI WANG ,  AIPING WU ,  YI-CHIA LEE ,  TIANNIU CHEN

IPC分类号： C11D11/00 ,  G03F7/42 ,  C11D7/32 ,  C11D7/26 ,  C11D7/34

摘要： A method and cleaning composition for microelectronic devices or semiconductor substrates including at least one N alkanolamine; at least one hydroxylamine or derivatives of hydroxylamine or mixtures thereof; at least one polyfunctional organic acid with at least two carboxylic acid groups and water. The cleaning compositions can further include at least one corrosion inhibitor.

公开(公告)号：US20220333044A1

公开(公告)日：2022-10-20

申请号：US17753529

申请日：2020-09-28

申请人： Versum Materials US, LLC

发明人： YUANMEI CAO ,  MICHAEL PHENIS ,  LILI WANG ,  LAISHENG SUN ,  AIPING WU

IPC分类号： C11D7/32 ,  C11D7/50 ,  C11D7/10 ,  G03F7/42

摘要： Cleaning compositions and the method of using the same are disclosed, where the compositions include one or more alkanolamines, one or more ether alcohol solvents or aromatic containing alcohol, one or more corrosion inhibitors, and optionally one or more secondary solvents.