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    Cosmetic cleaning product
    3.
    发明授权
    Cosmetic cleaning product 有权
    化妆品清洁用品

    公开(公告)号：US07458944B2

    公开(公告)日：2008-12-02

    申请号：US10818583

    申请日：2004-04-05

    申请人： Kathrin Liste ,  Olaf Rhode ,  Jens Treu

    发明人： Kathrin Liste ,  Olaf Rhode ,  Jens Treu

    IPC分类号： A61H15/02

    CPC分类号： A61H7/003 ,  A45D34/04 ,  A61H2201/105 ,  A61K8/02 ,  A61K2800/28 ,  A61Q19/10

    摘要： The invention is a cosmetic cleaning product, comprising a massage applicator comprising a container body and a massage device having at least one massage pin device, the pin device having at least one first surface which is configured to be in contact with the surface to be massaged, wherein a force can be transmitted between the first surface of the massage pin device and the surface to be massaged, and wherein at least one predetermined massage characteristic feature selected from the group consisting of a predetermined hardness, a predetermined geometry and a predetermined elasticity exists in a region of the first surface of the massage pin device which is configured to be in contact with the surface to be massaged, and at least one adjusting device which can adjust the at least one predetermined massage characteristic feature, and a cosmetic cleaning formulation.

    摘要翻译： 本发明是一种美容清洁产品，其包括按摩器，其包括容器主体和具有至少一个按摩针装置的按摩装置，该销装置具有至少一个第一表面，该第一表面构造成与要按摩的表面接触 其中力可以在按摩针装置的第一表面和要按摩的表面之间传递，并且其中存在从由预定硬度，预定几何形状和预定弹性组成的组中选择的至少一个预定按摩特征特征 在按摩针装置的被构造成与要按摩的表面接触的第一表面的区域中，以及至少一个能够调节至少一个预定的按摩特征的调节装置，以及化妆品清洁配方。

    Detergent-dipped cleaning substrate
    4.
    发明申请
    Detergent-dipped cleaning substrate 审中-公开
    洗涤剂浸渍清洁基材

    公开(公告)号：US20060128591A1

    公开(公告)日：2006-06-15

    申请号：US10523438

    申请日：2003-07-16

    申请人： Harald Albrecht ,  Petra Koch ,  Jorg Kuther ,  Kathrin Liste

    发明人： Harald Albrecht ,  Petra Koch ,  Jorg Kuther ,  Kathrin Liste

    IPC分类号： C11D17/00

    CPC分类号： C11D17/049 ,  A61K8/0208 ,  A61K8/44 ,  A61K8/442 ,  A61K8/466 ,  A61K8/604 ,  A61Q19/10 ,  C11D1/10 ,  C11D1/123 ,  C11D1/143 ,  C11D1/345 ,  C11D1/662 ,  C11D3/48

    摘要： Substrate, which is impregnated with a cleansing preparation with a viscosity from 1 to 3000 mPas, preferably with a viscosity from 1 to 2500 mPas, more preferably with a viscosity from 1 to 2000 mPas, containing a) one or more anionic and/or nonionic surfactants in a concentration from 0.1 to 15% by weight, preferably with a concentration from 1 to 10% by weight; b) water in a concentration from 40 to 99% by weight, preferably in a concentration from 50 to 90% by weight, more preferably in a concentration from 60 to 90% by weight; and c) one or more preservatives in a concentration from 0.01 to 3% by weight, preferably with a concentration from 0.1 to 2% by weight, each based on the total weight of the cleansing preparation.

    摘要翻译： 基材浸渍有粘度为1至3000mPas的清洁制剂，优选粘度为1至2500mPas，更优选粘度为1至2000mPas，其含有a）一种或多种阴离子和/或非离子表面活性剂 浓度为0.1至15重量％，优选浓度为1至10重量％的表面活性剂; b）浓度为40至99重量％，优选浓度为50至90重量％，更优选浓度为60至90重量％的水; 和c）一种或多种浓度为0.01至3重量％，优选浓度为0.1至2重量％的防腐剂，各自基于清洁制剂的总重量计。