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    Swiveling work machine
    3.
    发明授权
    Swiveling work machine 有权
    回转作业机

    公开(公告)号：US07717218B2

    公开(公告)日：2010-05-18

    申请号：US11371341

    申请日：2006-03-08

    申请人： Takanori Matsumoto ,  Fumiki Sato ,  Shizuo Shimoie ,  Yoshihiro Kato ,  Kenzo Koga

    发明人： Takanori Matsumoto ,  Fumiki Sato ,  Shizuo Shimoie ,  Yoshihiro Kato ,  Kenzo Koga

    IPC分类号： E02F9/00

    CPC分类号： E02F9/08 ,  E02F9/163

    摘要： A swiveling work machine includes a traveling apparatus, a swivel base mounted on the traveling apparatus to be pivotable about a vertical axis, a hood disposed at a rear portion of the swivel base, the hood accommodating therein an engine, a support frame being disposed across over the engine, and a ROPS having a front end thereof fixed to the swivel base and a rear end thereof fixed to an upper portion of the support frame. The support frame includes a front leg member disposed on one lateral side of the ROPS, the front leg member extending to vicinity of a position forwardly of the swivel base.

    摘要翻译： 旋转作业机包括行走装置，安装在行进装置上的旋转基座，可绕垂直轴线转动，设置在旋转底座后部的发动机罩，容纳在其中的发动机，支撑框架横跨 并且ROPS具有前端固定在旋转底座上，后端固定在支撑框架的上部。 支撑框架包括设置在ROPS的一个侧面上的前腿构件，前腿构件延伸到旋转底座的前方的位置附近。

    Semiconductor device and method of manufacturing the same
    4.
    发明授权
    Semiconductor device and method of manufacturing the same 失效
    半导体装置及其制造方法

    公开(公告)号：US07368342B2

    公开(公告)日：2008-05-06

    申请号：US10948661

    申请日：2004-09-24

    申请人： Masahisa Sonoda ,  Hiroaki Tsunoda ,  Eiji Sakagami ,  Hidemi Kanetaka ,  Kenji Matsuzaki ,  Takanori Matsumoto

    发明人： Masahisa Sonoda ,  Hiroaki Tsunoda ,  Eiji Sakagami ,  Hidemi Kanetaka ,  Kenji Matsuzaki ,  Takanori Matsumoto

    IPC分类号： H01L21/336 ,  H01L21/8238

    CPC分类号： H01L21/76232 ,  H01L21/823481 ,  H01L21/823878

    摘要： A method for manufacturing a semiconductor device includes forming a gate-insulating film on a semiconductor substrate; forming a gate electrode on the gate-insulating film to be electrically insulated from the semiconductor substrate; etching the gate electrode, the gate insulating film and the semiconductor substrate to form a trench which is used to electrically isolate a device region for forming a device from the remainder region on the substrate top surface; and etching the inside of the trench using a gas containing Cl2 and HBr with a different condition from the etching condition of the semiconductor substrate.

    摘要翻译： 一种制造半导体器件的方法包括在半导体衬底上形成栅极绝缘膜; 在所述栅极绝缘膜上形成与所述半导体衬底电绝缘的栅电极; 蚀刻栅电极，栅极绝缘膜和半导体衬底以形成用于将用于形成器件的器件区域与衬底顶表面上的其余区域电隔离的沟槽; 并使用与半导体衬底的蚀刻条件不同的条件，使用含有Cl 2 2和HBr的气体来蚀刻沟槽的内部。

    Semiconductor device and method of fabricating the same including trenches of different aspect ratios
    6.
    发明授权
    Semiconductor device and method of fabricating the same including trenches of different aspect ratios 有权
    半导体器件及其制造方法，包括不同纵横比的沟槽

    公开(公告)号：US07781293B2

    公开(公告)日：2010-08-24

    申请号：US11611030

    申请日：2006-12-14

    申请人： Takanori Matsumoto

    发明人： Takanori Matsumoto

    IPC分类号： H01L21/336 ,  H01L21/76 ,  H01L21/302

    CPC分类号： H01L21/76229 ,  H01L21/76232

    摘要： A method of fabricating a semiconductor device includes etching a silicon oxide film, a silicon nitride film, a polycrystalline silicone film, and a gate insulating film in a predetermined pattern including a first opening width corresponding to a first trench and a second opening width corresponding to a second trench, the second opening width being larger than the first opening width, and etching the semiconductor substrate to simultaneously form the first and second trenches so that a first depth of the first trench is equal to a second depth of the second trench, and a first angle between a first side surface and a first bottom surface of the first trench is smaller than a second angle between a second side surface and a second bottom surface of the second trench, and the first trench includes a curved portion at an upper portion of the first side surface.

    摘要翻译： 一种制造半导体器件的方法包括以包括对应于第一沟槽的第一开口宽度和对应于第一沟槽的第二开口宽度的预定图案蚀刻氧化硅膜，氮化硅膜，多晶硅膜和栅极绝缘膜 第二沟槽，第二开口宽度大于第一开口宽度，并且蚀刻半导体衬底以同时形成第一和第二沟槽，使得第一沟槽的第一深度等于第二沟槽的第二深度，以及 第一沟槽的第一侧表面和第一底表面之间的第一角度小于第二沟槽的第二侧表面和第二底表面之间的第二角度，并且第一沟槽包括在上部的弯曲部分 的第一侧面。

    Swiveling work machine
    7.
    发明授权
    Swiveling work machine 有权
    回转作业机

    公开(公告)号：US07500532B2

    公开(公告)日：2009-03-10

    申请号：US11225873

    申请日：2005-09-13

    申请人： Kenzo Koga ,  Shizuo Shimoie ,  Yoshihiro Kato ,  Fumiki Sato ,  Takanori Matsumoto ,  Naoki Miyata

    发明人： Kenzo Koga ,  Shizuo Shimoie ,  Yoshihiro Kato ,  Fumiki Sato ,  Takanori Matsumoto ,  Naoki Miyata

    IPC分类号： B62D33/02

    CPC分类号： E02F9/0816 ,  E02F9/121

    摘要： A swivel work machine includes a traveling unit, a swivel base plate supported on the traveling unit to be pivotable about a vertical swivel axis, the swivel base plate having a first lateral side and a second lateral side provided across said vertical axis, a pair of upper and lower support brackets disposed at a front end of the swivel base plate with an offset toward the first lateral side and adapted for supporting an implement, a pair of left and right vertical ribs extending rearward from the support brackets and fixed to the swivel base plate and a cabin mounted on the swivel base plate. The cabin is disposed with an offset toward the second lateral side relative to the support brackets, a bottom of the cabin being disposed downwardly of the upper support bracket. The vertical rib disposed on the side of the second lateral side extends, from its front portion to its intermediate portion, parallel with a side face of the cabin on the side of the first lateral side.

    摘要翻译： 旋转作业机包括行进单元，支撑在行进单元上的旋转底板，可绕垂直旋转轴线转动，旋转基板具有横跨所述垂直轴设置的第一横向侧和第二横向侧，一对 上部和下部支撑架设置在旋转基板的前端，偏移朝向第一侧面并适于支撑工具，一对左右垂直肋条从支撑托架向后延伸并固定到旋转底座 板和安装在旋转底板上的舱室。 机舱相对于支撑托架设置成朝向第二侧面的偏移，舱的底部设置在上支撑支架的下方。 设置在第二侧面侧的纵肋从其前部延伸到其中间部分，与第一侧面侧的车厢侧面平行。

    Swiveling work machine
    8.
    发明授权
    Swiveling work machine 有权
    回转作业机

    公开(公告)号：US07416219B2

    公开(公告)日：2008-08-26

    申请号：US11225811

    申请日：2005-09-13

    申请人： Fumiki Sato ,  Shizuo Shimoie ,  Yoshihiro Kato ,  Takanori Matsumoto ,  Kenzo Koga

    发明人： Fumiki Sato ,  Shizuo Shimoie ,  Yoshihiro Kato ,  Takanori Matsumoto ,  Kenzo Koga

    IPC分类号： B60P3/22

    CPC分类号： E02F9/0883 ,  E02F3/325 ,  E02F9/0875 ,  E02F9/121 ,  E02F9/2271 ,  E02F9/2275

    摘要： A swiveling work machine includes a swivel deck mounted to be pivotable about a vertical axis and a side cover for covering one lateral side on the swivel deck, an accommodating space capable of accommodating a work machine accessory being provided inside the lateral cover. The accommodating space accommodates, as the implement accessory, a work oil tank, a fuel tank and a control valve unit. The work oil tank is disposed at a fore-and-aft intermediate portion on one lateral side on the swivel deck. The fuel tank is disposed forwardly of the work oil tank with forming a gap relative thereto. The control valve unit is disposed upwardly of the fuel tank and longitudinally along the fore/aft direction.

    摘要翻译： 旋转作业机器包括安装成能够围绕垂直轴线枢转的旋转台​​面和用于覆盖旋转台面上的一个侧面的侧盖，容纳空间，其能够容纳设置在侧盖内侧的作业机器附件。 容纳空间作为工具附件容纳工作油箱，燃料箱和控制阀单元。 工作油箱设置在旋转板上的一个侧面上的前后中间部分。 燃料箱配置在工作油箱的前方，形成与其相对的间隙。 控制阀单元设置在燃料箱的上方并且沿着前/后方向纵向设置。

    SEMICONDUCTOR DEVICE WITH STI STRUCTURE AND METHOD OF FABRICATING THE SAME
    9.
    发明申请
    SEMICONDUCTOR DEVICE WITH STI STRUCTURE AND METHOD OF FABRICATING THE SAME 失效
    具有STI结构的半导体器件及其制造方法

    公开(公告)号：US20070264823A1

    公开(公告)日：2007-11-15

    申请号：US11829491

    申请日：2007-07-27

    申请人： Katsuya ITO ,  Hiroaki Tsunoda ,  Takanori Matsumoto

    发明人： Katsuya ITO ,  Hiroaki Tsunoda ,  Takanori Matsumoto

    IPC分类号： H01L21/44

    CPC分类号： H01L21/76229 ,  H01L21/76232 ,  H01L27/105 ,  H01L27/1052 ,  H01L27/11526 ,  H01L27/11543

    摘要： A semiconductor device such as a flash memory includes a semiconductor substrate having a surface, and a plurality of trenches formed in the substrate so as to be open at the surface of the substrate, the trenches having opening widths different from each other. The trench with a smaller opening width is formed so as to have a first depth and the trench with a larger opening width has a bottom including opposite ends each of which has a second depth deeper than the first depth and a central portion shallower than the second depth.

    摘要翻译： 诸如闪速存储器的半导体器件包括具有表面的半导体衬底和形成在衬底中以在衬底的表面开口的多个沟槽，沟槽具有彼此不同的开口宽度。 具有较小开口宽度的沟槽被形成为具有第一深度，并且具有较大开口宽度的沟槽具有底部，该底部包括相对的端部，每个端部具有比第一深度更深的第二深度和比第二深度浅的中心部分 深度。

    Swiveling work machine
    10.
    发明申请
    Swiveling work machine 有权

    公开(公告)号：US20060108171A1

    公开(公告)日：2006-05-25

    申请号：US11225873

    申请日：2005-09-13

    申请人： Kenzo Koga ,  Shizuo Shimoie ,  Yoshihiro Kato ,  Fumiki Sato ,  Takanori Matsumoto ,  Naoki Miyata

    发明人： Kenzo Koga ,  Shizuo Shimoie ,  Yoshihiro Kato ,  Fumiki Sato ,  Takanori Matsumoto ,  Naoki Miyata

    IPC分类号： B62D33/06 ,  B62D33/063

    CPC分类号： E02F9/0816 ,  E02F9/121

    摘要： A swivel work machine includes a traveling unit, a swivel base plate supported on the traveling unit to be pivotable about a vertical swivel axis, the swivel base plate having a first lateral side and a second lateral side provided across said vertical axis, a pair of upper and lower support brackets disposed at a front end of the swivel base plate with an offset toward the first lateral side and adapted for supporting an implement, a pair of left and right vertical ribs extending rearward from the support brackets and fixed to the swivel base plate and a cabin mounted on the swivel base plate. The cabin is disposed with an offset toward the second lateral side relative to the support brackets, a bottom of the cabin being disposed downwardly of the upper support bracket. The vertical rib disposed on the side of the second lateral side extends, from its front portion to its intermediate portion, parallel with a side face of the cabin on the side of the first lateral side.