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223 条记录 (耗时 0.02 秒)

    Polyglyceryl compounds and compositions
    1.
    发明授权
    Polyglyceryl compounds and compositions 有权
    聚甘油化合物和组合物

    公开(公告)号：US08394755B2

    公开(公告)日：2013-03-12

    申请号：US13075362

    申请日：2011-03-30

    申请人： Sasa Andjelic ,  Modesto Erneta ,  Michael J. Fevola ,  Frank C. Sun

    发明人： Sasa Andjelic ,  Modesto Erneta ,  Michael J. Fevola ,  Frank C. Sun

    IPC分类号： C11D3/20 ,  C11D1/68 ,  C11D3/22 ,  C11D7/26 ,  C07D307/00 ,  C07D309/00

    CPC分类号： A61K8/39 ,  A61K8/604 ,  A61K2800/48 ,  A61Q19/10

    摘要： Provided are compositions comprising one or more compounds having a structure comprising a node structure with from four to twelve carbon atoms, one or more (poly)glyceryl groups, and one or more hydrophobic moieties, wherein each of the one or more (poly)glyceryl groups is linked to the node structure by a first primary linking group, the one or more hydrophobic moieties are each independently linked either to the node structure by a primary linking group or to one of the (poly)glyceryl groups by a secondary linking group, and wherein the polyglyceryl thickener has an average degree of glyceryl polymerization of from greater than 3 to less than about 11 and an average number of hydrophobic groups per primary linking group of about 0.35 or greater. Also provided are polyglyceryl compounds, compositions comprising water, a surfactant, and a polyglyceryl thickener, as well as, methods of making polyglyceryl compounds and compositions of the present invention.

    摘要翻译： 提供的是包含一种或多种具有包含具有四至十二个碳原子的结构结构，一个或多个（多）甘油基和一个或多个疏水部分的结构的化合物的组合物，其中所述一种或多种（聚）甘油基 基团通过第一个主要连接基团与节点结构连接，所述一个或多个疏水性部分各自独立地通过第一连接基团连接到节点结构，或者通过次连接基团连接到（聚）甘油基之一， 并且其中所述聚甘油增稠剂的平均甘油聚合度为大于3至小于约11，并且每个连接基团的疏水基团的平均数为约0.35或更大。 还提供了聚甘油化合物，包含水，表面活性剂和聚甘油增稠剂的组合物，以及制备本发明的聚甘油化合物和组合物的方法。

    Natural disinfecting cleaners
    2.
    发明授权
    Natural disinfecting cleaners 有权
    天然消毒清洁剂

    公开(公告)号：US07939488B2

    公开(公告)日：2011-05-10

    申请号：US12717706

    申请日：2010-03-04

    申请人： David R. Scheuing ,  Rui Zhang

    发明人： David R. Scheuing ,  Rui Zhang

    IPC分类号： C11D3/22 ,  C11D1/68 ,  C11D1/62 ,  C11D1/75

    CPC分类号： C11D1/83 ,  C11D1/146 ,  C11D1/28 ,  C11D1/662 ,  C11D1/75 ,  C11D3/48

    摘要： A cleaning composition with a limited number of natural ingredients contain a hydrophobic syndetic, a hydrophilic syndetic, and a biguanide or a cationic quaternary ammonium salt. The cleaning composition can be used to clean laundry, soft surfaces, and hard surfaces and cleans as well or better than commercial compositions containing synthetically derived cleaning agents.

    摘要翻译： 具有有限数量的天然成分的清洁组合物含有疏水性聚合物，亲水性稠合剂和双胍类或阳离子季铵盐。 清洁组合物可用于清洁衣物，软表面和硬表面，以及比含有合成衍生的清洁剂的商业组合物更好或更好地清洁。

    Trans olefinic diols with surfactant properties
    6.
    发明授权
    Trans olefinic diols with surfactant properties 失效
    反式烯属二醇与表面活性剂的性质

    公开(公告)号：US06075060A

    公开(公告)日：2000-06-13

    申请号：US34032

    申请日：1998-03-03

    申请人： Kristen Elaine Minnich

    发明人： Kristen Elaine Minnich

    IPC分类号： C11D1/68 ,  B01F17/00 ,  B01F17/38 ,  C07C33/025 ,  C07C33/035 ,  C07G31/20

    CPC分类号： C07C33/035 ,  B01F17/0021 ,  Y10S516/917

    摘要： An aqueous composition and a method of applying an aqueous composition to a surface in which the surface active properties of the composition are improved through addition of a new class of surfactants based on the trans isomers of olefinic diols having the formula: ##STR1## wherein each of R.sub.1, R.sub.2, R.sub.3, and R.sub.4 is the same or a different C1 to C9 linear or branched alkyl group and the total number of carbons atoms in the olefinic diol is between 12 and 17. The compounds are useful in lowering the equilibrium surface tension of aqueous organic compositions; for example, those used in coatings, inks and adhesives.

    摘要翻译： 一种水性组合物和一种将水性组合物施用于表面的方法，其中通过基于具有下式的烯属二醇的反式异构体加入新类型的表面活性剂来改进组合物的表面活性：其中R1， R2，R3和R4是相同或不同的C1至C9直链或支链烷基，烯烃二醇中的碳原子总数为12至17。该化合物可用于降低有机水溶液的平衡表面张力 组成; 例如，用于涂料，油墨和粘合剂中的那些。

    Aqueous surfactant solution method for stripping metal plasma etch deposited oxidized metal impregnated polymer residue layers from patterned metal layers
    7.
    发明授权
    Aqueous surfactant solution method for stripping metal plasma etch deposited oxidized metal impregnated polymer residue layers from patterned metal layers 失效
    用于从图案化金属层剥离金属等离子体蚀刻沉积的氧化金属浸渍的聚合物残余物层的水性表面活性剂溶液方法

    公开(公告)号：US06057240A

    公开(公告)日：2000-05-02

    申请号：US55437

    申请日：1998-04-06

    申请人： Mei-Sheng Zhou ,  Jian-Hui Ye ,  Simon Chooi ,  Young-Tong Tsai

    发明人： Mei-Sheng Zhou ,  Jian-Hui Ye ,  Simon Chooi ,  Young-Tong Tsai

    IPC分类号： C11D1/04 ,  C11D1/68 ,  C11D1/70 ,  C11D3/30 ,  C11D11/00 ,  H01L21/02 ,  H01L21/311 ,  H01L21/3213 ,  H05K3/06 ,  H01R13/502 ,  C11D9/00

    CPC分类号： H01L21/02071 ,  B82Y10/00 ,  B82Y30/00 ,  C11D11/0047 ,  C11D3/30 ,  H01L21/31138 ,  H01L21/32136 ,  H05K3/064 ,  C11D1/04 ,  H05K2203/0793 ,  H05K2203/095

    摘要： A method for forming a patterned metal layer within a microelectronics fabrication. There is first provided a substrate employed within a microelectronics fabrication. There is then formed over the substrate a blanket metal layer. There is then formed over the blanket metal layer a patterned photoresist layer. There is then etched through use of a plasma etch method while employing the patterned photoresist layer as a photoresist etch mask layer the blanket metal layer to form a patterned metal layer. The patterned metal layer so formed has a metal impregnated carbonaceous polymer residue layer formed upon a sidewall of the patterned metal layer. There is then stripped from the patterned metal layer the patterned photoresist layer through use of an oxygen containing plasma while simultaneously oxidizing the metal impregnated carbonaceous polymer residue layer to form an oxidized metal impregnated polymer residue layer upon the sidewall of the patterned metal layer. There is then stripped from the sidewall of the patterned metal layer the oxidized metal impregnated polymer residue layer while employing an aqueous alkyl ammonium hydroxide based solution. The aqueous alkyl ammonium hydroxide based solution has incorporated therein a surfactant capable of forming a monolayer adsorbed upon the sidewall of the patterned metal layer.

    摘要翻译： 一种用于在微电子制造中形成图案化金属层的方法。 首先提供了在微电子制造中使用的衬底。 然后在衬底上形成覆盖金属层。 然后在覆盖金属层上形成图案化的光致抗蚀剂层。 然后通过使用等离子体蚀刻方法蚀刻，同时使用图案化的光致抗蚀剂层作为光刻胶蚀刻掩模层，覆盖金属层以形成图案化的金属层。 如此形成的图案化金属层具有形成在图案化金属层的侧壁上的金属浸渍碳质聚合物残余层。 然后通过使用含氧等离子体从图案化的金属层剥离图案化的光刻胶层，同时对金属浸渍的碳质聚合物残余层进行氧化，以在图案化金属层的侧壁上形成氧化金属浸渍的聚合物残余物层。 然后从图案化金属层的侧壁剥离氧化金属浸渍的聚合物残余物层，同时使用基于烷基氢氧化铵的水溶液。 基于烷基氢氧化铵的水溶液溶液中加入了能够形成单层吸附在图案化金属层的侧壁上的表面活性剂。