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公开(公告)号:US09768184B2
公开(公告)日:2017-09-19
申请号:US15237640
申请日:2016-08-16
发明人: Masaru Yano , Pin-Yao Wang
IPC分类号: G11C11/34 , H01L27/11524 , G11C16/12 , G11C8/14 , H01L21/28 , H01L21/306 , H01L21/308 , H01L29/66
CPC分类号: H01L27/11524 , G11C8/14 , G11C16/12 , H01L21/28273 , H01L21/30604 , H01L21/3085 , H01L29/66553 , H01L29/66825
摘要: A manufacturing method of a semiconductor memory device is provided. The semiconductor memory device can suppress current leakage generated during a programming action so that the programming action can be executed with high reliability. A flash memory of this invention has a memory array in which NAND type strings are formed. Gates of memory cells in row direction of strings are commonly connected to a word line. Gates of bit line select transistors are commonly connected to a select gate line (SGD). Gates of source line select transistors are commonly connected to a select gate line (SGS). An interval (S4) of the select gate line (SGS) and a gate of a word line (WL0) adjacent to the select gate line (SGS) is larger than an interval (S1) of the select gate line (SGD) and a gate of a word line (WL7) adjacent to the select gate line (SGD).
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公开(公告)号:US09935116B2
公开(公告)日:2018-04-03
申请号:US15672298
申请日:2017-08-09
发明人: Masaru Yano , Pin-Yao Wang
IPC分类号: H01L21/311 , H01L27/11524 , H01L29/66 , H01L21/308 , G11C16/12 , H01L21/28 , G11C8/14 , H01L21/306
CPC分类号: H01L27/11524 , G11C8/14 , G11C16/12 , H01L21/28273 , H01L21/30604 , H01L21/3085 , H01L29/66553 , H01L29/66825
摘要: A manufacturing method of a semiconductor memory device is provided. The semiconductor memory device can suppress current leakage generated during a programming action so that the programming action can be executed with high reliability. A flash memory of this invention has a memory array in which NAND type strings are formed. Gates of memory cells in row direction of strings are commonly connected to a word line. Gates of bit line select transistors are commonly connected to a select gate line (SGD). Gates of source line select transistors are commonly connected to a select gate line (SGS). An interval (S4) of the select gate line (SGS) and a gate of a word line (WL0) adjacent to the select gate line (SGS) is larger than an interval (S1) of the select gate line (SGD) and a gate of a word line (WL7) adjacent to the select gate line (SGD).
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公开(公告)号:US09786376B2
公开(公告)日:2017-10-10
申请号:US15140509
申请日:2016-04-28
发明人: Pin-Yao Wang
CPC分类号: G11C16/16 , G11C16/0483 , G11C16/32
摘要: A non-volatile semiconductor memory device achieving low power consumption and erasing method thereof is provided. The flash memory of the present invention includes a memory array formed with NAND type strings. The memory array includes a plurality of global blocks, one global block includes a plurality of blocks, and one block includes a plurality of NAND type strings. When the block of the selected global block is erased and the next block is in adjacent relationship, electric charge accumulated in one of P-wells is discharged to another one of the P-wells, and then the next selected block is erased. Thus, the electric charge is shared between the adjacent P-wells to achieve low power consumption.
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4.
公开(公告)号:US10242950B2
公开(公告)日:2019-03-26
申请号:US15631889
申请日:2017-06-23
发明人: Masaru Yano , Pin-Yao Wang
摘要: A semiconductor device with improved generation function of unique information is provided. The semiconductor device includes an integrated circuit designed or fabricated based on a general design condition or manufacturing condition, an input/output circuit, and a unique-information generation circuit to generate unique information of the semiconductor device. The unique-information generation circuit includes a circuit for PUF and a code-generation unit. The circuit for PUF is fabricated based on the design condition or manufacturing condition which is different from the general design condition or manufacturing condition and has a factor which makes variations of circuit components become large. The code-generation unit generates codes based on the output of the circuit for PUF.
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公开(公告)号:US20170358589A1
公开(公告)日:2017-12-14
申请号:US15672298
申请日:2017-08-09
发明人: Masaru Yano , Pin-Yao Wang
IPC分类号: H01L27/11524 , G11C8/14 , H01L21/308 , G11C16/12 , H01L21/28 , H01L29/66 , H01L21/306
CPC分类号: H01L27/11524 , G11C8/14 , G11C16/12 , H01L21/28273 , H01L21/30604 , H01L21/3085 , H01L29/66553 , H01L29/66825
摘要: A manufacturing method of a semiconductor memory device is provided. The semiconductor memory device can suppress current leakage generated during a programming action so that the programming action can be executed with high reliability. A flash memory of this invention has a memory array in which NAND type strings are formed. Gates of memory cells in row direction of strings are commonly connected to a word line. Gates of bit line select transistors are commonly connected to a select gate line (SGD). Gates of source line select transistors are commonly connected to a select gate line (SGS). An interval (S4) of the select gate line (SGS) and a gate of a word line (WL0) adjacent to the select gate line (SGS) is larger than an interval (S1) of the select gate line (SGD) and a gate of a word line (WL7) adjacent to the select gate line (SGD).
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公开(公告)号:US20170133094A1
公开(公告)日:2017-05-11
申请号:US15140509
申请日:2016-04-28
发明人: Pin-Yao Wang
CPC分类号: G11C16/16 , G11C16/0483 , G11C16/32
摘要: A non-volatile semiconductor memory device achieving low power consumption and erasing method thereof is provided. The flash memory of the present invention includes a memory array formed with NAND type strings. The memory array includes a plurality of global blocks, one global block includes a plurality of blocks, and one block includes a plurality of NAND type strings. When the block of the selected global block is erased and the next block is in adjacent relationship, electric charge accumulated in one of P-wells is discharged to another one of the P-wells, and then the next selected block is erased. Thus, the electric charge is shared between the adjacent P-wells to achieve low power consumption.
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公开(公告)号:US20160358929A1
公开(公告)日:2016-12-08
申请号:US15237640
申请日:2016-08-16
发明人: Masaru Yano , Pin-Yao Wang
IPC分类号: H01L27/115 , H01L21/28 , H01L21/306 , H01L29/66 , H01L21/308
CPC分类号: H01L27/11524 , G11C8/14 , G11C16/12 , H01L21/28273 , H01L21/30604 , H01L21/3085 , H01L29/66553 , H01L29/66825
摘要: A manufacturing method of a semiconductor memory device is provided. The semiconductor memory device can suppress current leakage generated during a programming action so that the programming action can be executed with high reliability. A flash memory of this invention has a memory array in which NAND type strings are formed. Gates of memory cells in row direction of strings are commonly connected to a word line. Gates of bit line select transistors are commonly connected to a select gate line (SGD). Gates of source line select transistors are commonly connected to a select gate line (SGS). An interval (S4) of the select gate line (SGS) and a gate of a word line (WL0) adjacent to the select gate line (SGS) is larger than an interval (S1) of the select gate line (SGD) and a gate of a word line (WL7) adjacent to the select gate line (SGD).
摘要翻译: 提供一种半导体存储器件的制造方法。 半导体存储器件可以抑制在编程动作期间产生的电流泄漏,从而可以以高可靠性执行编程动作。 本发明的闪存具有形成NAND型串的存储器阵列。 字符串行方向上的存储单元的门通常连接到字线。 位线选择晶体管的栅极通常连接到选择栅极线(SGD)。 源极线选择晶体管的栅极通常连接到选择栅极线(SGS)。 选择栅极线(SGS)的间隔(S4)和与选择栅极线(SGS)相邻的字线(WL0)的栅极大于选择栅极线(SGD)的间隔(S1),并且a 与选择栅线(SGD)相邻的字线(WL7)的栅极。
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公开(公告)号:US09449697B2
公开(公告)日:2016-09-20
申请号:US14621344
申请日:2015-02-12
发明人: Masaru Yano , Pin-Yao Wang
IPC分类号: G11C11/34 , G11C16/12 , H01L27/115 , G11C8/14
CPC分类号: H01L27/11524 , G11C8/14 , G11C16/12 , H01L21/28273 , H01L21/30604 , H01L21/3085 , H01L29/66553 , H01L29/66825
摘要: A semiconductor memory device is provided, which can suppress current leakage generated during a programming action so that the programming action can be executed with high reliability. A flash memory of this invention has a memory array in which NAND type strings are formed. Gates of memory cells in row direction of strings are commonly connected to a word line. Gates of bit line select transistors are commonly connected to a select gate line (SGD). Gates of source line select transistors are commonly connected to a select gate line (SGS). An interval (S4) of the select gate line (SGS) and a gate of a word line (WL0) adjacent to the select gate line (SGS) is larger than an interval (S1) of the select gate line (SGD) and a gate of a word line (WL7) adjacent to the select gate line (SGD).
摘要翻译: 提供一种半导体存储器件,其可以抑制在编程动作期间产生的电流泄漏,使得可以以高可靠性执行编程动作。 本发明的闪存具有形成NAND型串的存储器阵列。 字符串行方向上的存储单元的门通常连接到字线。 位线选择晶体管的栅极通常连接到选择栅极线(SGD)。 源极线选择晶体管的栅极通常连接到选择栅极线(SGS)。 选择栅极线(SGS)的间隔(S4)和与选择栅极线(SGS)相邻的字线(WL0)的栅极大于选择栅极线(SGD)的间隔(S1),并且a 与选择栅线(SGD)相邻的字线(WL7)的栅极。
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公开(公告)号:US20150380092A1
公开(公告)日:2015-12-31
申请号:US14621344
申请日:2015-02-12
发明人: Masaru Yano , Pin-Yao Wang
IPC分类号: G11C16/12 , H01L27/115 , H01L21/28
CPC分类号: H01L27/11524 , G11C8/14 , G11C16/12 , H01L21/28273 , H01L21/30604 , H01L21/3085 , H01L29/66553 , H01L29/66825
摘要: A semiconductor memory device is provided, which can suppress current leakage generated during a programming action so that the programming action can be executed with high reliability. A flash memory of this invention has a memory array in which NAND type strings are formed. Gates of memory cells in row direction of strings are commonly connected to a word line. Gates of bit line select transistors are commonly connected to a select gate line (SGD). Gates of source line select transistors are commonly connected to a select gate line (SGS). An interval (S4) of the select gate line (SGS) and a gate of a word line (WL0) adjacent to the select gate line (SGS) is larger than an interval (S1) of the select gate line (SGD) and a gate of a word line (WL7) adjacent to the select gate line (SGD).
摘要翻译: 提供一种半导体存储器件,其可以抑制在编程动作期间产生的电流泄漏,从而可以以高可靠性执行编程动作。 本发明的闪存具有形成NAND型串的存储器阵列。 字符串行方向上的存储单元的门通常连接到字线。 位线选择晶体管的栅极通常连接到选择栅极线(SGD)。 源极线选择晶体管的栅极通常连接到选择栅极线(SGS)。 选择栅极线(SGS)的间隔(S4)和与选择栅极线(SGS)相邻的字线(WL0)的栅极大于选择栅极线(SGD)的间隔(S1),并且a 与选择栅线(SGD)相邻的字线(WL7)的栅极。
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