Non-volatile semiconductor memory device and erasing method thereof

    公开(公告)号:US09786376B2

    公开(公告)日:2017-10-10

    申请号:US15140509

    申请日:2016-04-28

    发明人: Pin-Yao Wang

    IPC分类号: G11C16/16 G11C16/04 G11C16/32

    摘要: A non-volatile semiconductor memory device achieving low power consumption and erasing method thereof is provided. The flash memory of the present invention includes a memory array formed with NAND type strings. The memory array includes a plurality of global blocks, one global block includes a plurality of blocks, and one block includes a plurality of NAND type strings. When the block of the selected global block is erased and the next block is in adjacent relationship, electric charge accumulated in one of P-wells is discharged to another one of the P-wells, and then the next selected block is erased. Thus, the electric charge is shared between the adjacent P-wells to achieve low power consumption.

    Semiconductor device, method of manufacturing the same and generation method of unique information

    公开(公告)号:US10242950B2

    公开(公告)日:2019-03-26

    申请号:US15631889

    申请日:2017-06-23

    摘要: A semiconductor device with improved generation function of unique information is provided. The semiconductor device includes an integrated circuit designed or fabricated based on a general design condition or manufacturing condition, an input/output circuit, and a unique-information generation circuit to generate unique information of the semiconductor device. The unique-information generation circuit includes a circuit for PUF and a code-generation unit. The circuit for PUF is fabricated based on the design condition or manufacturing condition which is different from the general design condition or manufacturing condition and has a factor which makes variations of circuit components become large. The code-generation unit generates codes based on the output of the circuit for PUF.

    NON-VOLATILE SEMICONDUCTOR MEMORY DEVICE AND ERASING METHOD THEREOF

    公开(公告)号:US20170133094A1

    公开(公告)日:2017-05-11

    申请号:US15140509

    申请日:2016-04-28

    发明人: Pin-Yao Wang

    IPC分类号: G11C16/16 G11C16/04

    摘要: A non-volatile semiconductor memory device achieving low power consumption and erasing method thereof is provided. The flash memory of the present invention includes a memory array formed with NAND type strings. The memory array includes a plurality of global blocks, one global block includes a plurality of blocks, and one block includes a plurality of NAND type strings. When the block of the selected global block is erased and the next block is in adjacent relationship, electric charge accumulated in one of P-wells is discharged to another one of the P-wells, and then the next selected block is erased. Thus, the electric charge is shared between the adjacent P-wells to achieve low power consumption.

    MANUFACTURING METHOD OF SEMICONDUCTOR MEMORY DEVICE
    7.
    发明申请
    MANUFACTURING METHOD OF SEMICONDUCTOR MEMORY DEVICE 审中-公开
    半导体存储器件的制造方法

    公开(公告)号:US20160358929A1

    公开(公告)日:2016-12-08

    申请号:US15237640

    申请日:2016-08-16

    摘要: A manufacturing method of a semiconductor memory device is provided. The semiconductor memory device can suppress current leakage generated during a programming action so that the programming action can be executed with high reliability. A flash memory of this invention has a memory array in which NAND type strings are formed. Gates of memory cells in row direction of strings are commonly connected to a word line. Gates of bit line select transistors are commonly connected to a select gate line (SGD). Gates of source line select transistors are commonly connected to a select gate line (SGS). An interval (S4) of the select gate line (SGS) and a gate of a word line (WL0) adjacent to the select gate line (SGS) is larger than an interval (S1) of the select gate line (SGD) and a gate of a word line (WL7) adjacent to the select gate line (SGD).

    摘要翻译: 提供一种半导体存储器件的制造方法。 半导体存储器件可以抑制在编程动作期间产生的电流泄漏,从而可以以高可靠性执行编程动作。 本发明的闪存具有形成NAND型串的存储器阵列。 字符串行方向上的存储单元的门通常连接到字线。 位线选择晶体管的栅极通常连接到选择栅极线(SGD)。 源极线选择晶体管的栅极通常连接到选择栅极线(SGS)。 选择栅极线(SGS)的间隔(S4)和与选择栅极线(SGS)相邻的字线(WL0)的栅极大于选择栅极线(SGD)的间隔(S1),并且a 与选择栅线(SGD)相邻的字线(WL7)的栅极。

    Semiconductor memory device and manufacturing method thereof
    8.
    发明授权
    Semiconductor memory device and manufacturing method thereof 有权
    半导体存储器件及其制造方法

    公开(公告)号:US09449697B2

    公开(公告)日:2016-09-20

    申请号:US14621344

    申请日:2015-02-12

    摘要: A semiconductor memory device is provided, which can suppress current leakage generated during a programming action so that the programming action can be executed with high reliability. A flash memory of this invention has a memory array in which NAND type strings are formed. Gates of memory cells in row direction of strings are commonly connected to a word line. Gates of bit line select transistors are commonly connected to a select gate line (SGD). Gates of source line select transistors are commonly connected to a select gate line (SGS). An interval (S4) of the select gate line (SGS) and a gate of a word line (WL0) adjacent to the select gate line (SGS) is larger than an interval (S1) of the select gate line (SGD) and a gate of a word line (WL7) adjacent to the select gate line (SGD).

    摘要翻译: 提供一种半导体存储器件,其可以抑制在编程动作期间产生的电流泄漏,使得可以以高可靠性执行编程动作。 本发明的闪存具有形成NAND型串的存储器阵列。 字符串行方向上的存储单元的门通常连接到字线。 位线选择晶体管的栅极通常连接到选择栅极线(SGD)。 源极线选择晶体管的栅极通常连接到选择栅极线(SGS)。 选择栅极线(SGS)的间隔(S4)和与选择栅极线(SGS)相邻的字线(WL0)的栅极大于选择栅极线(SGD)的间隔(S1),并且a 与选择栅线(SGD)相邻的字线(WL7)的栅极。

    SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF
    9.
    发明申请
    SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF 有权
    半导体存储器件及其制造方法

    公开(公告)号:US20150380092A1

    公开(公告)日:2015-12-31

    申请号:US14621344

    申请日:2015-02-12

    摘要: A semiconductor memory device is provided, which can suppress current leakage generated during a programming action so that the programming action can be executed with high reliability. A flash memory of this invention has a memory array in which NAND type strings are formed. Gates of memory cells in row direction of strings are commonly connected to a word line. Gates of bit line select transistors are commonly connected to a select gate line (SGD). Gates of source line select transistors are commonly connected to a select gate line (SGS). An interval (S4) of the select gate line (SGS) and a gate of a word line (WL0) adjacent to the select gate line (SGS) is larger than an interval (S1) of the select gate line (SGD) and a gate of a word line (WL7) adjacent to the select gate line (SGD).

    摘要翻译: 提供一种半导体存储器件,其可以抑制在编程动作期间产生的电流泄漏,从而可以以高可靠性执行编程动作。 本发明的闪存具有形成NAND型串的存储器阵列。 字符串行方向上的存储单元的门通常连接到字线。 位线选择晶体管的栅极通常连接到选择栅极线(SGD)。 源极线选择晶体管的栅极通常连接到选择栅极线(SGS)。 选择栅极线(SGS)的间隔(S4)和与选择栅极线(SGS)相邻的字线(WL0)的栅极大于选择栅极线(SGD)的间隔(S1),并且a 与选择栅线(SGD)相邻的字线(WL7)的栅极。