PROCESS CONTROL DEVICE, PROCESS CONTROL SYSTEM, AND PROCESS CONTROL METHOD
    1.
    发明申请
    PROCESS CONTROL DEVICE, PROCESS CONTROL SYSTEM, AND PROCESS CONTROL METHOD 有权
    过程控制装置,过程控制系统和过程控制方法

    公开(公告)号:US20140012398A1

    公开(公告)日:2014-01-09

    申请号:US13930697

    申请日:2013-06-28

    CPC classification number: G05B15/02 G05B19/042 G06F9/45533

    Abstract: A process control device according to one aspect of the present invention is configured to control an industrial process implemented in a plant. The process control device includes: a virtualizer configured to run over a hardware in lieu of the hardware; and first and second controllers configured to run over the virtualizer and control operations of a plurality of field apparatuses configured to perform at least one of measurement and operation which are required to control the industrial process; an input distributor included in the virtualizer, the input distributor being configured to distribute a signal output from the filed apparatus to the first and second controllers; and an output acquirer included in the virtualizer, and the output acquirer being configured to acquire outputs of the first and second controllers, and output any one of the outputs to at least one of the field apparatuses.

    Abstract translation: 根据本发明的一个方面的过程控制装置被配置为控制在工厂中实现的工业过程。 该过程控制装置包括:虚拟器,被配置为在硬件上运行以代替硬件; 以及第一和第二控制器,被配置为在所述虚拟器上运行并且配置为执行控制所述工业过程所需的测量和操作中的至少一个的多个现场设备的控制操作; 包括在所述虚拟器中的输入分配器,所述输入分配器被配置为将从所述现场设备输出的信号分配给所述第一和第二控制器; 以及包括在虚拟器中的输出获取器,并且输出获取器被配置为获取第一和第二控制器的输出,并且将输出中的任一个输出到现场设备中的至少一个。

    Process control system
    3.
    发明授权
    Process control system 有权
    过程控制系统

    公开(公告)号:US09250616B2

    公开(公告)日:2016-02-02

    申请号:US13848470

    申请日:2013-03-21

    Abstract: A process control system that controls an industrial process implemented in a plant, may include: a network provided in the plant; a first field device that is connected to the network, the first field device being configured to output one of measurement data, which is obtained by measuring a state quantity in the industrial process, and first simulation data, which simulates the state quantity; a controller that is connected to the network, the controller being configured to perform control in response to one of the measurement data and the first simulation data output from the first field device; and a simulator configured to generate the first simulation data to be output from the first field device.

    Abstract translation: 控制在工厂中实施的工业过程的过程控制系统可以包括:设备中提供的网络; 连接到所述网络的第一现场设备,所述第一现场设备被配置为输出通过测量所述工业过程中的状态数量而获得的测量数据中的一个以及模拟所述状态量的第一模拟数据; 连接到所述网络的控制器,所述控制器被配置为响应于所述测量数据中的一个和从所述第一现场设备输出的所述第一模拟数据执行控制; 以及模拟器,被配置为生成要从第一现场设备输出的第一模拟数据。

    PROCESS CONTROL SYSTEM
    4.
    发明申请
    PROCESS CONTROL SYSTEM 有权
    过程控制系统

    公开(公告)号:US20130253897A1

    公开(公告)日:2013-09-26

    申请号:US13848470

    申请日:2013-03-21

    Abstract: A process control system that controls an industrial process implemented in a plant, may include: a network provided in the plant; a first field device that is connected to the network, the first field device being configured to output one of measurement data, which is obtained by measuring a state quantity in the industrial process, and first simulation data, which simulates the state quantity; a controller that is connected to the network, the controller being configured to perform control in response to one of the measurement data and the first simulation data output from the first field device; and a simulator configured to generate the first simulation data to be output from the first field device.

    Abstract translation: 控制在工厂中实施的工业过程的过程控制系统可以包括:设备中提供的网络; 连接到所述网络的第一现场设备,所述第一现场设备被配置为输出通过测量所述工业过程中的状态数量而获得的测量数据中的一个以及模拟所述状态量的第一模拟数据; 连接到所述网络的控制器,所述控制器被配置为响应于所述测量数据中的一个和从所述第一现场设备输出的所述第一模拟数据执行控制; 以及模拟器,被配置为生成要从第一现场设备输出的第一模拟数据。

    Process control device, process control system, and process control method

    公开(公告)号:US09891601B2

    公开(公告)日:2018-02-13

    申请号:US13930697

    申请日:2013-06-28

    CPC classification number: G05B15/02 G05B19/042 G06F9/45533

    Abstract: A process control device according to one aspect of the present invention is configured to control an industrial process implemented in a plant. The process control device includes: a virtualizer configured to run over a hardware in lieu of the hardware; and first and second controllers configured to run over the virtualizer and control operations of a plurality of field apparatuses configured to perform at least one of measurement and operation which are required to control the industrial process; an input distributor included in the virtualizer, the input distributor being configured to distribute a signal output from the field apparatus to the first and second controllers; and an output acquirer included in the virtualizer, and the output acquirer being configured to acquire outputs of the first and second controllers, and output any one of the outputs to at least one of the field apparatuses.

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